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US5595784A
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Titanium nitride and multilayers formed by chemical vapor deposition of titanium halides
Assignee: Novellus Systems Inc
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Filing: 1995-08-18
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Granted: 1997-01-21
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Expires: 2015-08-18
Abstract
Abstract A gaseous mixture of a titanium halide and silane is introduced to a plasma or thermal CVD reactor to induce a reaction such that a conformal and pure titanium film is deposited onto a semiconductor device within the reactor. The titanium halide has a chemical form of TiX4, where X is a halogen. Other gaseous combinations of the titanium halide, ammonia, hydrogen, a halogen and silane are subjected to plasma or thermal CVD to induce a reaction to deposit titanium silicide and titanium nitride films onto the semiconductor device. Successive CVD processes create bilayers of TiSix/TiN or Ti/TiN, and/or trilayers of TiSix/Ti/TiN onto the semiconductor device.
Inventors
- 👤 Robert Kaim
- 👤 John W. Vanderpot
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:23
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/032; H10W20/052; H10W20/0523; C; C23; C23C; C23C16/00; C23C16/06; C23C16/08; C23C16/14; C23C16/22; C23C16/30; C23C16/34; C23C16/42; H10W20/033
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
81 words
A chemical vapor deposition process of depositing a titanium nitride film onto a semiconductor device, comprising the steps of forming a gaseous mixture including titanium halide, silane, a halogen, and ammonia, and transforming the mixture within a chemical vapor deposition reactor to deposit the titanium nitride film onto the semiconductor device, the titanium halide being selected from the group consisting of titanium iodide, titanium bromide and titanium chloride, the halogen being selected from the group consisting of chlorine, iodine and bromine.
Claim 2
Dependent Claim
81 words
A chemical vapor deposition process of depositing a titanium nitride film onto a semiconductor device, comprising the steps of forming a gaseous mixture including titanium halide, silane, a halogen, and ammonia, and transforming the mixture within a chemical vapor deposition reactor to deposit the titanium nitride film onto the semiconductor device, the titanium halide being selected from the group consisting of titanium iodide, titanium bromide and titanium chloride, the halogen being selected from the group consisting of chlorine, iodine and bromine.
Claim 3
Dependent Claim
80 words
A chemical vapor deposition process of depositing a titanium nitride film onto a semiconductor device, comprising the steps of forming a gaseous mixture including titanium halide, a halogen, and ammonia, and transforming the mixture within a chemical vapor deposition reactor to deposit the titanium nitride film onto the semiconductor device, the titanium halide being selected from the group consisting of titanium iodide, titanium bromide and titanium chloride, the halogen being selected from the group consisting of chlorine, iodine and bromine.
Claim 4
Dependent Claim
80 words
A chemical vapor deposition process of depositing a titanium nitride film onto a semiconductor device, comprising the steps of forming a gaseous mixture including titanium halide, a halogen, and ammonia, and transforming the mixture within a chemical vapor deposition reactor to deposit the titanium nitride film onto the semiconductor device, the titanium halide being selected from the group consisting of titanium iodide, titanium bromide and titanium chloride, the halogen being selected from the group consisting of chlorine, iodine and bromine.
Claim 5
Dependent Claim
135 words
A chemical vapor deposition process of depositing a trilayer of titanium silicide, titanium, and titanium nitride onto a semiconductor device, comprising the steps of (i) forming a first gaseous mixture including titanium halide and a first gas that includes silane, (ii) transforming the first mixture by chemical vapor deposition to deposit the titanium silicide film onto the semiconductor device, (iii) forming a second gaseous mixture including titanium halide and the first gas, (iv) transforming the second mixture by chemical vapor deposition to deposit the titanium film onto the semiconductor device, (v) forming a third gaseous mixture including titanium halide, ammonia, and the first gas, and (vi) transforming the third mixture by chemical vapor deposition to deposit a titanium nitride film onto the semiconductor device, thereby forming a trilayer of titanium silicide, titanium and titanium nitride.
Claim 6
Dependent Claim
135 words
A chemical vapor deposition process of depositing a trilayer of titanium silicide, titanium, and titanium nitride onto a semiconductor device, comprising the steps of (i) forming a first gaseous mixture including titanium halide and a first gas that includes silane, (ii) transforming the first mixture by chemical vapor deposition to deposit the titanium silicide film onto the semiconductor device, (iii) forming a second gaseous mixture including titanium halide and the first gas, (iv) transforming the second mixture by chemical vapor deposition to deposit the titanium film onto the semiconductor device, (v) forming a third gaseous mixture including titanium halide, ammonia, and the first gas, and (vi) transforming the third mixture by chemical vapor deposition to deposit a titanium nitride film onto the semiconductor device, thereby forming a trilayer of titanium silicide, titanium and titanium nitride.
Claim 7
Dependent Claim
22 words
A process according to claim 3 wherein the step of inducing a reaction comprises the step of utilizing plasma chemical vapor deposition.
Claim 8
Dependent Claim
22 words
A process according to claim 3 wherein the step of inducing a reaction comprises the step of utilizing thermal chemical vapor deposition.
Claim 9
Dependent Claim
25 words
A process according to claim 3 wherein the silane is selected from SiH 4 , Si 2 H 6 or Si 3 H 8 .
Claim 10
Dependent Claim
30 words
A process according to claim 3 wherein the titanium halide comprises TiX 4 , where X is a halogen selected from the group consisting essentially of chlorine, bromine and iodine.
Claim 11
Dependent Claim
22 words
A process according to claim 3 comprising the further step of adding an inert gas as a carrier or plasma support gas.
Claim 12
Dependent Claim
99 words
A chemical vapor deposition process of depositing a bilayer of titanium and titanium nitride onto a semiconductor device, comprising the steps of (i) forming a first gaseous mixture including titanium halide and a first gas that includes silane, (ii) transforming the first mixture by chemical vapor deposition to deposit the titanium film onto the semiconductor device, (iii) forming a second gaseous mixture including titanium halide, ammonia, and the first gas, and (iv) transforming the second mixture by chemical vapor deposition to deposit a titanium nitride film onto the semiconductor device, thereby forming a bilayer of titanium and titanium nitride.
Claim 13
Dependent Claim
99 words
A chemical vapor deposition process of depositing a bilayer of titanium and titanium nitride onto a semiconductor device, comprising the steps of (i) forming a first gaseous mixture including titanium halide and a first gas that includes silane, (ii) transforming the first mixture by chemical vapor deposition to deposit the titanium film onto the semiconductor device, (iii) forming a second gaseous mixture including titanium halide, ammonia, and the first gas, and (iv) transforming the second mixture by chemical vapor deposition to deposit a titanium nitride film onto the semiconductor device, thereby forming a bilayer of titanium and titanium nitride.
Claim 14
Dependent Claim
22 words
A process according to claim 9 wherein the step of inducing a reaction comprises the step of utilizing plasma chemical vapor deposition.
Claim 15
Dependent Claim
22 words
A process according to claim 9 wherein the step of inducing a reaction comprises the step of utilizing thermal chemical vapor deposition.
Claim 16
Dependent Claim
25 words
A process according to claim 9 wherein the silane is selected from SiH 4 , Si 2 H 6 or Si 3 H 8 .
Claim 17
Dependent Claim
30 words
A process according to claim 9 wherein the titanium halide comprises TiX 4 , where X is a halogen selected from the group consisting essentially of chlorine, bromine and iodine.
Claim 18
Dependent Claim
22 words
A process according to claim 9 comprising the further step of adding an inert gas as a carrier or plasma support gas.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-01-21 | 2000-07-22 | 2001-01-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-01-21 | 2004-07-22 | 2005-01-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-01-21 | 2008-07-22 | 2009-01-21 | $7700.00 | Window Closed / Lapsed |