Patent US5595603A successfully refreshed from Google Patents.
US5595603A
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Apparatus for the controlled delivery of vaporized chemical precursor to an LPCVD reactor
Assignee: Osram Sylvania Inc
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Filing: 1995-09-01
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Granted: 1997-01-21
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Expires: 2015-09-01
Abstract
Abstract An apparatus and method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor is disclosed. A liquid flow controller is closely coupled with a highly efficient liquid vaporizer. The liquid flow controller, which contains no moving parts or polymeric seals, employs as a basic element an efficient gas-liquid separator downstream of the flow control element which assures that an uninterrupted constant velocity flow of liquid enters the high-temperature zone of the vaporizer. When the output of the vaporized-precursor delivery system is linked with the gas inlet of an LPCVD reactor, the very precise vapor delivery rates obtained translate into very precisely controlled thin film deposition rates.
Inventors
- 👤 Keith A. Klinedinst
- 👤 Joseph E. Lester
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 17:24
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/4481; C23C16/4401; C23C16/4402
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
155 words
An apparatus for the controlled delivery of a vaporized chemical precursor to an LPCVD reactor comprising: a container of liquid precursor; a first source of inert gas coupled to said container of liquid precursor for pressurizing said container of liquid precursor; a flow restrictor element for restricting a flow of liquid precursor from said container of liquid precursor, said flow of liquid precursor containing a quantity of dissolved inert gas from said first source of inert gas; a gas/liquid phase separator coupled to said flow restrictor element for separating said quantity of dissolved inert gas from said flow of liquid precursor and for producing a continuous flow of liquid precursor; a liquid vaporizer having an input coupled to said gas/liquid phase separator for receiving said continuous flow of liquid precursor and for producing a quantity of vaporized precursor, and; means for coupling said quantity of vaporized precursor within said liquid vaporizer to an LPCVD reactor.
Claim 2
Independent Claim
155 words
An apparatus for the controlled delivery of a vaporized chemical precursor to an LPCVD reactor comprising: a container of liquid precursor; a first source of inert gas coupled to said container of liquid precursor for pressurizing said container of liquid precursor; a flow restrictor element for restricting a flow of liquid precursor from said container of liquid precursor, said flow of liquid precursor containing a quantity of dissolved inert gas from said first source of inert gas; a gas/liquid phase separator coupled to said flow restrictor element for separating said quantity of dissolved inert gas from said flow of liquid precursor and for producing a continuous flow of liquid precursor; a liquid vaporizer having an input coupled to said gas/liquid phase separator for receiving said continuous flow of liquid precursor and for producing a quantity of vaporized precursor, and; means for coupling said quantity of vaporized precursor within said liquid vaporizer to an LPCVD reactor.
Claim 3
Dependent Claim
22 words
The apparatus of claim 1 wherein said flow restrictor element has a small internal volume and a relatively large minimum passage diameter.
Claim 4
Dependent Claim
17 words
The apparatus of claim 1 wherein said gas/liquid phase separator comprises a second source of inert gas.
Claim 5
Dependent Claim
30 words
The apparatus of claim 3 wherein said second source of inert gas is coupled between an output of said liquid flow restrictor element and said input of said liquid vaporizer.
Claim 6
Dependent Claim
17 words
The apparatus of claim 1 wherein said liquid vaporizer comprises a housing containing a high temperature element.
Claim 7
Dependent Claim
43 words
The apparatus of claim 5 wherein said liquid vaporizer is coupled to said flow restrictor element by a gas/liquid delivery conduit, one end of said conduit being within said housing and connected to said high temperature element by means of fine metallic filaments.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-01-21 | 2000-07-22 | 2001-01-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-01-21 | 2004-07-22 | 2005-01-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-01-21 | 2008-07-22 | 2009-01-21 | $7700.00 | Window Closed / Lapsed |