US5573979A
Expired / Lapsed
US
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Sloped storage node for a 3-D dram cell structure
Assignee: Texas Instruments Inc
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Filing: 1995-02-13
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Granted: 1996-11-12
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Expires: 2015-02-13
Abstract
Abstract Generally, the present invention utilizes dry plasma etching techniques such as Electron Cyclotron Resonance (ECR) to produce sloped sidewalls on a DRAM storage cell. The rounded corners of the lower electrode made by this technique allow the advanced dielectric material to be deposited without substantial cracking, and it also allows the capacitance to be closely predicted and controlled due to the uniformity in which the advanced dielectric layer can be fabricated. One embodiment of the present invention is method of making a microelectronic structure comprising a supporting layer (e.g. Si substrate 30) having a principal surface, a lower electrode overlying the principal surface of the supporting layer, and a high-dielectric-constant material layer (e.g. BST 44) overlying the top surface of the lower electrode. The lower electrode comprises a barrier layer (e.g. TiN 36), and an unreactive layer (e.g. Pt 42).
Inventors
- 👤 Robert Y. Tsu
- 👤 Wei-Yung Hsu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 20:06
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/267; H10B; H10B12/00; H10B12/01; H10B12/02; H10B12/03; H10B12/033; H10D; H10D1/00; H10D1/60; H10D1/68; Y; Y10; Y10S; Y10S438/00; Y10S438/978
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
119 words
A method of forming a microelectronic structure, said method comprising steps: (a) forming a conductive barrier layer on a principal surface of a microelectronic substrate where said conductive barrier layer comprises a lateral surface and an upper surface forming a corner edge; (b) forming an unreactive layer on said barrier layer, (c) patterning photoresist on said unreactive layer, (d) etching said unreactive layer by dry plasma etch with at least partial horizontal etching to form sloped lateral sides on said unreactive layer, overlying said corner edge on said barrier layer wherein said sloped lateral sides are at an angle of less than 80 degrees from the substrate surface; and (e) depositing a high-dielectric-constant material layer on said unreactive layer.
Claim 2
Independent Claim
119 words
A method of forming a microelectronic structure, said method comprising steps: (a) forming a conductive barrier layer on a principal surface of a microelectronic substrate where said conductive barrier layer comprises a lateral surface and an upper surface forming a corner edge; (b) forming an unreactive layer on said barrier layer, (c) patterning photoresist on said unreactive layer, (d) etching said unreactive layer by dry plasma etch with at least partial horizontal etching to form sloped lateral sides on said unreactive layer, overlying said corner edge on said barrier layer wherein said sloped lateral sides are at an angle of less than 80 degrees from the substrate surface; and (e) depositing a high-dielectric-constant material layer on said unreactive layer.
Claim 3
Dependent Claim
29 words
The method according to claim 1, wherein said sloped lateral sides are at an angle of less than 75 degrees and greater than 40 degrees from the substrate surface.
Claim 4
Dependent Claim
19 words
The method according to claim 1, wherein said dry plasma process is an Electron Cyclotron Resonance plasma etch process.
Claim 5
Dependent Claim
85 words
The method according to claim 1, wherein said barrier layer is of a material selected from the group consisting of: conductive metals, conductive metal nitrides, conductive metal oxides, conductive metal silicides, conductive metal carbides, conductive metal borides, ternary amorphous nitrides, and combinations thereof, or chosen from the group consisting of titanium aluminum nitride, Zr nitride, Hf nitride, Y nitride, Sc nitride, La nitride, N deficient Al nitride, doped Al nitride, Mg nitride, Ca nitride, Sr nitride, Ba nitride, TaSi nitride, TiSi nitride, and combinations thereof.
Claim 6
Dependent Claim
66 words
The method according to claim 1, wherein said unreactive layer is selected from the group consisting of: platinum, palladium, iridium, rhenium, rhodium, gold, silver, ruthenium oxide, tin oxide, titanium monoxide, indium oxide, rhenium oxide, osmium oxide, rhodium oxide, iridium oxide, doped tin oxide, doped indium oxide, doped zinc oxide, ruthenium nitride, tin nitride, titanium nitride, zirconium nitride, (La,Sr)CoO 3 , SrRuO 3 , and combinations thereof.
Claim 7
Dependent Claim
51 words
The method according to claim 1, wherein said high-dielectric-constant material layer is selected from the group consisting of: barium strontium titanate, lead zirconate titanate, lead lanthanum titanate, lead lanthanum zirconate titanate, bismuth titanate, potassium tantalate, lead scandium tantalate, lead niobate, lead zinc niobate, potassium niobate, lead magnesium niobate, and combinations thereof.
Claim 8
Dependent Claim
19 words
The method according to claim 1, said method further comprising forming an upper electrode on said high-dielectric-constant material layer.
Claim 9
Dependent Claim
12 words
The method according to claim 7, wherein said upper electrode comprises platinum.
Claim 10
Independent Claim
110 words
A method of forming a microelectronic structure, said method comprising steps: (a) forming a conductive barrier layer on a principal microelectronic substrate surface, said barrier layer comprising a lateral surface and an upper surface forming a corner edge; (b) forming an unreactive layer, consisting of Platinum, on said barrier layer, (c) patterning photoresist on said unreactive layer, (d) etching said unreactive layer by dry plasma etch with at least partial horizontal etching to form sloped lateral sides on said unreactive layer, overlying said corner edge on said barrier layer, with said slope at an angle less than 75 degrees; and (e) depositing a high-dielectric-constant material layer on said unreactive layer.
Claim 11
Independent Claim
110 words
A method of forming a microelectronic structure, said method comprising steps: (a) forming a conductive barrier layer on a principal microelectronic substrate surface, said barrier layer comprising a lateral surface and an upper surface forming a corner edge; (b) forming an unreactive layer, consisting of Platinum, on said barrier layer, (c) patterning photoresist on said unreactive layer, (d) etching said unreactive layer by dry plasma etch with at least partial horizontal etching to form sloped lateral sides on said unreactive layer, overlying said corner edge on said barrier layer, with said slope at an angle less than 75 degrees; and (e) depositing a high-dielectric-constant material layer on said unreactive layer.
Claim 12
Dependent Claim
55 words
The method according to claim 9, wherein said barrier layer is of a material selected from the group consisting of: titanium aluminum nitride, Zr nitride, Hf nitride, Y nitride, Sc nitride, La nitride, N deficient Al nitride, doped Al nitride, Mg nitride, Ca nitride, Sr nitride, Ba nitride, TaSi nitride, TiSi nitride, and combinations thereof.
Claim 13
Dependent Claim
69 words
The method according to claim 9, wherein said unreactive layer is of a material selected from the group consisting of: platinum, palladium, iridium, rhenium, rhodium, gold, silver, ruthenium oxide, tin oxide, titanium monoxide, indium oxide, rhenium oxide, osmium oxide, rhodium oxide, iridium oxide, doped tin oxide, doped indium oxide, doped zinc oxide, ruthenium nitride, tin nitride, titanium nitride, zirconium nitride, (La,Sr)CoO 3 , SrRuO 3 , and combinations thereof.
Claim 14
Dependent Claim
51 words
The method according to claim 9, wherein said high-dielectric-constant material layer is selected from the group consisting of: barium strontium titanate, lead zirconate titanate, lead lanthanum titanate, lead lanthanum zirconate titanate, bismuth titanate, potassium tantalate, lead scandium tantalate, lead niobate, lead zinc niobate, potassium niobate, lead magnesium niobate, and combinations thereof.
Claim 15
Dependent Claim
19 words
The method according to claim 9, said method further comprising forming an upper electrode on said high-dielectric-constant material layer.
Claim 16
Dependent Claim
21 words
The method according to claim 9, said method further comprising forming an unreactive layer with an aspect ratio greater than 1.
Claim 17
Independent Claim
108 words
A method of forming a microelectronic structure, said method comprising steps: (a) forming a conductive barrier layer on a principal microelectronic substrate surface, said barrier layer comprising a lateral surface and an upper surface forming a corner edge; (c) patterning photoresist on said barrier layer, (d) etching said barrier layer by ECR plasma etch with at least partial horizontal etching to form sloped lateral sides on said unreactive layer, overlying said corner edge on said barrier layer, with said slope at an angle less than 75 degrees; and (e) forming an unreactive layer on said barrier layer; and (f) depositing a high-dielectric-constant material layer on said unreactive layer.
Claim 18
Independent Claim
108 words
A method of forming a microelectronic structure, said method comprising steps: (a) forming a conductive barrier layer on a principal microelectronic substrate surface, said barrier layer comprising a lateral surface and an upper surface forming a corner edge; (c) patterning photoresist on said barrier layer, (d) etching said barrier layer by ECR plasma etch with at least partial horizontal etching to form sloped lateral sides on said unreactive layer, overlying said corner edge on said barrier layer, with said slope at an angle less than 75 degrees; and (e) forming an unreactive layer on said barrier layer; and (f) depositing a high-dielectric-constant material layer on said unreactive layer.
Claim 19
Dependent Claim
55 words
The method according to claim 15, wherein said barrier layer is of a material selected from the group consisting of: titanium aluminum nitride, Zr nitride, Hf nitride, Y nitride, Sc nitride, La nitride, N deficient Al nitride, doped Al nitride, Mg nitride, Ca nitride, Sr nitride, Ba nitride, TaSi nitride, TiSi nitride, and combinations thereof.
Claim 20
Dependent Claim
73 words
The method according to claim 15, wherein said unreactive layer is selected from the group consisting of: platinum, palladium, iridium, rhenium, rhodium, gold, silver, ruthenium oxide, tin oxide, titanium monoxide, indium oxide, rhenium oxide, osmium oxide, rhodium oxide, iridium oxide, doped tin oxide, doped indium oxide, doped zinc oxide, ruthenium nitride, tin nitride, titanium nitride, zirconium nitride, YBa 2 Cu 3 O 7-x , (La,Sr)CoO 3 , SrRuO 3 , and combinations thereof.
Claim 21
Dependent Claim
51 words
The method according to claim 15, wherein said high-dielectric-constant material layer is selected from the group consisting of: barium strontium titanate, lead zirconate titanate, lead lanthanum titanate, lead lanthanum zirconate titanate, bismuth titanate, potassium tantalate, lead scandium tantalate, lead niobate, lead zinc niobate, potassium niobate, lead magnesium niobate, and combinations thereof.
Claim 22
Dependent Claim
20 words
The method according to claim 16, said method further comprises forming a platinum upper electrode on said high-dielectric-constant material layer.
References Cited (Backward Citations)
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