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US5559052A Expired / Lapsed US ⏱️ 0.0 years remaining

Integrated circuit fabrication with interlevel dielectric

Assignee: Nokia of America Corp
•
Filing: 1994-12-29
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Granted: 1996-09-24
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Expires: 2014-12-29
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Abstract

Abstract An interlevel dielectric comprised of phosphorus-doped glass surrounding the second polysilicon level of an SRAM cell is disclosed. The second polysilicon is generally a cell local interconnect. The phosphorus-doped glass layer efficiently getters sodium from underlying layers. The phosphorus-doped glass layer is utilized although another doped gettering layer may be used at a higher level of the circuit.

Inventors

  • 👤 Kuo-Hua Lee
  • 👤 Chen-Hua D. Yu

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 19:53
CPC Classifications
H; H10; H10B; H10B10/00; H10B10/15; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; H10P14/6923; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6336; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/0698; Y; Y10; Y10S; Y10S257/00; Y10S257/903; Y10S257/904

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 84 words
A method of integrated circuit fabrication comprising; forming a gate upon a substrate; forming a first dielectric layer over said gate; forming a first patterned conductor upon said first dielectric; forming a second doped dielectric over said patterned conductor and over said first dielectric; heating said second doped dielectric to attract sodium ions; forming a second patterned conductor over said second doped dielectric; and forming a third doped dielectric overlying said second patterned conductor, said third doped dielectric being capable of gettering sodium ions.
Claim 2
Independent Claim 84 words
A method of integrated circuit fabrication comprising; forming a gate upon a substrate; forming a first dielectric layer over said gate; forming a first patterned conductor upon said first dielectric; forming a second doped dielectric over said patterned conductor and over said first dielectric; heating said second doped dielectric to attract sodium ions; forming a second patterned conductor over said second doped dielectric; and forming a third doped dielectric overlying said second patterned conductor, said third doped dielectric being capable of gettering sodium ions.
Claim 3
Dependent Claim 23 words
The method of claim 1 in which a fourth undoped dielectric is formed between said second patterned conductor and said third doped dielectric.
Claim 4
Dependent Claim 18 words
The method of claim 1 in which a fifth undoped dielectric is formed over said third doped dielectric.
Claim 5
Dependent Claim 20 words
The method of claim 3 in which at least one level of metallization is formed over said fifth undoped dielectric.
Claim 6
Dependent Claim 13 words
The method of claim 1 in which said integrated circuit includes an SRAM.
Claim 7
Dependent Claim 25 words
The method of claim 1 in which said second doped dielectric is made from a material chosen from the group consisting of p-glass and PE-PTEOS.
Claim 8
Dependent Claim 21 words
The method of claim 1 in which said second doped dielectric is heated to a temperature between 800° and 850° C.
Claim 9
Dependent Claim 20 words
The method of claim 1 in which said gate and said first and second patterned conductors are formed from polysilicon.
Claim 10
Dependent Claim 17 words
The method of claim 8 in which at least one of said conductors has an overlying silicide.

References Cited (Backward Citations)

JPS5555538A Cited
JPS5632732A Cited
JPS5728335A Cited
JPS5756221A Cited
JPS6074550A Cited
US4731346A Cited
US4589928A Cited
JPS6195533A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1999-09-24 2000-03-25 2000-09-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2003-09-24 2004-03-25 2004-09-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2007-09-24 2008-03-25 2008-09-24 $7700.00 Window Closed / Lapsed

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