Semiconductor device and method of forming the same

Claim 2

A semiconductor device comprising: a semiconductor substrate; element isolation films formed on said semiconductor substrate; a plurality of element isolation regions separated from each other by means of said element isolation films, at least one element isolation region bounded by said element isolation films comprising: source and drain regions formed on a surface portion of said semiconductor substrate in spaced apart relation from each other to define a channel region therebetween, a gate insulating film formed on said channel region, a floating gate disposed on said gate insulating film such that both ends thereof overlap end portions of said element isolation films bounding said surface portion, an insulating film formed to cover said floating gate, and a control gate disposed on said insulating film and on said element isolation films such that said control gate is formed in part directly on said element isolation films bounding said at least one element isolation region and in part on said insulating film covering said floating gate whose ends in turn are formed directly on said element isolation film; and channel stop diffusion layers formed in said semiconductor substrate along lower surfaces of said element isolation films for preventing the inversion of channels in said element isolation regions, each of said channel stop diffusion layers being comprised of a single layer; wherein said semiconductor substrate under each element isolation film bounding said at least one element isolation region has a first region which inverts and a second region that does not invert with respect to conductivity type when a potential is applied to the control gate, said first region being disposed at a position where the control gate is directly formed on the upper surface of the element isolation film, said second region being disposed at a position where the control gate is formed on the upper surface of the element isolation film via the floating gate.

Claim 3

The semiconductor device according to claim 1, wherein said element isolation films have different thicknesses in the areas beneath the first and second regions.

Claim 4

The semiconductor device according to claim 2, wherein said element isolation films have a greater thickness in an area beneath said first region than that beneath said second regions.

Claim 5

The semiconductor device according to claim 1, wherein said channel stop diffusion layers have different impurity concentrations in areas beneath said first and second regions.

Claim 6

The semiconductor device according to claim 1, wherein said element isolation films have different thicknesses beneath said first and second regions and said channel stop diffusion layers have different impurity concentrations in areas beneath said first and second regions.

Claim 7

The semiconductor device according to claim 1, wherein said channel stop diffusion layer contains impurities in a concentration ranging from 3×10 12 /cm 2 to 7×10 13 /cm 2 .

Claim 8

The semiconductor device of claim 1, wherein said first region inverts and said second region does not invert with respect to conductivity type when the floating gate is subject to a potential equal to about 60% of said potential applied to the control gate.

Claim 9

A semiconductor device comprising: a semiconductor substrate; element isolation films formed on said semiconductor substrate; a plurality of element isolation regions separated from each other by means of said element isolation films, at least one element isolation region bounded by said element isolation film comprising: source and drain regions formed on a surface portion of said semiconductor substrate in spaced apart relation from each other to define a channel region therebetween, a gate insulating film formed on said channel region, a floating gate disposed on said gate insulating film such that both ends thereof overlap end portions of said element isolation films bounding said surface portion, an insulating film formed to cover said floating gate, and a control gate disposed on said insulating film and on said element isolation films such that said control gate is formed in part directly on said element isolation films bounding said at least one element isolation region and in part on said insulating film covering said floating gate whose ends in turn are formed directly on said element isolation films bounding said at least one element isolation region; and channel stop diffusion layers formed in said semiconductor substrate along lower surfaces of said element isolation films for preventing the inversion of channels in said element isolation regions, each of the channel stop diffusion layers being comprised of a single layer; said element isolation films having a thickness at locations where said control gate is formed directly thereon and said channel stop diffusion layers having an impurity concentration such that first portions of the surface of said semiconductor substrate beneath said element isolation films at said locations where said control gate is formed directly on said element isolation films invert with respect to conductivity type while second portions of the surface of the substrate beneath the element isolation films at locations where said control gate is not directly formed on said element isolation films do not invert when a potential is applied to the control gate.

Claim 10

A semiconductor device comprising: a semiconductor substrate; element isolation films formed on said semiconductor substrate; a plurality of element isolation regions separated from each other by means of said element isolation films, at least one element isolation region bounded by said element isolation film comprising: source and drain regions formed on a surface portion of said semiconductor substrate in spaced apart relation from each other to define a channel region therebetween, a gate insulating film formed on said channel region, a floating gate disposed on said gate insulating film such that both ends thereof overlap end portions of said element isolation films bounding said surface portion, an insulating film formed to cover said floating gate, and a control gate disposed on said insulating film and on said element isolation films such that said control gate is formed in part directly on said element isolation films bounding said at least one element isolation region and in part on said insulating film covering said floating gate whose ends in turn are formed directly on said element isolation films bounding said at least one element isolation region; and channel stop diffusion layers formed in said semiconductor substrate along lower surfaces of said element isolation films for preventing the inversion of channels in said element isolation regions, each of the channel stop diffusion layers being comprised of a single layer; said element isolation films having a thickness at locations where said control gate is formed directly thereon and said channel stop diffusion layers having an impurity concentration such that first portions of the surface of said semiconductor substrate beneath said element isolation films at said locations where said control gate is formed directly on said element isolation films invert with respect to conductivity type while second portions of the surface of the substrate beneath the element isolation films at locations where said control gate is not directly formed on said element isolation films do not invert when a potential is applied to the control gate.

Claim 11

The semiconductor device of claim 8, wherein said element isolation films are thickner beneath said first portions than said second portions.

Claim 12

The semiconductor device of claim 8, wherein the channel stop diffusion layer contains impurities in a concentration ranging from 3×10 12 /cm 2 to 7×10 13 /cm 2 .

Claim 13

The semiconductor device of claim 8, wherein said first portion inverts and said second portion does not invert with respect to conductivity type when the floating gate is subject to a potential equal to about 60% of said potential applied to the control gate.

Claim 14

A semiconductor device comprising: a semiconductor substrate; element isolation films formed on said semiconductor substrate; a plurality of element isolation regions separated from each other by means of said element isolation films, at least one element isolation region bounded by said element isolation film comprising: source and drain regions formed on a surface portion of said semiconductor substrate in spaced apart relation from each other to define a channel region therebetween, a gate insulating film formed on said channel region, a floating gate disposed on said gate insulating film such that both ends thereof overlap end portions of said element isolation films bounding said surface portion, an insulating film formed to cover said floating gate, and a control gate disposed on said insulating film and on said element isolation films such that said control gate is formed in part directly on said element isolation films bounding said at least one element isolation region and in part on said insulating film covering said floating gate whose ends in turn are formed directly on said element isolation films bounding said at least one element isolation region; and channel stop diffusion layers formed in said semiconductor substrate along lower surfaces of said element isolation films for preventing the inversion of channels in said element isolation regions, each of the channels top diffusion layers being comprised of a single layer; said element isolation films having a thickness at locations where said control gate is formed directly thereon and said channel stop diffusion layers having an impurity concentration such that first portions of the surface of said semiconductor substrate beneath said element isolation films at said locations where said control gate is formed directly on said element isolation films invert with respect to conductivity type while second portions of the surface of the substrate beneath the element isolation films at locations where said control gate is not directly formed on said element isolation films do not invert when a potential is applied to the control gate and when the floating gate is subject to a potential at least equal to about 60% of a potential applied to the control gate.

Claim 15

A semiconductor device comprising: a semiconductor substrate; element isolation films formed on said semiconductor substrate; a plurality of element isolation regions separated from each other by means of said element isolation films, at least one element isolation region bounded by said element isolation film comprising: source and drain regions formed on a surface portion of said semiconductor substrate in spaced apart relation from each other to define a channel region therebetween, a gate insulating film formed on said channel region, a floating gate disposed on said gate insulating film such that both ends thereof overlap end portions of said element isolation films bounding said surface portion, an insulating film formed to cover said floating gate, and a control gate disposed on said insulating film and on said element isolation films such that said control gate is formed in part directly on said element isolation films bounding said at least one element isolation region and in part on said insulating film covering said floating gate whose ends in turn are formed directly on said element isolation films bounding said at least one element isolation region; and channel stop diffusion layers formed in said semiconductor substrate along lower surfaces of said element isolation films for preventing the inversion of channels in said element isolation regions, each of the channels top diffusion layers being comprised of a single layer; said element isolation films having a thickness at locations where said control gate is formed directly thereon and said channel stop diffusion layers having an impurity concentration such that first portions of the surface of said semiconductor substrate beneath said element isolation films at said locations where said control gate is formed directly on said element isolation films invert with respect to conductivity type while second portions of the surface of the substrate beneath the element isolation films at locations where said control gate is not directly formed on said element isolation films do not invert when a potential is applied to the control gate and when the floating gate is subject to a potential at least equal to about 60% of a potential applied to the control gate.