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US5523596A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor device having capacitor and manufacturing method therefor

Assignee: VACHELLIA LLC
•
Filing: 1995-03-14
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Granted: 1996-06-04
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Expires: 2015-03-14
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Abstract

Abstract A capacitor includes a polycrystalline silicon layer 1 as a lower electrode layer, a dielectric layer 112, and a polycrystalline silicon layer 113 as an upper electrode layer. The dielectric layer 112 is formed by an oxynitride film 2, a silicon nitride film 3 and a top oxide film 4. A film thickness t 3 of the top oxide film 4 is controlled to be less than 20 Å. Capacitance of the capacitor can be increased while improving the duration of life of the dielectric layer, resulting in a highly reliable capacitor.

Inventors

  • 👤 Makoto Ohi
  • 👤 Hideaki Arima
  • 👤 Natsuo Ajika

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:24
CPC Classifications
H; H10; H10B; H10B12/00; H10B12/01; H10B12/02; H10B12/03; H10B12/033; H10B12/30; H10B12/31; Y; Y10; Y10S; Y10S438/00; Y10S438/954

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 107 words
A semiconductor device having a capacitor, comprising: a first electrode layer formed on a semiconductor substrate, a dielectric layer formed on said first electrode layer, and a second electrode layer formed on said dielectric layer, said dielectric layer including: a silicon oxynitride film having a thickness in the range of 17 Å to 25 Å formed on said first electrode layer, a silicon nitride film having a thickness in the range of 20 Å to 50 Å formed on said oxynitride film, and a silicon oxide film formed on said nitride film and having a thickness in the range of 5 Å to less than 20 Å.
Claim 2
Dependent Claim 107 words
A semiconductor device having a capacitor, comprising: a first electrode layer formed on a semiconductor substrate, a dielectric layer formed on said first electrode layer, and a second electrode layer formed on said dielectric layer, said dielectric layer including: a silicon oxynitride film having a thickness in the range of 17 Å to 25 Å formed on said first electrode layer, a silicon nitride film having a thickness in the range of 20 Å to 50 Å formed on said oxynitride film, and a silicon oxide film formed on said nitride film and having a thickness in the range of 5 Å to less than 20 Å.
Claim 3
Dependent Claim 17 words
The semiconductor device according to claim 1, wherein said capacitor is capacitor in memory cell of DRAM.
Claim 4
Dependent Claim 103 words
A semiconductor device having a capacitor, comprising: a first electrode layer formed on a semiconductor substrate, a dielectric layer having an overall thickness in the range of 42 Å to less than 95 Å formed on said first electrode layer, and a second electrode layer formed on said dielectric layer, said dielectric layer including: a silicon oxynitride film formed on said first electrode layer, a silicon nitride film having a thickness in the range of 20 Å to 50 Å formed on said oxynitride film, and a silicon oxide film formed on said nitride film and having a thickness less than 20 Å.
Claim 5
Dependent Claim 103 words
A semiconductor device having a capacitor, comprising: a first electrode layer formed on a semiconductor substrate, a dielectric layer having an overall thickness in the range of 42 Å to less than 95 Å formed on said first electrode layer, and a second electrode layer formed on said dielectric layer, said dielectric layer including: a silicon oxynitride film formed on said first electrode layer, a silicon nitride film having a thickness in the range of 20 Å to 50 Å formed on said oxynitride film, and a silicon oxide film formed on said nitride film and having a thickness less than 20 Å.
Claim 6
Dependent Claim 17 words
The semiconductor device according to claim 3, wherein said capacitor is capacitor in memory cell of DRAM.

References Cited (Backward Citations)

US4907046A Cited
JPS63316456A Cited
US4943836A Cited
JPH0216763A Cited
US4990463A Cited
EP0376685A1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1999-06-04 1999-12-04 2000-06-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2003-06-04 2003-12-04 2004-06-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2007-06-04 2007-12-04 2008-06-04 $7700.00 Window Closed / Lapsed

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