Corrosion-resistant apparatus

Claim 2

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising: (a) a plasma processing chamber; and (b) a plurality of metal components exposed to plasma in the plasma process chamber, wherein at least one metal component has a corrosion-resistant coating comprising: (i) a nickel coating on the metal component; and (ii) a rhodium coating on the nickel coating.

Claim 3

The apparatus of claim 1 wherein the thickness of the nickel coating is from about 200 to about 600 microinches.

Claim 4

The apparatus of claim 1 wherein the thickness of the rhodium coating is at least about 10 microinches.

Claim 5

The corrosion-resistant apparatus of claim 1, wherein the apparatus comprises at least one of the following components: (a) positioning components for positioning the substrate; (b) gas inlet components for introducing process gas around the substrate; (c) gas exhaust components for exhausting gases from around the substrate; and (d) plasma generating components for generating the plasma around the substrate.

Claim 6

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising: (a) a plasma processing chamber; and (b) positioning components for positioning the substrate in the chamber, at least one of the positioning components being a component that is partially made of metal, exposed to the plasma in the chamber, and having a corrosion-resistant coating comprising rhodium.

Claim 7

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising: (a) a plasma processing chamber; and (b) positioning components for positioning the substrate in the chamber, at least one of the positioning components being a component that is partially made of metal, exposed to the plasma in the chamber, and having a corrosion-resistant coating comprising rhodium.

Claim 8

The apparatus of claim 5 where the thickness of the corrosion-resistant coating is at least about 10 microinches.

Claim 9

The apparatus of claim 5 further comprising a nickel coating between the corrosion-resistant coating and the component that is partially made of metal.

Claim 10

The apparatus of claim 7 wherein the thickness of the nickel coating is from about 200 to about 600 microinches.

Claim 11

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising: (a) a plasma processing chamber; and (b) gas inlet components for introducing a process gas into the chamber at least one of the gas inlet components being a component that is partially made of metal, exposed to the plasma in the chamber, and having a corrosion-resistant coating comprising rhodium.

Claim 12

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising: (a) a plasma processing chamber; and (b) gas inlet components for introducing a process gas into the chamber at least one of the gas inlet components being a component that is partially made of metal, exposed to the plasma in the chamber, and having a corrosion-resistant coating comprising rhodium.

Claim 13

The apparatus of claim 9 where the thickness of the corrosion-resistant coating is at least about 10 microinches.

Claim 14

The apparatus of claim 9 further comprising a nickel coating between the corrosion-resistant coating and the component that is partially made of metal.

Claim 15

The apparatus of claim 11 wherein the thickness of the nickel coating is from about 200 to about 600 microinches.

Claim 16

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising: (a) a plasma processing chamber; and (b) gas exhaust components for exhausting gases from the chamber, at least one of the gas exhaust components being a component that is partially made of metal, exposed to the plasma in the chamber, and having a corrosion-resisitant coating comprising rhodium.

Claim 17

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising: (a) a plasma processing chamber; and (b) gas exhaust components for exhausting gases from the chamber, at least one of the gas exhaust components being a component that is partially made of metal, exposed to the plasma in the chamber, and having a corrosion-resisitant coating comprising rhodium.

Claim 18

The apparatus of claim 13 where the thickness of the corrosion-resistant coating is at least about 10 microinches.

Claim 19

The apparatus of claim 13 further comprising a nickel coating between the corrosion-resistant coating and the component that is partially made of metal.

Claim 20

The apparatus of claim 15 wherein the thickness of the nickel coating is from about 200 to about 600 microinches.

Claim 21

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising: (a) a plasma processing chamber; and (b) plasma generating components for generating a plasma in the chamber, at least one of the plasma generating components being a component that is partially made of metal, exposed to the plasma in the chamber, and having a corrosion-resistant coating comprising rhodium.

Claim 22

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising: (a) a plasma processing chamber; and (b) plasma generating components for generating a plasma in the chamber, at least one of the plasma generating components being a component that is partially made of metal, exposed to the plasma in the chamber, and having a corrosion-resistant coating comprising rhodium.

Claim 23

The apparatus of claim 17 wherein the thickness of the corrosion-resistant coating is at least about 10 microinches.

Claim 24

The apparatus of claim 17 further comprising a nickel coating between the corrosion-resistant coating and the component that is partially made of metal.

Claim 25

The apparatus of claim 19, wherein the thickness of the nickel coating is from about 200 to about 600 microinches.

Claim 26

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising a processing chamber and processing components comprising: (a) positioning components for positioning the substrate in the chamber; (b) gas inlet components for introducing a process gas into the chamber; (c) gas exhaust components for exhausting gases from the chamber; and (d) plasma generating components for generating in the chamber the plasma from the process gas; wherein at least one of the processing components is a component that is partially made of metal, is exposed to the plasma in the chamber, and has a corrosion-resistant coating comprising rhodium.

Claim 27

A corrosion-resistant apparatus for processing a substrate in a plasma, the apparatus comprising a processing chamber and processing components comprising: (a) positioning components for positioning the substrate in the chamber; (b) gas inlet components for introducing a process gas into the chamber; (c) gas exhaust components for exhausting gases from the chamber; and (d) plasma generating components for generating in the chamber the plasma from the process gas; wherein at least one of the processing components is a component that is partially made of metal, is exposed to the plasma in the chamber, and has a corrosion-resistant coating comprising rhodium.

Claim 28

The apparatus of claim 21 further comprising metal fasteners for fastening the positioning components, the gas inlet components, and the gas exhaust components to the chamber, wherein at least one of the metal fasteners is exposed to the plasma and is coated with the corrosion-resistant coating.

Claim 29

The apparatus of claim 21, wherein the gas inlet components further comprises: (a) a top plate having at least one process gas inlet hole therethrough for introducing process gas into the chamber; (b) a plurality of perforated plates proximate to the gas inlet hole for distributing the process gas in the chamber; and (c) fasteners for fastening the perforated plates to the top plate, wherein the perforated plates and the fasteners are coated with the corrosion-resistant coating.

Claim 30

The apparatus of claim 21, wherein the positioning components comprise: (a) a support plate, having a plurality of holes therethrough, and a mounting arm extending outwardly therefrom; (b) support lift bellows fixedly attached to the support plate mounting arm by fasteners, for lifting and lowering the support plate; and (c) a lift finger assembly comprising: (i) lift fingers having prongs, the prongs sized to fit into the support plate holes; and (ii) lift finger bellows attached to the lift fingers by fasteners, for lifting and lowering the lift fingers, so that the lift finger prongs when inserted through the support plate holes can lift and lower wafers onto the support plate, wherein the fasteners, the support lift bellows, and the lift finger bellows are coated with the corrosion-resistant coating.

Claim 31

The apparatus of claim 21 where the thickness of the corrosion-resistant coating is at least about 10 microinches.

Claim 32

The apparatus of claim 25 where the thickness of the corrosion-resistant coating is from about 10 to about 100 microinches.

Claim 33

The apparatus of claim 26 where the thickness of the corrosion-resistant coating is from about 20 to about 60 microinches.

Claim 34

The apparatus of claim 27 where the thickness of the corrosion-resistant coating is about 40 microinches.

Claim 35

The apparatus of claim 21 further comprising a nickel coating between the corrosion-resistant coating and the component that is partially made of metal.

Claim 36

The apparatus of claim 29 wherein the thickness of the nickel coating is from about 200 to about 600 microinches.

Claim 37

The apparatus of claim 29 wherein the thickness of the nickel coating is about 400 microinches.