US3708418A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for etching of thin layers of material by ion bombardment
Assignee: RCA Corp
•
Filing: 1970-03-05
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Granted: 1973-01-02
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Expires: 1990-03-05
Abstract
Abstract A method of etching thin layers of material by bombarding a target with accelerated ions in the presence of a magnetic field parallel to the path of the accelerated ions and including apparatus to carry out the method. A voltage is applied to glow discharge electrodes in a vacuum environment causing plasma formation between the electrodes and accelerating the resultant ions toward a target to be etched. A magnetic field parallel to the accelerating electric field is provided to condense the ionic stream and cause more ions to strike the target. Some form of masking is utilized to define the desired pattern of holes in the surface layer of the target.
Inventors
- 👤 R Quinn
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 08:51
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H10; H10P; H10P50/00; H10P50/20
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
US2702274A
Cited
US3121852A
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US3233137A
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US3170810A
Cited
US3271286A
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US3410774A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-01-02 | 1976-07-03 | 1977-01-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-01-02 | 1980-07-03 | 1981-01-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-01-02 | 1984-07-03 | 1985-01-02 | $7700.00 | Window Closed / Lapsed |