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Low temperature process for fabricating layered superlattice materialsand making electronic devices including same

Assignee: Symetrix Corp
•
Filing: 1995-03-21
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Granted: 1996-04-16
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Expires: 2015-03-21
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Abstract

Abstract A liquid precursor containing a metal is applied to a first electrode, RTP baked at a temperature of 700° C., and annealed at the same temperature for from 3 to 5 hours to form a layered superlattice material. A second electrode is formed to form a capacitor, and a second anneal is performed at a temperature of 700° C. If the material is strontium bismuth tantalate, the precursor contains u mole-equivalents of strontium, v mole-equivalents of bismuth, and w mole-equivalents of tantalum, where 0.8≦u≦1.0, 2.0 v≦2.3, and 1.9≦w≦2.1.

Inventors

  • 👤 Takeshi Ito
  • 👤 Carlos A. Paz de Araujo
  • 👤 Hitoshi Watanabe
  • 👤 Michael C. Scott

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:01
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6938; H10P14/69398; C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45561; C23C18/00; C23C18/02; C23C18/12; C23C18/1204; C23C18/1208; C23C18/1216; C23C18/1225; C23C18/125; C23C18/1295; C30; C30B; C30B29/00; C30B29/60; C30B29/68; C30B7/00; C30B7/005; H01; H01C; H01C7/00; H01C7/10; H01C7/1013; H10B; H10B12/00; H10B12/30; H10B53/00; H10D; H10D1/00; H10D1/60; H10D1/68; H10D1/682; H10D1/684; H10D1/692; H10P14/66; H10P14/662; H10P14/668; H10P14/63; H10P14/6326; H10P14/6342; H10P14/65; H10P14/6516; H10P14/6529

Claims Analysis

Total Claims: 34
Claim 1
Independent Claim 64 words
A method of fabricating a layered superlattice material comprising: providing a substrate, and a precursor containing metal moieties in effective amounts for spontaneously forming a layered superlattice material upon heating said precursor; applying said precursor to said substrate; and heating said precursor on said substrate to a temperature of between 600° C. and 700° C. to form said layered superlattice material on said substrate.
Claim 2
Independent Claim 64 words
A method of fabricating a layered superlattice material comprising: providing a substrate, and a precursor containing metal moieties in effective amounts for spontaneously forming a layered superlattice material upon heating said precursor; applying said precursor to said substrate; and heating said precursor on said substrate to a temperature of between 600° C. and 700° C. to form said layered superlattice material on said substrate.
Claim 3
Dependent Claim 32 words
A method as in claim 1 wherein said step of heating comprises rapid thermal processing at a temperature of about 700° C. and then annealing at a temperature of about 700° C.
Claim 4
Dependent Claim 18 words
A method as in claim 2 wherein said step of annealing comprises annealing for at least five hours.
Claim 5
Dependent Claim 50 words
A method as in claim 2 wherein said substrate comprises a first electrode, and further comprising the steps of forming a second electrode on said layered superlattice material, after said step of annealing, to form a capacitor, and subsequently performing a second anneal at a temperature of about 700° C.
Claim 6
Dependent Claim 28 words
A method as in claim 1 wherein said precursor includes u mole-equivalents of strontium, v mole-equivalents of bismuth, and w mole-equivalents of tantalum, and 0.8≦u≦1.0, 2.0≦v≦2.3, and 1.9≦w≦2.1.
Claim 7
Dependent Claim 27 words
A method as in claim 1 wherein said step of providing a substrate comprises forming an adhesion layer and then forming an electrode on said adhesion layer.
Claim 8
Dependent Claim 17 words
A method as in claim 6 wherein said adhesion layer comprises titanium and said electrode comprises platinum.
Claim 9
Independent Claim 75 words
A method of fabricating a layered superlattice material comprising: providing a substrate, and a precursor containing metal moieties in effective amounts for spontaneously forming a layered superlattice material upon drying and annealing said precursor; applying said precursor to said substrate; drying said precursor to form a solid material on said substrate; and annealing said solid material at a temperature of between 600° C. and 725° C. to form said layered superlattice material on said substrate.
Claim 10
Independent Claim 75 words
A method of fabricating a layered superlattice material comprising: providing a substrate, and a precursor containing metal moieties in effective amounts for spontaneously forming a layered superlattice material upon drying and annealing said precursor; applying said precursor to said substrate; drying said precursor to form a solid material on said substrate; and annealing said solid material at a temperature of between 600° C. and 725° C. to form said layered superlattice material on said substrate.
Claim 11
Dependent Claim 25 words
A method as in claim 8 wherein said step of drying comprises rapid thermal processing said precursor at a temperature of up to 725° C.
Claim 12
Dependent Claim 16 words
A method as in claim 9 wherein said rapid thermal processing temperature is about 700° C.
Claim 13
Dependent Claim 14 words
A method as in claim 8 wherein said annealing temperature is about 700° C.
Claim 14
Dependent Claim 20 words
A method as in claim 11 wherein said step of annealing comprises annealing said material for at least 3 hours.
Claim 15
Dependent Claim 16 words
A method as in claim 5 wherein said material is annealed for at least five hours.
Claim 16
Dependent Claim 51 words
A method as in claim 8 wherein said substrate comprises a first electrode, and further comprising the steps of forming a second electrode on said layered superlattice material, after said step of annealing, to form a capacitor, and subsequently performing a second anneal at a temperature of up to 725° C.
Claim 17
Dependent Claim 15 words
A method as in claim 14 wherein said second anneal temperature is about 700° C.
Claim 18
Dependent Claim 15 words
A method as in claim 8 wherein said layered superlattice material comprises strontium bismuth tantalate.
Claim 19
Dependent Claim 28 words
A method as in claim 16 wherein said precursor includes u mole-equivalents of strontium, v mole-equivalents of bismuth, and w mole-equivalents of tantalum, and 0.8≦w≦1.0, 2.0≦v≦2.3, and 1.9≦w≦2.1.
Claim 20
Dependent Claim 11 words
A method as in claim 17 wherein u=0.9, v=2.1, and w=2.
Claim 21
Dependent Claim 12 words
A method as in claim 17 wherein u=0.85 , v=2.2, and w=2.
Claim 22
Dependent Claim 27 words
A method as in claim 8 wherein said step of providing a substrate comprises forming an adhesion layer and then forming an electrode on said adhesion layer.
Claim 23
Dependent Claim 17 words
A method as in claim 20 wherein said adhesion layer comprises titanium and said electrode comprises platinum.
Claim 24
Independent Claim 74 words
A method of fabricating layered superlattice material comprising: providing a substrate and a precursor containing metal moieties in effective amounts for spontaneously forming a layered superlattice material upon heating said precursor; forming an adhesion layer on said substrate; forming an electrode on said adhesion layer; applying said precursor to said substrate; and heating said precursor on said substrate to a temperature of about 700° C. to form said layered supperlattice material on said substrate.
Claim 25
Independent Claim 74 words
A method of fabricating layered superlattice material comprising: providing a substrate and a precursor containing metal moieties in effective amounts for spontaneously forming a layered superlattice material upon heating said precursor; forming an adhesion layer on said substrate; forming an electrode on said adhesion layer; applying said precursor to said substrate; and heating said precursor on said substrate to a temperature of about 700° C. to form said layered supperlattice material on said substrate.
Claim 26
Dependent Claim 31 words
A method as in claim 22 wherein said step of heating comprises rapid thermal processing at a temperature of 700° C. and then annealing at a temperature of about 700° C.
Claim 27
Dependent Claim 50 words
A method as in claim 23 wherein said substrate comprises a first electrode, and further comprising the steps of forming a second electrode on said layered superlattice material, after said step of annealing, to form a capacitor, and subsequently performing a second anneal at a temperature of about 700° C.
Claim 28
Dependent Claim 18 words
A method as in claim 23 wherein said step of annealing comprises annealing for at least 3 hours.
Claim 29
Dependent Claim 18 words
A method as in claim 23 wherein said step of annealing comprises annealing for at least 5 hours.
Claim 30
Dependent Claim 17 words
A method as in claim 22 wherein said adhesion layer comrpises titanium and said electrode comprises platinum.
Claim 31
Independent Claim 59 words
A method of fabricating a layered superlattice material comprising: providing a substrate, and a precursor containing u mole-equivalents of strontium, v mole-equivalents of bismuth, and w mole-equivalents of tantalum, where 0.8≦u≦1.0, 2.0≦v≦2.3, and 1.9≦w≦2.1; applying said precursor to said substrate; and heating said precursor on said substrate to form a thin film of strontium bismuth tantalate on said substrate.
Claim 32
Independent Claim 59 words
A method of fabricating a layered superlattice material comprising: providing a substrate, and a precursor containing u mole-equivalents of strontium, v mole-equivalents of bismuth, and w mole-equivalents of tantalum, where 0.8≦u≦1.0, 2.0≦v≦2.3, and 1.9≦w≦2.1; applying said precursor to said substrate; and heating said precursor on said substrate to form a thin film of strontium bismuth tantalate on said substrate.
Claim 33
Dependent Claim 11 words
A method as in claim 28 wherein u=0.85, v=2.2, and w=2.
Claim 34
Dependent Claim 11 words
A method as in claim 28 wherein u=0.9, v=2.1, and w=2.

References Cited (Backward Citations)

US5046043A Cited
US5423285A Cited
US5434102A Cited
US5439845A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1999-04-16 1999-10-16 2000-04-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2003-04-16 2003-10-16 2004-04-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2007-04-16 2007-10-16 2008-04-16 $7700.00 Window Closed / Lapsed

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