Patent US5501925A successfully refreshed from Google Patents.
US5501925A
Expired / Lapsed
US
⏱️ 0.0 years remaining
High power masks and methods for manufacturing same
Assignee: LITEL INTERCONNECT Inc
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Filing: 1994-05-27
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Granted: 1996-03-26
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Expires: 2014-05-27
Abstract
Abstract A method and apparatus for the production of transparent phase reticule mask for projecting high intensity light--such as that used for direct laser ablation of materials from substrates--is disclosed. The transparent phase reticule mask includes first portions which are for scattering light beyond the solid angle of an imaging system and second transparent portions which scatter light to an angle where projection by an imaging system can occur. Phase reticule mask configurations are disclosed including a known phase reticule mask which has gratings, and a new phase reticule mask having random phase roughening for the scattering of light. Random phase roughening includes imparting to the roughened area a mean solid angle of scattering that exceeds the solid angle of collection of an image system. Thus, the total fraction of incident light is below the ablation threshold and constitutes the dark patterned region of the mask. Techniques for fabrication are disclosed with include constructively/destructively interfering waves for patterning photoresist for the formation of half wave gratings, and phase roughening utilizing a speckle pattern exposure. In each case, exposure of transparent portions of the mask from the opposite side of the mask renders the double exposed portion of the mask suitable for light transmission with the remaining portions of the mask for light scattering. A method of phase roughening is also disclosed which includes exposure of the blocking area of the mask to an acid etch to impart the blocking regions of the mask.
Inventors
- 👤 Adlai H. Smith
- 👤 Robert O. Hunter, Jr.
- 👤 Bruce B. McArthur
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 12:45
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/50
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
169 words
A mask for use with a lens imaging system for projecting light from said mask for processing a workpiece, said mask for transmitting light to be imaged on said workpiece to the receiving aperture of an imaging system for projection on said workpiece, said mask comprising: a transparent plate; first patterned areas on said transparent plate for producing light images on said workpiece with sufficient intensity to process said workpiece, said first patterned areas having transmission of light within the receiving aperture of said imaging system; second patterned areas on said transparent plate for producing light images on said workpiece with insufficient intensity to process said workpiece, said second patterned areas scattering a first substantial fraction of light outside of the receiving aperture of said imaging system and a second remaining fraction of light within the receiving aperture of said imaging system whereby said second areas produce images of reduced intensity on said workpiece through the receiving aperture of said imaging system with insufficient intensity to process said workpiece.
Claim 2
Dependent Claim
169 words
A mask for use with a lens imaging system for projecting light from said mask for processing a workpiece, said mask for transmitting light to be imaged on said workpiece to the receiving aperture of an imaging system for projection on said workpiece, said mask comprising: a transparent plate; first patterned areas on said transparent plate for producing light images on said workpiece with sufficient intensity to process said workpiece, said first patterned areas having transmission of light within the receiving aperture of said imaging system; second patterned areas on said transparent plate for producing light images on said workpiece with insufficient intensity to process said workpiece, said second patterned areas scattering a first substantial fraction of light outside of the receiving aperture of said imaging system and a second remaining fraction of light within the receiving aperture of said imaging system whereby said second areas produce images of reduced intensity on said workpiece through the receiving aperture of said imaging system with insufficient intensity to process said workpiece.
Claim 3
Dependent Claim
40 words
A mask for use with a lens imaging system for projecting light from said mask for processing a workpiece according to claim 1 and wherein: said second patterned areas include a surface produced by an acid etch on said plate.
Claim 4
Dependent Claim
41 words
A mask for use with a lens imaging system for projecting light from said mask for processing a workpiece according to claim 1 and wherein: said second patterned areas include a surface produced by exposing said photoresist with a random pattern.
Claim 5
Dependent Claim
261 words
A process of patterned laser ablation of a workpiece, said process including a mask for use with a lens imaging system for projecting coherent light through said mask for processing a workpiece, said mask for transmitting light to be imaged on said workpiece to the receiving aperture of a imaging system for projection on said workpiece, said process comprising the steps of: providing a workpiece having a region for laser ablation, said region for laser ablation having an ablation threshold where light fluence having an intensity below said ablation threshold does not produce ablation and light fluence above said threshold does produce ablation; providing a transparent plate; providing a lens imaging system having a receiving aperture relative to said plate for projecting light from said plate with sufficient intensity to ablate said workpiece; providing first patterned areas on said transparent plate for producing light images on said workpiece with fluence above said threshold for ablation of said workpiece, said first patterned areas having transmission of light within the receiving aperture of said imaging system; providing second patterned areas on said transparent plate for producing light images on said workpiece with insufficient intensity to ablate said workpiece, said second patterned areas scattering a first substantial fraction of light outside of the receiving aperture of said imaging system and a second remaining fraction of light within the receiving aperture of said imaging system whereby said second areas produce images of light fluence below said threshold on said workpiece through the receiving aperture of said imaging system with insufficient intensity to process said workpiece.
Claim 6
Dependent Claim
261 words
A process of patterned laser ablation of a workpiece, said process including a mask for use with a lens imaging system for projecting coherent light through said mask for processing a workpiece, said mask for transmitting light to be imaged on said workpiece to the receiving aperture of a imaging system for projection on said workpiece, said process comprising the steps of: providing a workpiece having a region for laser ablation, said region for laser ablation having an ablation threshold where light fluence having an intensity below said ablation threshold does not produce ablation and light fluence above said threshold does produce ablation; providing a transparent plate; providing a lens imaging system having a receiving aperture relative to said plate for projecting light from said plate with sufficient intensity to ablate said workpiece; providing first patterned areas on said transparent plate for producing light images on said workpiece with fluence above said threshold for ablation of said workpiece, said first patterned areas having transmission of light within the receiving aperture of said imaging system; providing second patterned areas on said transparent plate for producing light images on said workpiece with insufficient intensity to ablate said workpiece, said second patterned areas scattering a first substantial fraction of light outside of the receiving aperture of said imaging system and a second remaining fraction of light within the receiving aperture of said imaging system whereby said second areas produce images of light fluence below said threshold on said workpiece through the receiving aperture of said imaging system with insufficient intensity to process said workpiece.
Claim 7
Dependent Claim
40 words
A process of patterned laser ablation of a workpiece according to claim 4 and further comprising the steps of: providing said second patterned areas on said plate with an acid etch having an irregular surface sufficient to disperse said light.
Claim 8
Dependent Claim
39 words
A process of patterned laser ablation of a workpiece according to claim 4 and further comprising the steps of: providing said second patterned areas on said plate with a surface produced by exposing said photoresist with a random pattern.
Claim 9
Dependent Claim
49 words
A process of patterned laser ablation of a workpiece according to claim 4 and where said step of providing a lens imaging system includes: providing an enlarging lens imaging system for producing an image having ablated areas larger than but corresponding to said first patterned areas on said plate.
Claim 10
Dependent Claim
49 words
A process of patterned laser ablation of a workpiece according to claim 4 and where said step of providing a lens imaging system includes: providing a reducing lens imaging system for producing an image having ablated areas smaller than but corresponding to said first patterned areas on said plate.
Claim 11
Independent Claim
287 words
A method of producing a mask on a transparent plate for use with a projecting system having a receiving aperture for processing a workpiece with images from said mask, said method comprising the steps of: providing a transparent plate for the transmission of light through said plate for the processing of said workpiece; defining first regions on said plate having first patterns for producing from said first patterns images for transmission through the receiving aperture of said imaging system to process said workpiece with said images; defining second regions on said plate having second patterns for producing from said second patterns the scattering of at least a substantial fraction of light outside of said receiving aperture of a projecting system; masking said second regions on first side of said plate to prevent the transmission of light through said plate; applying photoresist over said plate coincident with said first and second defined regions; exposing with light sensitive to said photoresist all said photoresist on said transparent plate in a pattern over all said photoresist for scattering at least a substantial fraction of light outside of the receiving aperture of said imaging system; exposing with light sensitive to said photoresist said transparent plate from the opposite side of said plate and onto patterned photoresist over said first regions for exposing away said pattern and onto said masked second regions whereby light is blocked at said second regions from exposing away said pattern in said photoresist overlying said second regions; developing said second regions in said pattern; etching said glass from said developed second regions in said pattern; and, stripping said transparent plate of said developed photoresist to leave said second patterns etched on said plate at said second regions.
Claim 12
Independent Claim
287 words
A method of producing a mask on a transparent plate for use with a projecting system having a receiving aperture for processing a workpiece with images from said mask, said method comprising the steps of: providing a transparent plate for the transmission of light through said plate for the processing of said workpiece; defining first regions on said plate having first patterns for producing from said first patterns images for transmission through the receiving aperture of said imaging system to process said workpiece with said images; defining second regions on said plate having second patterns for producing from said second patterns the scattering of at least a substantial fraction of light outside of said receiving aperture of a projecting system; masking said second regions on first side of said plate to prevent the transmission of light through said plate; applying photoresist over said plate coincident with said first and second defined regions; exposing with light sensitive to said photoresist all said photoresist on said transparent plate in a pattern over all said photoresist for scattering at least a substantial fraction of light outside of the receiving aperture of said imaging system; exposing with light sensitive to said photoresist said transparent plate from the opposite side of said plate and onto patterned photoresist over said first regions for exposing away said pattern and onto said masked second regions whereby light is blocked at said second regions from exposing away said pattern in said photoresist overlying said second regions; developing said second regions in said pattern; etching said glass from said developed second regions in said pattern; and, stripping said transparent plate of said developed photoresist to leave said second patterns etched on said plate at said second regions.
Claim 13
Dependent Claim
101 words
A method of producing a mask on a transparent plate for use with a projecting system according to claim 9 and wherein: said exposing with light sensitive to said photoresist all said photoresist on said transparent plate in a pattern includes: exposing said photoresist with first and second coherent light beams, said beams having sufficient angularity with respect to said plate to expose said photoresist with periodic constructive interference in said photoresist coating on said plate; and, varying the angularity between said first and second coherent light beams to produce a desired period between points of constructive interference on said plate.
Claim 14
Dependent Claim
64 words
A method of producing a mask on a transparent plate for use with a projecting system according to claim 9 and wherein: exposing said photoresist with an irregular pattern including the further steps of: providing a reflecting surface having said irregular pattern; and reflecting light sensitive to said photoresist from said reflecting surface to said photoresist to expose said photoresist with said irregular pattern.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-03-26 | 1999-09-25 | 2000-03-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-03-26 | 2003-09-25 | 2004-03-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-03-26 | 2007-09-25 | 2008-03-26 | $7700.00 | Window Closed / Lapsed |