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US5480585A
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Stripping liquid compositions
Assignee: Nagase Electronic Chemicals Ltd
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Filing: 1995-04-28
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Granted: 1996-01-02
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Expires: 2015-04-28
Abstract
Abstract A photoresist stripping liquid composition comprising an alkanol amine compound, a sulfone compound or sulfoxide compound, and a hydroxy compound. The composition is excellent in its photoresist stripping performance, safety and working efficiency, and does not cause corrosion on a substrate possessing a metal film.
Inventors
- 👤 Shinichiro Shiotsu
- 👤 Yoshiaki Horiuchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 22:02
CPC Classifications
C; C11; C11D; C11D7/00; C11D7/22; C11D7/26; C11D7/261; C11D7/50; C11D7/5004; C11D7/5009; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/425; H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; C11D7/32; C11D7/34
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
173 words
A stripping liquid composition for stripping off a photoresist film applied on a substrate, comprising: (a) an alkanol amine compound expressed by the structural formula H 3-n N((CH 2 ) m OH) n (where m is 2 or 3, and n is 1, 2 or 3), (b) a sulfone compound or sulfoxide compound expressed by the structural formula R 1 --SO 2 --R 2 or R 1 --SO--R 2 (where R1 and R2 are independently alkyl groups with 1 or 2 carbon atoms, or mutually coupled and formed cyclic alkylene groups with 4, 5 or 6 carbon atoms), and (c) a hydroxy compound expressed by the structural formula C 6 H 6-n (OH) n (where n=1, 2 or 3) or C 6 H 6-m-n (OH) n R m (where n=1, 2, or 3, m=1 or 2, having at least a hydroxy group and at least an alkyl group or at least an alkoxy group added to a cyclic alkylene group), wherein the ratio of the ingredients (a)-(c) is in the proportion of 3:6:1.
Claim 2
Dependent Claim
173 words
A stripping liquid composition for stripping off a photoresist film applied on a substrate, comprising: (a) an alkanol amine compound expressed by the structural formula H 3-n N((CH 2 ) m OH) n (where m is 2 or 3, and n is 1, 2 or 3), (b) a sulfone compound or sulfoxide compound expressed by the structural formula R 1 --SO 2 --R 2 or R 1 --SO--R 2 (where R1 and R2 are independently alkyl groups with 1 or 2 carbon atoms, or mutually coupled and formed cyclic alkylene groups with 4, 5 or 6 carbon atoms), and (c) a hydroxy compound expressed by the structural formula C 6 H 6-n (OH) n (where n=1, 2 or 3) or C 6 H 6-m-n (OH) n R m (where n=1, 2, or 3, m=1 or 2, having at least a hydroxy group and at least an alkyl group or at least an alkoxy group added to a cyclic alkylene group), wherein the ratio of the ingredients (a)-(c) is in the proportion of 3:6:1.
Claim 3
Dependent Claim
15 words
A stripping liquid composition of claim 1, wherein the alkanol amine compound is monoethanol amine.
Claim 4
Dependent Claim
14 words
A stripping liquid composition of claim 1, wherein the sulfone compound is tetramethylene sulfone.
Claim 5
Dependent Claim
14 words
A stripping liquid composition of claim 1, wherein the sulfoxide compound is dimethyl sulfoxide.
Claim 6
Dependent Claim
14 words
A stripping liquid composition of claim 1, wherein the hydroxy compound is dihydroxy benzene.
Claim 7
Independent Claim
192 words
A method of stripping off a photoresist film on a substrate using a composition comprising: (a) an alkanol amine compound expressed by the structural formula H 3-n N((CH 2 ) m OH) n (where m is 2 or 3, and n is 1, 2 or 3), (b) a sulfone compound or sulfoxide compound expressed by the structural formula R 1 --SO 2 --R 2 or R 1 --SO--R 2 (where R1 and R2 are independently alkyl groups with 1 or 2 carbon atoms, or mutually coupled and formed cyclic alkylene groups with 4, 5 or 6 carbon atoms), and (c) a hydroxy compound expressed by the structural formula C 6 H 6-n (OH) n (where n=1, 2 or 3) or C 6 H 6-m-n (OH) n R m (where n=1, 2 or 3, m=1 or 2, having at least a hydroxy group and at least an alkyl group or at least an alkoxy group added to a cyclic alkylene group), wherein the ratio of the ingredients (a)-(c) is in the proportion of 3:6:1, comprising the step of: applying the composition (a)-(c) to the photoresist film subsequent to etching of the photoresist film.
Claim 8
Independent Claim
192 words
A method of stripping off a photoresist film on a substrate using a composition comprising: (a) an alkanol amine compound expressed by the structural formula H 3-n N((CH 2 ) m OH) n (where m is 2 or 3, and n is 1, 2 or 3), (b) a sulfone compound or sulfoxide compound expressed by the structural formula R 1 --SO 2 --R 2 or R 1 --SO--R 2 (where R1 and R2 are independently alkyl groups with 1 or 2 carbon atoms, or mutually coupled and formed cyclic alkylene groups with 4, 5 or 6 carbon atoms), and (c) a hydroxy compound expressed by the structural formula C 6 H 6-n (OH) n (where n=1, 2 or 3) or C 6 H 6-m-n (OH) n R m (where n=1, 2 or 3, m=1 or 2, having at least a hydroxy group and at least an alkyl group or at least an alkoxy group added to a cyclic alkylene group), wherein the ratio of the ingredients (a)-(c) is in the proportion of 3:6:1, comprising the step of: applying the composition (a)-(c) to the photoresist film subsequent to etching of the photoresist film.
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