US5124233A
Expired / Lapsed
US
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Photoresist compositions
Assignee: Huntsman Advanced Materials Americas LLC
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Filing: 1988-06-03
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Granted: 1992-06-23
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Expires: 2008-06-03
Abstract
Abstract Positive-working photoresist compositions containing (a) an epoxide resin which can be hardened by heat, (b) a latent urea or imidazole hardener for the component (a) and (c) an iron-arene complex of the formula (I) [R.sup.1 (Fe.sup.II R.sup.2).sub.n ].sub.m.sup.+n [X].sub.n.sup.-m(I) in which n is 1 or 2, m is 1, 2, 3, 4 or 5, X is a non-nucleophilic anion, R 1 is a π-arene and R 2 is an anion of a π-arene, are described. These compositions are distinguished by good properties towards heat and chemicals and require short exposure times.
Inventors
- 👤 Kurt Meier
- 👤 Ewald Losert
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 04:43
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
74 words
A positive-working photoresist composition containing (a) an epoxide resin which can be hardened by heat, (b) a latent urea or imidazole hardener for the component (a) and (c) an iron-arene complex of the formula (I) [R.sup.1 (Fe.sup.II R.sup.2).sub.n ].sub.m.sup.+n [X].sub.n.sup.-m(I) in which n is 1 or 2, m is 1, 2, 3, 4 or 5, X is a non-nucleophilic anion, R 1 is a π-arene and R 2 is an anion of a π-arene.
Claim 2
Dependent Claim
74 words
A positive-working photoresist composition containing (a) an epoxide resin which can be hardened by heat, (b) a latent urea or imidazole hardener for the component (a) and (c) an iron-arene complex of the formula (I) [R.sup.1 (Fe.sup.II R.sup.2).sub.n ].sub.m.sup.+n [X].sub.n.sup.-m(I) in which n is 1 or 2, m is 1, 2, 3, 4 or 5, X is a non-nucleophilic anion, R 1 is a π-arene and R 2 is an anion of a π-arene.
Claim 3
Dependent Claim
28 words
A composition according to claim 1, wherein the component (b) is a hardener by means of which the hardening reaction takes place at a temperature above 80° C.
Claim 4
Dependent Claim
16 words
A composition according to claim 1, wherein the component (b) is imidazole or an imidazole derivative.
Claim 5
Dependent Claim
19 words
A composition according to claim 1, containing 0.1-10% by weight, relative to the resin (a), of the component (b).
Claim 6
Dependent Claim
68 words
A composition according to claim 1, containing, as the component (c), complexes of the formula I in which X is BF 4 .sup.⊖, PF 6 .sup.⊖, AsF 6 .sup.⊖, SbF 6 .sup.⊖, or SbF 5 OH.sup.⊖ ; sulfonates, such as methylsulfonate or p-toluenesulfonate; perfluoroalkylsulfonates, such as trifluoromethylsulfonate or nonafluorobutylsulfonate; acetate, for example CH 3 COO - ; a perfluoroacetate, F.sup.⊖, Cl.sup.⊖, Br.sup.⊖ or I.sup.⊖ ; or a pseudohalide.
Claim 7
Dependent Claim
13 words
A composition according to claim 5, wherein X is sulfonate or a perfluoroalkylsulfonate.
Claim 8
Dependent Claim
19 words
A composition according to claim 1, containing 0.5-20% by weight, relative to the resin (a), of the component (c).
Claim 9
Dependent Claim
15 words
A composition according to claim 1, containing, in addition, a sensitizer for the component (c).
Claim 10
Dependent Claim
15 words
A composition according to claim 1, containing a binder for development under aqueous alkaline conditions.
Claim 11
Dependent Claim
17 words
A composition according to claim 9, containing, as the binder, a polyphenol or a mixture of polyphenols.
Claim 12
Dependent Claim
114 words
A process for the production of positive images comprising the following process steps: coating a substrate with a positive-working photoresist composition containing (a) an epoxide resin which can be hardened by heat, (b) a latent urea or imidazole hardener for the component (a) and (c) an iron-arene complex of the formula (I) [R.sup.1 (Fe.sup.II R.sup.2).sub.n ].sub.m.sup.+n [X].sub.n.sup.-m(I) in which n is 1 or 2, m is 1, 2, 3, 4 or 5, X is a non-nucleophilic anion, R 1 is a π-arene and R 2 is an anion of a π-arene, exposing the coated substrate to actinic radiation using a predetermined pattern hardening the exposed substrate at an elevated temperature and developing the substrate.
Claim 13
Dependent Claim
114 words
A process for the production of positive images comprising the following process steps: coating a substrate with a positive-working photoresist composition containing (a) an epoxide resin which can be hardened by heat, (b) a latent urea or imidazole hardener for the component (a) and (c) an iron-arene complex of the formula (I) [R.sup.1 (Fe.sup.II R.sup.2).sub.n ].sub.m.sup.+n [X].sub.n.sup.-m(I) in which n is 1 or 2, m is 1, 2, 3, 4 or 5, X is a non-nucleophilic anion, R 1 is a π-arene and R 2 is an anion of a π-arene, exposing the coated substrate to actinic radiation using a predetermined pattern hardening the exposed substrate at an elevated temperature and developing the substrate.
References Cited (Backward Citations)
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