US3752669A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of producing positive images from epoxy compositions and compositions therefor
Assignee: International Business Machines Corp
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Filing: 1971-12-17
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Granted: 1973-08-14
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Expires: 1991-12-17
Abstract
Abstract AN EPOXY COMPOSITION SUITABLE FOR USE AS A POSITIVE PHOTORESIST AND PERMANENT DIELECTRIC IS DISCLOSED WHICH INCLUDES AN EPOXY RESIN, A TERTIARY AMINE CURING AGENT, AND A HALOGENATED HYDROCARBON SENSITIZER. ALSO DISCLOSED IS A METHOD OF PRODUCING POSITIVE IMAGES FROM SAID COMPOSITION WHICH INCLUDES EXPOSING THE COATED EPOXY TO ACTINIC RADIATION, CURING THE COATING TO A CRITICAL POINT AT WHICH THE EXPOSED AREAS REMAIN SOLUBLE IN A SOLVENT DEVELOPER WHILE THE UNEXPOSED AREAS ARE SUBSTANTIALLY INSOLUBLE, AND SUBSEQUENTLY DEVELOPING OUT THE EXPOSED ARE IN THE SOLVENT DEVELOPER. THE USE OF THIS COMPOSITION AND METHOD IN PRINTED CIRCUIT MANUFACTURING IS ALSO DESCRIBED.
Inventors
- 👤 O Abolafia
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 08:15
CPC Classifications
G; G03; G03C; G03C5/00; G03C5/56; G03F; G03F7/00; G03F7/004; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/115
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-08-13 | 1977-02-12 | 1977-08-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-08-13 | 1981-02-12 | 1981-08-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-08-13 | 1985-02-12 | 1985-08-14 | $7700.00 | Window Closed / Lapsed |