US4624912A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Thermally transferable layers of radiation sensitive epoxy resins used to prepare protective coatings and relief images
Assignee: Huntsman Advanced Materials Americas LLC
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Filing: 1985-02-06
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Granted: 1986-11-25
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Expires: 2005-02-06
Abstract
Abstract A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin containing a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appropriate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.
Inventors
- 👤 Hans Zweifel
- 👤 Sigrid Bauer
- 👤 Kurt Meier
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 11:59
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/04; C; C08; C08G; C08G59/00; C08G59/18; C08G59/68; G03F7/038; G03F7/0385; H; H05; H05K; H05K3/00; H05K3/0073; H05K3/0079
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
105 words
A process for the production of a protective layer on a substrate which comprises thermally transferring, by the application of pressure and heat at a temperature of up to 150° C., a radiation-sensitive layer from support to the substrate, which layer consists essentially of (a) a solid film-forming epoxy resin, (b) 0.1 to 15% by weight, based on the epoxy resin, of a cationic photoinitiator; and (c) 0 to 10% by weight, based on the epoxy resin, of a photo sensitizer, exposing directly said layer to radiation by an electron beam or actinic light, and then heating the layer after irradiation to harden said layer.
Claim 2
Dependent Claim
105 words
A process for the production of a protective layer on a substrate which comprises thermally transferring, by the application of pressure and heat at a temperature of up to 150° C., a radiation-sensitive layer from support to the substrate, which layer consists essentially of (a) a solid film-forming epoxy resin, (b) 0.1 to 15% by weight, based on the epoxy resin, of a cationic photoinitiator; and (c) 0 to 10% by weight, based on the epoxy resin, of a photo sensitizer, exposing directly said layer to radiation by an electron beam or actinic light, and then heating the layer after irradiation to harden said layer.
Claim 3
Dependent Claim
15 words
A process according to claim 1, wherein a dye is contained in the photosensitive layer.
Claim 4
Dependent Claim
20 words
A process according to claim 1, wherein the hardening temperature is in the range from 50° C. to 150° C.
Claim 5
Dependent Claim
24 words
A process according to claim 1, wherein the epoxy resin has an epoxy equivalent weight of 1 to 5 equivalents per kg of resin.
Claim 6
Dependent Claim
113 words
A process according to claim 1, wherein the photoinitiator corresponds to a compound of the formula I [(R.sup.1)(R.sup.2 M).sub.a ].sup.+an an/q[LQ.sub.m ].sup.-q (I) wherein a is 1 or 2 and n and q independently of one another are each an integer from 1 to 3, M is the cation of a monovalent to trivalent metal from group Ivb to VIIb, VIII or Ib of the periodic table, m is an integer corresponding to the sum of the values of L and q, Q is a halogen atom, L is a divalent to heptavalent metal or non-metal, R 1 is a π-arene and R 2 is a arene or the anion of a π-arene.
Claim 7
Dependent Claim
104 words
A process according to claim 1, wherein the photoinitiator is a halonium salt of the formula II [R.sup.3 R.sup.4 X].sub.q.sup.+ [LQ.sub.m ].sup.-q (II) wherein R 3 and R 4 independently of one another are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, or R 3 and R 4 together are a divalent carbocyclic or heterocyclic aromatic radical, X is a halogen atom, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 8
Dependent Claim
116 words
A process according to claim 1, wherein the photoinitiator is a sulfonium salt of the formula III [R.sup.5 R.sup.6 R.sup.7 S].sub.q.sup.+ [LQ.sub.m ].sup.-q (III) wherein R 5 , R 6 and R 7 independently of one another are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, or one of R 5 , R 6 and R 7 is this aromatic radical and the other two together are a divalent carbocyclic or heterocyclic aromatic radical, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 9
Dependent Claim
81 words
A process according to claim 1, wherein the photoinitiator is an iodosyl salt of the formula IV [R.sup.8 R.sup.9 I.sup.+ =O].sub.q [LQ.sub.m ].sup.-q (IV) wherein R 7 and R 8 are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 10
Dependent Claim
16 words
A process according to claim 1, wherein a sensitizer is additionally contained in the photosensitive layer.
Claim 11
Dependent Claim
52 words
A process according to claim 1, wherein the epoxy resin is a diglycidyl ether, advanced with dihydric phenols, of aliphatic diols having 2 to 4 C atoms, or a bisphenol diglycidyl ether advanced with dihydric phenols, or wherein the epoxy resin is a glycidyl ether of a novolak or of a bisphenol.
Claim 12
Dependent Claim
120 words
A process for the production of a relief image on a substrate which comprises thermally transferring, by the application of pressure and heat at a temperature of up to 150° C., a radiation-sensitive layer from a support to the substrate, which layer consists essentially of (a) a solid film-forming epoxy resin, (b) 0.1 to 15% by weight, based on the epoxy resin, of a cationic photoinitiator, and (c) 0 to 10% by weight, based on the epoxy resin, of a photo sensitizer, exposing said layer through a photomask to radiation by an electron beam or actinic light, heating the layer after irradiation to harden the radiation-exposed parts of said layer, and then developing the relief image with an organic solvent.
Claim 13
Dependent Claim
120 words
A process for the production of a relief image on a substrate which comprises thermally transferring, by the application of pressure and heat at a temperature of up to 150° C., a radiation-sensitive layer from a support to the substrate, which layer consists essentially of (a) a solid film-forming epoxy resin, (b) 0.1 to 15% by weight, based on the epoxy resin, of a cationic photoinitiator, and (c) 0 to 10% by weight, based on the epoxy resin, of a photo sensitizer, exposing said layer through a photomask to radiation by an electron beam or actinic light, heating the layer after irradiation to harden the radiation-exposed parts of said layer, and then developing the relief image with an organic solvent.
Claim 14
Dependent Claim
15 words
A process according to claim 11, wherein a dye is contained in the photosensitive layer.
Claim 15
Dependent Claim
19 words
A process according to claim 11, wherein the hardening temperature is the range from 50° C. to 150° C.
Claim 16
Dependent Claim
24 words
A process according to claim 11, wherein the epoxy resin has an epoxy equivalent weight of 1 to 5 equivalents per kg of resin.
Claim 17
Dependent Claim
113 words
A process according to claim 11, wherein the photoinitiator corresponding to a compound of the formula I [(R.sup.1)(R.sup.2 M).sub.a ].sup.+an an/q[LQ.sub.m ].sup.-q (I) wherein a is 1 or 2 and n and q independently of one another are each an integer from 1 to 3, M is the cation of a monovalent to trivalent metal from group Ivb to VIIb, VIII or Ib of the periodic table, m is an integer corresponding to the sum of the values of L and q, Q is a halogen atom, L is a divalent to heptavalent metal or non-metal, R 1 is a π-arene and R 2 is a π-arene or the anion of a π-arene.
Claim 18
Dependent Claim
104 words
A process according to claim 11, wherein the photoinitiator is a halonium salt of the formula II [R.sup.3 R.sup.4 X].sub.q.sup.+ [LQ.sub.m ].sup.-q (II) wherein R 3 and R 4 independently of one another are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, or R 3 and R 4 together are a divalent carbocyclic or heterocyclic aromatic radical, X is a halogen atom, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 19
Dependent Claim
116 words
A process according to claim 11, wherein the photoinitiator is a sulfonium salt of the formula III [R.sup.5 R.sup.6 R.sup.7 S].sub.q.sup.+ [LQ.sub.m ].sup.-q (III) wherein R 5 , R 6 and R 7 independently of one another are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, or one of R 5 , R 6 and R 7 is this aromatic radical and the other two together are a divalent carbocyclic or heterocyclic aromatic radical, m is a number corresponding to the sum of the values of L and Q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 20
Dependent Claim
80 words
The process according to claim 11, whereinthe photoinitiator is an iodosyl salt of the formula IV [R.sup.8 R.sup.9 I.sup.+ =O].sub.q [LQ.sub.m ].sup.-q (IV) wherein R 7 and R 8 are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 21
Dependent Claim
16 words
A process according to claim 11, wherein a sensitizer is additionally contained in the photosensitive layer.
Claim 22
Dependent Claim
51 words
A process according to claim 11, wherein the epoxy resin is a diglycidyl ether, advanced with dihydric phenols, of aliphatic diols having 2 to 4 C atoms, or bisphenol diglycidyl ether advanced with dihydrid phenols, or wherein the epoxy resin is a glycidyl ether of a novolak or of a bisphenol.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-11-24 | 1990-05-26 | 1990-11-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-11-24 | 1994-05-26 | 1994-11-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-11-24 | 1998-05-26 | 1998-11-25 | $7700.00 | Window Closed / Lapsed |