US4465760A
Expired / Lapsed
US
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Production of relief images or resist images by a negative-working method
Assignee: BASF SE
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Filing: 1983-08-22
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Granted: 1984-08-14
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Expires: 2003-08-22
Abstract
Abstract Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.
Inventors
- 👤 Reinhold J. Leyrer
- 👤 Dietrich Saenger
- 👤 Uwe Klinsmann
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 23:20
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2022; G03F7/004; G03F7/0045; G03F7/039; G03F7/26; G03F7/38
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
168 words
A process for the production of a relief image or resist image which constitutes a negative image of an image-bearing transparency, wherein a photosensitive resist layer which is applied to a base, is crosslinkable after exposure and contains, as the photosensitive component, a compound possessing two or more o-nitrocarbinol ester groups of the formula (I) ##STR4## where A is a radical of an unsubstituted or substituted 5-membered to 14-membered aromatic or heteroaromatic ring system, and X is hydrogen, alkyl of 1 to 8 carbon atoms or an unsubstituted or substituted aryl or aralkyl radical, and which also contains a compound which effects crosslinking and possesses two or more reactive groups which are capable of reacting with --COOH groups under the action of heat to form a covalent chemical bond, is exposed imagewise to actinic light, the exposed areas of the resist layer are subjected to selective thermal hardening and crosslinking, and the resist layer is post-exposed uniformly to actinic light and then washed out with an aqueous developer.
Claim 2
Dependent Claim
168 words
A process for the production of a relief image or resist image which constitutes a negative image of an image-bearing transparency, wherein a photosensitive resist layer which is applied to a base, is crosslinkable after exposure and contains, as the photosensitive component, a compound possessing two or more o-nitrocarbinol ester groups of the formula (I) ##STR4## where A is a radical of an unsubstituted or substituted 5-membered to 14-membered aromatic or heteroaromatic ring system, and X is hydrogen, alkyl of 1 to 8 carbon atoms or an unsubstituted or substituted aryl or aralkyl radical, and which also contains a compound which effects crosslinking and possesses two or more reactive groups which are capable of reacting with --COOH groups under the action of heat to form a covalent chemical bond, is exposed imagewise to actinic light, the exposed areas of the resist layer are subjected to selective thermal hardening and crosslinking, and the resist layer is post-exposed uniformly to actinic light and then washed out with an aqueous developer.
Claim 3
Dependent Claim
55 words
A process as claimed in claim 1, wherein the photosensitive resist layer contains a compound possessing o-nitrocarbinol ester groups of the formula (I), in which the carbinol on which the o-nitrocarbinol ester groups of the formula (I) are based is o-nitrobenzyl alcohol, 2-nitro-6-chlorobenzyl alcohol, 2-nitro-4-cyanobenzyl alcohol, 2-nitro-4,5-dimethoxybenzyl alcohol, α-methyl-o-nitrobenzyl alcohol, α-phenyl-o-nitrobenzyl alcohol or α-(o-nitrophenyl)-o-nitrobenzyl alcohol.
Claim 4
Dependent Claim
48 words
A process as claimed in claim 1, wherein the photosensitive resist layer contains, as the compound possessing the o-nitrocarbinol ester groups of the formula (I), a di- and/or polyester of a low molecular weight di- and/or polycarboxylic acid and a polymeric binder which is compatible with this ester.
Claim 5
Dependent Claim
54 words
A process as claimed in claim 1, wherein the photosensitive resist layer contains a polymer which has a molecular weight of above 500 and contains not less than 5% by weight, based on the molecular weight of the polymer, of aromatic and/or heteroaromatic o-nitrocarbinol ester groups of the formula (I) bonded in the molecule.
Claim 6
Dependent Claim
44 words
A process as claimed in claim 4, wherein the photosensitive resist layer contains a polymer which possesses o-nitrocarbinol ester groups of the formula (I) and is derived from a homopolymer or copolymer of acrylic acid, methacrylic acid, maleic acid, fumaric acid and/or crotonic acid.
Claim 7
Dependent Claim
46 words
A process as claimed in claim 1, wherein the photosensitive resist layer contains a compound, in particular a polymer, which, in addition to the o-nitrocarbinol ester groups of the formula (I), also contains incorporated in the molecule the crosslinking groups which are reactive to --COOH groups.
Claim 8
Dependent Claim
33 words
A process as claimed in claim 6, wherein the compound possessing o-nitrocarbinol ester groups of the formula (I) contains, as crosslinking reactive groups, amine, imine, amide, epoxide, hydroxyl, isocyanate and/or blocked isocyanate groups.
Claim 9
Dependent Claim
42 words
A process as claimed in claim 1, wherein the photosensitive resist layer contains, in addition to the compound possessing the o-nitrocarbinol ester groups of the formula (I), one or more crosslinking compounds possessing two or more reactive groups of the type mentioned.
Claim 10
Dependent Claim
24 words
A process as claimed in claim 8, wherein the photosensitive resist layer contains, as crosslinking compounds, epoxides, isocyanates, blocked isocyanates, α,ω-diisocyanatopolycarbodiimides, alcohols and/or amines.
Claim 11
Dependent Claim
30 words
A process as claimed in claim 1, wherein the photosensitive resist layer contains, as further additives, plasticizers, flow improvers, catalysts for the thermal hardening, sensitizers, dyes, pigments and/or photochromic substances.
Claim 12
Dependent Claim
28 words
A process as claimed in claim 1, wherein the thermal hardening and crosslinking of the imagewise exposed resist layer is carried out at from 50° to 250° C.
Claim 13
Dependent Claim
24 words
A process as claimed in claim 1, wherein, after washing out with the aqueous developer, thermal post-curing and subsequent crosslinking is also carried out.
Claim 14
Dependent Claim
22 words
A process as claimed in claim 1, wherein the solid photosensitive resist layer is laminated onto the base using pressure and/or heat.
Claim 15
Dependent Claim
35 words
A process as claimed in claim 13, wherein the photosensitive resist layer, before being laminated onto the base, is pre-exposed uniformly for a short time to actinic light, on that side which faces the base.
References Cited (Backward Citations)
DE2150691A1
Cited
DE2309062A1
Cited
US4035189A
Cited
DE2242394A1
Cited
US3926636A
Cited
DE2361141A1
Cited
US3895952A
Cited
US3949143A
Cited
US3996052A
Cited
DE2922746A1
Cited
US4400461A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-08-14 | 1988-02-13 | 1988-08-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-08-14 | 1992-02-13 | 1992-08-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-08-14 | 1996-02-13 | 1996-08-14 | $7700.00 | Window Closed / Lapsed |