Patent US4624912A successfully refreshed from Google Patents.
US4624912A
Expired / Lapsed
US
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Thermally transferable layers of radiation sensitive epoxy resins used to prepare protective coatings and relief images
Assignee: Huntsman Advanced Materials Americas LLC
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Filing: 1985-02-06
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Granted: 1986-11-25
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Expires: 2005-02-06
Abstract
Abstract A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin containing a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appropriate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.
Inventors
- 👤 Hans Zweifel
- 👤 Sigrid Bauer
- 👤 Kurt Meier
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 15:14
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/04; C; C08; C08G; C08G59/00; C08G59/18; C08G59/68; G03F7/038; G03F7/0385; H; H05; H05K; H05K3/00; H05K3/0073; H05K3/0079
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
105 words
A process for the production of a protective layer on a substrate which comprises thermally transferring, by the application of pressure and heat at a temperature of up to 150° C., a radiation-sensitive layer from support to the substrate, which layer consists essentially of (a) a solid film-forming epoxy resin, (b) 0.1 to 15% by weight, based on the epoxy resin, of a cationic photoinitiator; and (c) 0 to 10% by weight, based on the epoxy resin, of a photo sensitizer, exposing directly said layer to radiation by an electron beam or actinic light, and then heating the layer after irradiation to harden said layer.
Claim 2
Dependent Claim
105 words
A process for the production of a protective layer on a substrate which comprises thermally transferring, by the application of pressure and heat at a temperature of up to 150° C., a radiation-sensitive layer from support to the substrate, which layer consists essentially of (a) a solid film-forming epoxy resin, (b) 0.1 to 15% by weight, based on the epoxy resin, of a cationic photoinitiator; and (c) 0 to 10% by weight, based on the epoxy resin, of a photo sensitizer, exposing directly said layer to radiation by an electron beam or actinic light, and then heating the layer after irradiation to harden said layer.
Claim 3
Dependent Claim
15 words
A process according to claim 1, wherein a dye is contained in the photosensitive layer.
Claim 4
Dependent Claim
20 words
A process according to claim 1, wherein the hardening temperature is in the range from 50° C. to 150° C.
Claim 5
Dependent Claim
24 words
A process according to claim 1, wherein the epoxy resin has an epoxy equivalent weight of 1 to 5 equivalents per kg of resin.
Claim 6
Dependent Claim
113 words
A process according to claim 1, wherein the photoinitiator corresponds to a compound of the formula I [(R.sup.1)(R.sup.2 M).sub.a ].sup.+an an/q[LQ.sub.m ].sup.-q (I) wherein a is 1 or 2 and n and q independently of one another are each an integer from 1 to 3, M is the cation of a monovalent to trivalent metal from group Ivb to VIIb, VIII or Ib of the periodic table, m is an integer corresponding to the sum of the values of L and q, Q is a halogen atom, L is a divalent to heptavalent metal or non-metal, R 1 is a π-arene and R 2 is a arene or the anion of a π-arene.
Claim 7
Dependent Claim
104 words
A process according to claim 1, wherein the photoinitiator is a halonium salt of the formula II [R.sup.3 R.sup.4 X].sub.q.sup.+ [LQ.sub.m ].sup.-q (II) wherein R 3 and R 4 independently of one another are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, or R 3 and R 4 together are a divalent carbocyclic or heterocyclic aromatic radical, X is a halogen atom, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 8
Dependent Claim
116 words
A process according to claim 1, wherein the photoinitiator is a sulfonium salt of the formula III [R.sup.5 R.sup.6 R.sup.7 S].sub.q.sup.+ [LQ.sub.m ].sup.-q (III) wherein R 5 , R 6 and R 7 independently of one another are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, or one of R 5 , R 6 and R 7 is this aromatic radical and the other two together are a divalent carbocyclic or heterocyclic aromatic radical, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 9
Dependent Claim
81 words
A process according to claim 1, wherein the photoinitiator is an iodosyl salt of the formula IV [R.sup.8 R.sup.9 I.sup.+ =O].sub.q [LQ.sub.m ].sup.-q (IV) wherein R 7 and R 8 are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 10
Dependent Claim
16 words
A process according to claim 1, wherein a sensitizer is additionally contained in the photosensitive layer.
Claim 11
Dependent Claim
52 words
A process according to claim 1, wherein the epoxy resin is a diglycidyl ether, advanced with dihydric phenols, of aliphatic diols having 2 to 4 C atoms, or a bisphenol diglycidyl ether advanced with dihydric phenols, or wherein the epoxy resin is a glycidyl ether of a novolak or of a bisphenol.
Claim 12
Dependent Claim
120 words
A process for the production of a relief image on a substrate which comprises thermally transferring, by the application of pressure and heat at a temperature of up to 150° C., a radiation-sensitive layer from a support to the substrate, which layer consists essentially of (a) a solid film-forming epoxy resin, (b) 0.1 to 15% by weight, based on the epoxy resin, of a cationic photoinitiator, and (c) 0 to 10% by weight, based on the epoxy resin, of a photo sensitizer, exposing said layer through a photomask to radiation by an electron beam or actinic light, heating the layer after irradiation to harden the radiation-exposed parts of said layer, and then developing the relief image with an organic solvent.
Claim 13
Dependent Claim
120 words
A process for the production of a relief image on a substrate which comprises thermally transferring, by the application of pressure and heat at a temperature of up to 150° C., a radiation-sensitive layer from a support to the substrate, which layer consists essentially of (a) a solid film-forming epoxy resin, (b) 0.1 to 15% by weight, based on the epoxy resin, of a cationic photoinitiator, and (c) 0 to 10% by weight, based on the epoxy resin, of a photo sensitizer, exposing said layer through a photomask to radiation by an electron beam or actinic light, heating the layer after irradiation to harden the radiation-exposed parts of said layer, and then developing the relief image with an organic solvent.
Claim 14
Dependent Claim
15 words
A process according to claim 11, wherein a dye is contained in the photosensitive layer.
Claim 15
Dependent Claim
19 words
A process according to claim 11, wherein the hardening temperature is the range from 50° C. to 150° C.
Claim 16
Dependent Claim
24 words
A process according to claim 11, wherein the epoxy resin has an epoxy equivalent weight of 1 to 5 equivalents per kg of resin.
Claim 17
Dependent Claim
113 words
A process according to claim 11, wherein the photoinitiator corresponding to a compound of the formula I [(R.sup.1)(R.sup.2 M).sub.a ].sup.+an an/q[LQ.sub.m ].sup.-q (I) wherein a is 1 or 2 and n and q independently of one another are each an integer from 1 to 3, M is the cation of a monovalent to trivalent metal from group Ivb to VIIb, VIII or Ib of the periodic table, m is an integer corresponding to the sum of the values of L and q, Q is a halogen atom, L is a divalent to heptavalent metal or non-metal, R 1 is a π-arene and R 2 is a π-arene or the anion of a π-arene.
Claim 18
Dependent Claim
104 words
A process according to claim 11, wherein the photoinitiator is a halonium salt of the formula II [R.sup.3 R.sup.4 X].sub.q.sup.+ [LQ.sub.m ].sup.-q (II) wherein R 3 and R 4 independently of one another are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, or R 3 and R 4 together are a divalent carbocyclic or heterocyclic aromatic radical, X is a halogen atom, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 19
Dependent Claim
116 words
A process according to claim 11, wherein the photoinitiator is a sulfonium salt of the formula III [R.sup.5 R.sup.6 R.sup.7 S].sub.q.sup.+ [LQ.sub.m ].sup.-q (III) wherein R 5 , R 6 and R 7 independently of one another are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, or one of R 5 , R 6 and R 7 is this aromatic radical and the other two together are a divalent carbocyclic or heterocyclic aromatic radical, m is a number corresponding to the sum of the values of L and Q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 20
Dependent Claim
80 words
The process according to claim 11, whereinthe photoinitiator is an iodosyl salt of the formula IV [R.sup.8 R.sup.9 I.sup.+ =O].sub.q [LQ.sub.m ].sup.-q (IV) wherein R 7 and R 8 are a carbocyclic or heterocyclic aromatic radical having 6 to 20 C atoms, m is a number corresponding to the sum of the values of L and q, L is a divalent to heptavalent metal or non-metal, Q is a halogen atom and q is a number from 1 to 3.
Claim 21
Dependent Claim
16 words
A process according to claim 11, wherein a sensitizer is additionally contained in the photosensitive layer.
Claim 22
Dependent Claim
51 words
A process according to claim 11, wherein the epoxy resin is a diglycidyl ether, advanced with dihydric phenols, of aliphatic diols having 2 to 4 C atoms, or bisphenol diglycidyl ether advanced with dihydrid phenols, or wherein the epoxy resin is a glycidyl ether of a novolak or of a bisphenol.
References Cited (Backward Citations)
US3526504A
Cited
US4035189A
Cited
DE2518639A1
Cited
US4252592A
Cited
US4388137A
Cited
US4299938A
Cited
JPS56155789A
Cited
US4383025A
Cited
US4398014A
Cited
JPS5818288A
Cited
US4438189A
Cited
EP0094915A2
Cited
EP0094914A2
Cited
US4465760A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-11-24 | 1990-05-26 | 1990-11-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-11-24 | 1994-05-26 | 1994-11-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-11-24 | 1998-05-26 | 1998-11-25 | $7700.00 | Window Closed / Lapsed |