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US5476753A
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Fine pattern forming method
Assignee: Panasonic Holdings Corp
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Filing: 1994-05-06
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Granted: 1995-12-19
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Expires: 2014-05-06
Abstract
Abstract A high polymer organic film is applied as a bottom layer to a semiconductor silicon substrate. Then, a material including an acid generator and a polysilane resin insoluble in an alkaline solution is applied to the bottom layer as an electron beam resist layer. The polysilane resin includes a Si--Si bond or Si--O bond in a principle chain and a substituted hydroxy group expressed as --OR in a side chain wherein R denotes a substitution group of hydrocarbon. The acid generator generates an acid when irradiated with an electron beam. Then, a pattern is formed with an electron beam in the photosensitive layer, and it is developed with an alkaline solution. Then, by using the resist pattern as a mask, the bottom layer is etched. Thus, a fine resist pattern of correct high aspect ratio can be formed easily.
Inventors
- 👤 Kazuhiko Hashimoto
- 👤 Masayuki Endo
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 06:43
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0754; G03F7/0045; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
173 words
A fine pattern forming method, comprising the steps of: forming a high polymer organic film on a semiconductor substrate; forming a photosensitive layer on said high polymer organic film, said photosensitive layer comprising a polysilane resin insoluble in an alkaline solution and an acid generator which generates an acid when irradiated with an electron beam, said polysilane resin including a Si--Si bond in a principal chain and a group expressed as --OR in a side chain wherein R denotes a group which can be decomposed by an acid; forming a pattern with an electron beam on the photosensitive layer, thereby causing the generation of an acid by the acid generator, and baking the photosensitive layer to accelerate the decomposition reaction of the side chain by the generated acid to make the polysilane resin in the pattern region soluble in an alkaline solution; developing the photosensitive layer with an alkaline aqueous solution to form a positive resist pattern; and etching the high polymer organic film by using the positive resist pattern as a mask.
Claim 2
Dependent Claim
173 words
A fine pattern forming method, comprising the steps of: forming a high polymer organic film on a semiconductor substrate; forming a photosensitive layer on said high polymer organic film, said photosensitive layer comprising a polysilane resin insoluble in an alkaline solution and an acid generator which generates an acid when irradiated with an electron beam, said polysilane resin including a Si--Si bond in a principal chain and a group expressed as --OR in a side chain wherein R denotes a group which can be decomposed by an acid; forming a pattern with an electron beam on the photosensitive layer, thereby causing the generation of an acid by the acid generator, and baking the photosensitive layer to accelerate the decomposition reaction of the side chain by the generated acid to make the polysilane resin in the pattern region soluble in an alkaline solution; developing the photosensitive layer with an alkaline aqueous solution to form a positive resist pattern; and etching the high polymer organic film by using the positive resist pattern as a mask.
Claim 3
Dependent Claim
17 words
A fine pattern forming method according to claim 1, wherein said polysilane resin is a ladder polysilane.
Claim 4
Dependent Claim
174 words
A fine pattern forming method, comprising the steps of: forming a high polymer organic film on a semiconductor substrate; forming a photosensitive layer on said high polymer organic film, said photosensitive layer comprising a ladder polysilicone resin insoluble in an alkaline solution and an acid generator which generates an acid when irradiated with an electron beam, said polysilicone resin including a Si--O bond in a principal chain and a group expressed as --OR in a side chain wherein R denotes a group which can be decomposed by an acid; forming a pattern with an electron beam on the photosensitive layer, thereby causing the generation of an acid by the acid generator, and baking the photosensitive layer to accelerate the decomposition reaction of the side chain by the generated acid to make the polysilicone resin in the pattern region soluble in an alkaline solution; developing the photosensitive layer with an alkaline aqueous solution to form a positive resist pattern; and etching the high polymer organic film by using the positive resist pattern as a mask.
Claim 5
Dependent Claim
174 words
A fine pattern forming method, comprising the steps of: forming a high polymer organic film on a semiconductor substrate; forming a photosensitive layer on said high polymer organic film, said photosensitive layer comprising a ladder polysilicone resin insoluble in an alkaline solution and an acid generator which generates an acid when irradiated with an electron beam, said polysilicone resin including a Si--O bond in a principal chain and a group expressed as --OR in a side chain wherein R denotes a group which can be decomposed by an acid; forming a pattern with an electron beam on the photosensitive layer, thereby causing the generation of an acid by the acid generator, and baking the photosensitive layer to accelerate the decomposition reaction of the side chain by the generated acid to make the polysilicone resin in the pattern region soluble in an alkaline solution; developing the photosensitive layer with an alkaline aqueous solution to form a positive resist pattern; and etching the high polymer organic film by using the positive resist pattern as a mask.
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