Patent US6169484B1 successfully refreshed from Google Patents.
US5338818A
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Silicon containing positive resist for DUV lithography
Assignee: International Business Machines Corp
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Filing: 1992-09-10
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Granted: 1994-08-16
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Expires: 2012-09-10
Abstract
Abstract A method of synthesizing a silicon-containing positive resist for use as a imaging layer in DUV, x-ray, or e-beam lithography is disclosed. The resist contains arylsilsesquioxane polymers with acid sensitive pendant groups as dissolution inhibitors and a photoacid generator.
Inventors
- 👤 William R. Brunsvold
- 👤 Premlatha Jagannathan
- 👤 Steve S. Miura
- 👤 Melvin W. Montgomery
- 👤 Harbans S. Sachdev
- 👤 Ratnam Sooriyakumaran
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 22:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; C; C08; C08G; C08G77/00; C08G77/04; C08G77/14; C08G77/16; C08G77/18
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
84 words
An acid sensitive polymer having the formula: ##STR4## wherein m is 0 or 1, and wherein n is at least 3, and wherein the R constituents are either hydrogen groups or X constituent groups which have the formula: ##STR5## wherein the X constituents are selected form the group consisting of secondary alkyl, t-butyl, substituted deactivated secondary benzyl, and 1-(deactivated heterocyclic) secondary alkyl pendant groups, said X constituent groups and said hydrogen groups being present at a X constituent:hydrogen ratio ranging from 15:85 to 50:50.
Claim 2
Dependent Claim
84 words
An acid sensitive polymer having the formula: ##STR4## wherein m is 0 or 1, and wherein n is at least 3, and wherein the R constituents are either hydrogen groups or X constituent groups which have the formula: ##STR5## wherein the X constituents are selected form the group consisting of secondary alkyl, t-butyl, substituted deactivated secondary benzyl, and 1-(deactivated heterocyclic) secondary alkyl pendant groups, said X constituent groups and said hydrogen groups being present at a X constituent:hydrogen ratio ranging from 15:85 to 50:50.
Claim 3
Dependent Claim
19 words
An acid sensitive polymer as recited in claim 1 wherein said X constituent:hydrogen ratio ranges between 25:75 and 30:70.
Claim 4
Dependent Claim
44 words
An acid sensitive polymer having the formula: ##STR6## wherein m is 0 or 1, and wherein n is at least 3, and wherein the R constituents are either hydrogen groups or t-butyloxycarbonyl groups present at a ratio of t-butyloxycarbonyl:hydrogen ranging from 15:85 to 50:50.
Claim 5
Dependent Claim
44 words
An acid sensitive polymer having the formula: ##STR6## wherein m is 0 or 1, and wherein n is at least 3, and wherein the R constituents are either hydrogen groups or t-butyloxycarbonyl groups present at a ratio of t-butyloxycarbonyl:hydrogen ranging from 15:85 to 50:50.
Claim 6
Dependent Claim
18 words
An acid sensitive polymer as recited in claim 3 wherein said t-butyloxycarbonyl:hydrogen ratio ranges between 25:75 and 30:70.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-08-15 | 1998-02-14 | 1998-08-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-08-15 | 2002-02-14 | 2002-08-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-08-15 | 2006-02-14 | 2006-08-16 | $7700.00 | Window Closed / Lapsed |