US4544729A
Expired / Lapsed
US
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Photo and radiation-sensitive organopolymeric material
Assignee: Hitachi Ltd
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Filing: 1984-06-22
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Granted: 1985-10-01
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Expires: 2004-06-22
Abstract
Abstract A photo and radiation sensitive-organopolymeric material having at least one Si--Si) n bond, wherein n is an integer of from 1 to 5 has a good resistance to dry etching, a good adhesion and a good heat resistance and is useful for finer patterning with a good resolution.
Inventors
- 👤 Kazuo Nate
- 👤 Takashi Inoue
- 👤 Hitoshi Yokono
- 👤 Mitsuo Ishikawa
- 👤 Makoto Kumada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 16:48
CPC Classifications
C; C08; C08G; C08G77/00; C08G77/60; C08G77/48; G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0754
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
51 words
A photo and radiation-sensitive organopolymeric material which consists of units represented by the general formula (1): ##STR11## wherein R 2 , R 3 , R 4 , and R 5 are selected from the group consisting of methyl, ethyl, propyl and phenyl; and n is an integer of 1 to 5.
Claim 2
Dependent Claim
51 words
A photo and radiation-sensitive organopolymeric material which consists of units represented by the general formula (1): ##STR11## wherein R 2 , R 3 , R 4 , and R 5 are selected from the group consisting of methyl, ethyl, propyl and phenyl; and n is an integer of 1 to 5.
Claim 3
Dependent Claim
22 words
A photo and radiation-sensitive organopolymeric material according to claim 1, wherein said material has an average molecular weight of 1,000 to 1,000,000.
Claim 4
Dependent Claim
27 words
A photo and radiation-sensitive organopolymeric material according to claim 1, wherein R 2 and R 4 are methyl groups; R 3 and R 5 are phenyl groups.
Claim 5
Dependent Claim
30 words
A photo and radiation-sensitive organopolymeric material according to claim 1, wherein R 2 and R 4 are methyl groups; R 3 and R 5 are phenyl groups; n is 1.
Claim 6
Dependent Claim
28 words
A photo and radiation-sensitive organopolymeric material according to claim 1, wherein R 2 and R 4 are methyl groups and R 3 and R 5 are ethyl groups.
Claim 7
Dependent Claim
31 words
A photo and radiation-sensitive organopolymeric material according to claim 1, wherein R 2 and R 4 are methyl groups; R 3 and R 4 are ethyl groups; and n is 1.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-09-30 | 1989-04-01 | 1989-10-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-09-30 | 1993-04-01 | 1993-10-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-09-30 | 1997-04-01 | 1997-10-01 | $7700.00 | Window Closed / Lapsed |