Patent US5457006A successfully refreshed from Google Patents.
US5457006A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of manufacturing photo-mask and photo-mask manufactured thereby
Assignee: Sharp Corp
•
Filing: 1991-03-29
•
Granted: 1995-10-10
•
Expires: 2011-03-29
Abstract
Abstract A photo-mask and a method of manufacturing a photo-mask, which includes the steps of applying a resist film onto a substrate of quartz, glass and the like, subjecting the resist film to light exposure and development to form a fine resist pattern, etching the mask substrate covered by the fine resist pattern, causing a non-light transmitting thin film of Cr, Ta, etc. to adhere thereon by vapor deposition, sputtering and the like, and removing the thin film on the resist pattern together with the resist film, thereby to form the photo-mask.
Inventors
- 👤 Junji Hirokane
- 👤 Hiroyuki Katayama
- 👤 Akira Takahashi
- 👤 Tetsuya Inui
- 👤 Kenji Ohta
- 👤 Junichi Washo
- 👤 Tomoyuki Miyake
- 👤 Kazuo Van
- 👤 Michinobu Mieda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 20:50
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; G03F1/68; G11; G11B; G11B7/00; G11B7/24; G11B7/26; G11B7/261; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
149 words
A method of manufacturing a photo-mask for an optical disc which comprises the steps of: applying a resist film onto a substrate; subjecting said resist film to light exposure and development to form a fine resist pattern; etching said substrate at portions not covered by said fine resist pattern so as to form an etched substrate groove; adhering a non-light transmitting thin film on said fine resist pattern and said etched substrate groove, said thin film being thicker than a thickness of said fine resist pattern; and removing said thin film formed on said fine resist pattern together with said resist film only to a depth equal to the thickness of said resist film to form said photo-mask having a mask pattern of said thin film embedded within said etched substrate groove and such that the surface of said mask pattern is higher than the surface of said substrate.
Claim 2
Independent Claim
149 words
A method of manufacturing a photo-mask for an optical disc which comprises the steps of: applying a resist film onto a substrate; subjecting said resist film to light exposure and development to form a fine resist pattern; etching said substrate at portions not covered by said fine resist pattern so as to form an etched substrate groove; adhering a non-light transmitting thin film on said fine resist pattern and said etched substrate groove, said thin film being thicker than a thickness of said fine resist pattern; and removing said thin film formed on said fine resist pattern together with said resist film only to a depth equal to the thickness of said resist film to form said photo-mask having a mask pattern of said thin film embedded within said etched substrate groove and such that the surface of said mask pattern is higher than the surface of said substrate.
Claim 3
Dependent Claim
58 words
The method as defined in claim 1, wherein said substrate comprises quartz or glass, and resist film is subjected to light exposure of an electron beam or laser light, said substrate is etched by a wet or dry etching method, said non-light transmitting thin film comprises Ta, and said thin film is adhered by vapor deposition or sputtering.
Claim 4
Dependent Claim
13 words
The method as defined in claim 1, wherein said thin film comprises Ta.
References Cited (Backward Citations)
DE208988C
Cited
DE1060717B
Cited
US4094347A
Cited
US4980262A
Cited
JPS5323631A
Cited
JPS53143204A
Cited
JPS565545A
Cited
US4423137A
Cited
US4401738A
Cited
JPS57112727A
Cited
JPS57207256A
Cited
EP0069265A1
Cited
JPS5898923A
Cited
JPS58202526A
Cited
JPS599659A
Cited
JPS5968744A
Cited
US4686162A
Cited
JPS59172648A
Cited
JPS6041228A
Cited
US4655876A
Cited
JPS6156349A
Cited
US4925776A
Cited
US4797316A
Cited
US5079113A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-10-09 | 1999-04-10 | 1999-10-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-10-09 | 2003-04-10 | 2003-10-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-10-09 | 2007-04-10 | 2007-10-10 | $7700.00 | Window Closed / Lapsed |