Patent US5436424A successfully refreshed from Google Patents.
US5436424A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma generating method and apparatus for generating rotating electrons in the plasma
Assignee: Panasonic Holdings Corp
•
Filing: 1993-06-24
•
Granted: 1995-07-25
•
Expires: 2013-06-24
Abstract
Abstract A plasma generating apparatus includes a vacuum chamber having an insulated inner surface, more than two electrodes arranged on the insulated inner surface of the vacuum chamber, a high frequency applying device for applying high frequencies having different phases in order of positions of the electrodes, and a holder on which an object to be processed is placed. In the apparatus, a magnetic field is produced under plural alternating electric fields, so that electrons in a plasma generating portion are rotated to generate high density plasma under a high vacuum when the high frequencies are applied to the electrodes to generate the plasma and a specified process such as etching, CVD, or doping is carried on the object by reaction products generated at the portion.
Inventors
- 👤 Ichiro Nakayama
- 👤 Noboru Nomura
- 👤 Tokuhiko Tamaki
- 👤 Mitsuhiro Okuni
- 👤 Masafumi Kubota
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 16:27
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32302; H01J37/32082; H01J37/32091; H01J37/32137; H01J37/32155; H01J37/32165; H01J37/32431; H01J37/32532; H01J37/32623; H01J37/3266
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
61 words
A method for generating plasma by applying to more than two electrodes, arranged on an insulated surface of a vacuum chamber, high frequencies having different phases in order of positions of the electrodes, comprising rotating electrons in a portion of the vacuum chamber where a plasma is generated when the high frequencies are applied to the electrodes to generate the plasma.
Claim 2
Independent Claim
61 words
A method for generating plasma by applying to more than two electrodes, arranged on an insulated surface of a vacuum chamber, high frequencies having different phases in order of positions of the electrodes, comprising rotating electrons in a portion of the vacuum chamber where a plasma is generated when the high frequencies are applied to the electrodes to generate the plasma.
Claim 3
Dependent Claim
23 words
The method as claimed in claim 1, wherein the electrodes are rotated by producing a magnetic field which causes rotation of the electrons.
Claim 4
Dependent Claim
104 words
A plasma generating apparatus comprising: a vacuum chamber having an insulated inner surface; more than two electrodes arranged on the insulated inner surface of the vacuum chamber; a high frequency applying device for applying high frequencies having different phases in order of positions of the electrodes; and a holder on which an object to be processed is placed; wherein electrons, in a portion of the vacuum chamber where a plasma is generated, are rotated when the high frequencies are applied to the electrodes to generate the plasma and a specified process is carried out onto the object by reaction products generated at the portion.
Claim 5
Dependent Claim
104 words
A plasma generating apparatus comprising: a vacuum chamber having an insulated inner surface; more than two electrodes arranged on the insulated inner surface of the vacuum chamber; a high frequency applying device for applying high frequencies having different phases in order of positions of the electrodes; and a holder on which an object to be processed is placed; wherein electrons, in a portion of the vacuum chamber where a plasma is generated, are rotated when the high frequencies are applied to the electrodes to generate the plasma and a specified process is carried out onto the object by reaction products generated at the portion.
Claim 6
Dependent Claim
19 words
The apparatus as claimed in claim 3, further comprising a device for applying an electrical bias to the holder.
Claim 7
Dependent Claim
25 words
The apparatus as claimed in claim 3, wherein a surface of the holder where the object is placed is substantially the same as the electrodes.
Claim 8
Dependent Claim
25 words
The apparatus as claimed in claim 3, further comprising a device for generating a potential between the holder and the portion of the vacuum chamber.
References Cited (Backward Citations)
US4491496A
Cited
JPS60153129A
Cited
JPS6244576A
Cited
US5110438A
Cited
US4871421A
Cited
US5272417A
Cited
US5150375A
Cited
US5116482A
Cited
US5203958A
Cited
JPH0551172A
Cited
US5228939A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-07-24 | 1999-01-23 | 1999-07-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-07-24 | 2003-01-23 | 2003-07-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-07-24 | 2007-01-23 | 2007-07-25 | $7700.00 | Window Closed / Lapsed |