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US4491496A Expired / Lapsed US ⏱️ 0.0 years remaining

Enclosure for the treatment, and particularly for the etching of substrates by the reactive plasma method

Assignee: Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
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Filing: 1984-01-04
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Granted: 1985-01-01
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Expires: 2004-01-04
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Abstract

Abstract Enclosure for the treatment of substrates by the reactive plasma method, consisting in a known manner of an inlet and an outlet (12) for the circulation of a reactive gas at low pressure, a base supporting the substrate (10) to be treated being placed between two electrodes, one of which (3) is at the ground potential and the other (4) or radio-frequency electrode is brought to an alternative potential such as to create an electrical discharge in the enclosure. It is characterized in that the enclosure is metallic and lined by plasma torch spraying with a protective coating (2) of alumina (Al 2 0 3 ) of a thickness of about 300 micrometers.

Inventors

  • 👤 Philippe LaPorte
  • 👤 Louise Peccoud

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 00:08
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32458; H01J37/32477; H01J37/32495; C; C23; C23C; C23C16/00; C23C16/44; C23C16/4401; C23C16/4404; C23C16/50; C23C16/505; C23C16/509; C23C16/5096; C23C4/00; C23C4/04; C23C4/10; C23C4/11; H01J37/02; H01J37/16; H01J37/32009; H01J37/32082; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/334; H01J2237/3341; Y; Y10; Y10S; Y10S156/00; Y10S156/914

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 132 words
Enclosure for the treatment and particularly the etching of substrates by the reactive plasma method, of the kind including, in a known manner, an inlet (7) and an outlet (12) for the circulation of a reactive gas at low pressure, a base supporting the substrate (10) to be treated placed between two electrodes of which one (3) is at ground potential, and the other (4) or radiofrequency electrode is brought to an alternating potential such as to create in the enclosure an electrical discharge which dissociates the gas into reactive particles which react on the substrate, characterized in that the enclosure is metallic and covered on the inside by plasma-torch spraying with a protective coating (2) of alumina (Al 2 O 3 ) of a thickness between 300 micrometers and 500 micrometers.
Claim 2
Dependent Claim 132 words
Enclosure for the treatment and particularly the etching of substrates by the reactive plasma method, of the kind including, in a known manner, an inlet (7) and an outlet (12) for the circulation of a reactive gas at low pressure, a base supporting the substrate (10) to be treated placed between two electrodes of which one (3) is at ground potential, and the other (4) or radiofrequency electrode is brought to an alternating potential such as to create in the enclosure an electrical discharge which dissociates the gas into reactive particles which react on the substrate, characterized in that the enclosure is metallic and covered on the inside by plasma-torch spraying with a protective coating (2) of alumina (Al 2 O 3 ) of a thickness between 300 micrometers and 500 micrometers.
Claim 3
Dependent Claim 24 words
Enclosure of claim 1, characterized in that the alumina (Al 2 O 3 ) coating of the enclosure is completed by a silicone impregnation.
Claim 4
Dependent Claim 18 words
Enclosure of claim 1, characterized in that the radiofrequency electrode (4) is also covered with a protective material.
Claim 5
Dependent Claim 21 words
Enclosure of claim 3, characterized in that the protective material covering the radiofrequency electrode is alumina (Al 2 O 3 ).
Claim 6
Dependent Claim 16 words
Enclosure of claim 3, characterized in that the protective material covering the radiofrequency electrode is tungsten.

References Cited (Backward Citations)

US4325778A Cited
US4384918A Cited
US4424096A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-01-01 1988-07-02 1989-01-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-01-01 1992-07-02 1993-01-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-01-01 1996-07-02 1997-01-01 $7700.00 Window Closed / Lapsed

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