US5436205A
Expired / Lapsed
US
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Method of forming electrode in semiconductor device
Assignee: Fujitsu Ltd
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Filing: 1993-08-06
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Granted: 1995-07-25
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Expires: 2013-08-06
Abstract
Abstract In a process of patterning a conductive film on a semiconductor layer using a mask, thereby to form an electrode, first, anisotropic etching is applied to a conductive film which is not covered by a mask under ambient atmosphere at a high pressure in an almost perpendicular direction, and conductive film materials sublimated by the etching are redeposited on a side wall of a conductive film under the mask. Lastly, the conductive film on the semiconductor layer and redeposited metal are etched isotropically by etchant having low energy under ambient atmosphere where the pressure is reduced, thus having the semiconductor layer exposed from the area which is not covered by the mask.
Inventors
- 👤 Tatsuya Hirose
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 09:15
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/01; H10D30/015; H10D64/00; H10D64/01; H10D64/011; H10P; H10P50/00; H10P50/71
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
160 words
A method of forming an electrode in a semiconductor device, comprising the steps of: forming a conductive film for forming an electrode on a semiconductor layer; forming a mask pattern on said conductive film; applying anisotropic etching in a substantially perpendicular direction to said conductive film by a first etchant using said mask pattern as a mask in a first reduced pressure ambient atmosphere so as to form the conductive film into a thin layer, and redepositing conductive film materials sublimated by etching on the side portion of said conductive film in an area under said mask pattern; and thereafter removing said conductive film in an area which is not covered by said mask pattern by isotropic etching using a second etchant, and etching said conductive film materials redeposited on the side portion of said conductive film under said mask pattern to thereby complete said electrode, wherein said second etchant has a lower energy than that of said first etchant.
Claim 2
Independent Claim
160 words
A method of forming an electrode in a semiconductor device, comprising the steps of: forming a conductive film for forming an electrode on a semiconductor layer; forming a mask pattern on said conductive film; applying anisotropic etching in a substantially perpendicular direction to said conductive film by a first etchant using said mask pattern as a mask in a first reduced pressure ambient atmosphere so as to form the conductive film into a thin layer, and redepositing conductive film materials sublimated by etching on the side portion of said conductive film in an area under said mask pattern; and thereafter removing said conductive film in an area which is not covered by said mask pattern by isotropic etching using a second etchant, and etching said conductive film materials redeposited on the side portion of said conductive film under said mask pattern to thereby complete said electrode, wherein said second etchant has a lower energy than that of said first etchant.
Claim 3
Dependent Claim
46 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein said second etchant having lower energy than that of said first etchant in a second pressure ambient atmosphere where pressure is reduced lower than said first pressure ambient atmosphere is used.
Claim 4
Dependent Claim
46 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein atomic weight, molecular weight and bonding energy of the molecules of said first etchant are larger than atomic weight, molecular weight and bonding energy of the molecules of said second etchant.
Claim 5
Dependent Claim
51 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein the film thickness of said conductive film immediately after said anisotropic etching is the same as the thickness of said conductive materials redeposited on a side wall of a conductive film located under said mask pattern.
Claim 6
Dependent Claim
27 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein said isotropic etching is etching in which a chemical reaction is dominant.
Claim 7
Dependent Claim
30 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein said semiconductor layer is composed of one of a compound semiconductor and an elemental semiconductor.
Claim 8
Dependent Claim
29 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein said conductive film is composed of one of refractory metal and refractory metal silicide.
Claim 9
Dependent Claim
28 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein said electrode and said semiconductor layer are in Schottky contact with each other.
Claim 10
Dependent Claim
51 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein said semiconductor layer is an electron supply layer of a high electron mobility transistor, and said electrode is a gate electrode of a high electron mobility transistor which comes into Schottky contact with said semiconductor layer.
Claim 11
Dependent Claim
72 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein said semiconductor layer is an AlGaAs layer, said conductive film is a WSi film, said first etchant is gas containing CF 4 , said second etchant is gas containing SF 6 , the pressure of said first low pressure ambient atmosphere is 0.5 Pa and the pressure of said second low pressure ambient atmosphere is 0.3 Pa.
Claim 12
Dependent Claim
33 words
A method of forming an electrode in a semiconductor device according to claim 1, wherein an insulating film thinner than said conductive film is formed between said semiconductor layer and said conductive film.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1998-07-24 | 1999-01-23 | 1999-07-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-07-24 | 2003-01-23 | 2003-07-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-07-24 | 2007-01-23 | 2007-07-25 | $7700.00 | Window Closed / Lapsed |