Patent US5424803A successfully refreshed from Google Patents.
US5424803A
Expired / Lapsed
US
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Projection exposure apparatus and semiconductor device manufacturing method
Assignee: Canon Inc
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Filing: 1994-09-26
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Granted: 1995-06-13
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Expires: 2014-09-26
Abstract
Abstract A projection exposure apparatus includes an illumination optical system for constituting illumination source for illuminating an original having an exposure pattern, the illumination optical system including changing mechanism for changing a shape of the illumination source; a projection optical system for projecting an image of the exposure pattern onto a surface to be exposed; an adjuster responsive to the changing mechanism to adjust the projection optical system.
Inventors
- 👤 Miyoko Noguchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 08:53
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70091; G03F7/701
Claims Analysis
Total Claims: 69
Claim 1
Independent Claim
103 words
A semiconductor device manufacturing system, comprising: inspection means for inspecting an original having a device pattern; projection exposure device for transferring the device pattern of the original having been inspected by said inspecting means, onto a wafer, said projection exposure device comprising an illumination optical system for forming illumination source for illuminating the original, said illumination optical system including a changing mechanism for changing a shape of the illumination source, said device further comprising a projection optical system for transferring an image of the pattern onto the wafer and adjusting means for adjusting said projection optical system in response to said changing mechanism.
Claim 2
Dependent Claim
103 words
A semiconductor device manufacturing system, comprising: inspection means for inspecting an original having a device pattern; projection exposure device for transferring the device pattern of the original having been inspected by said inspecting means, onto a wafer, said projection exposure device comprising an illumination optical system for forming illumination source for illuminating the original, said illumination optical system including a changing mechanism for changing a shape of the illumination source, said device further comprising a projection optical system for transferring an image of the pattern onto the wafer and adjusting means for adjusting said projection optical system in response to said changing mechanism.
Claim 3
Dependent Claim
118 words
A-semiconductor device manufacturing system, comprising: p1 inspection means for inspecting an original having a device pattern; p1 projection exposure device for transferring the device pattern of the original having been inspected by said inspecting means, onto a wafer, said projection exposure device comprising an illumination optical system for forming illumination source for illuminating the original, said illumination optical system including a changing mechanism for changing a shape of the illumination source, said device further comprising a projection optical system for transferring an image of the pattern onto the wafer and processing means for calculating an optical property of said projection optical system using a parameter changed in accordance with the change of the shape of the illumination system.
Claim 4
Dependent Claim
118 words
A-semiconductor device manufacturing system, comprising: p1 inspection means for inspecting an original having a device pattern; p1 projection exposure device for transferring the device pattern of the original having been inspected by said inspecting means, onto a wafer, said projection exposure device comprising an illumination optical system for forming illumination source for illuminating the original, said illumination optical system including a changing mechanism for changing a shape of the illumination source, said device further comprising a projection optical system for transferring an image of the pattern onto the wafer and processing means for calculating an optical property of said projection optical system using a parameter changed in accordance with the change of the shape of the illumination system.
Claim 5
Independent Claim
71 words
A device manufacturing methods, comprising the steps of: preparing a wafer and an original having a device pattern; selecting the shape of an illumination source for illuminating the original in accordance with the nature of the pattern; adjusting a projection optical system in accordance with the selected shape; transferring the pattern of the original illuminated by the illumination source, onto the wafer through the projection optical system; and inspecting the original.
Claim 6
Independent Claim
71 words
A device manufacturing methods, comprising the steps of: preparing a wafer and an original having a device pattern; selecting the shape of an illumination source for illuminating the original in accordance with the nature of the pattern; adjusting a projection optical system in accordance with the selected shape; transferring the pattern of the original illuminated by the illumination source, onto the wafer through the projection optical system; and inspecting the original.
Claim 7
Independent Claim
81 words
A device manufacturing method comprising the steps of: preparing a wafer and an original having a device pattern; selecting the shape of an illumination source for illuminating the original in accordance with the nature of the device pattern; calculating an optical property of a projection optical system by using a parameter in accordance with the selected shape; transferring the device pattern of the original illuminated by the illumination source, onto the wafer through the projection optical system; and inspecting the original.
Claim 8
Independent Claim
81 words
A device manufacturing method comprising the steps of: preparing a wafer and an original having a device pattern; selecting the shape of an illumination source for illuminating the original in accordance with the nature of the device pattern; calculating an optical property of a projection optical system by using a parameter in accordance with the selected shape; transferring the device pattern of the original illuminated by the illumination source, onto the wafer through the projection optical system; and inspecting the original.
Claim 9
Dependent Claim
84 words
A projection exposure method, comprising the steps of: determining the shape of an illumination source for illuminating an original having an exposure pattern, in accordance with the exposure pattern; exposing the surface to be exposed with an image of the exposure pattern illuminated by the illumination source, through a projection optical system; and calculating an optical property of the projection optical system, other than the focal point and the projection magnification, by using a parameter corresponding to the determined shape of the illumination source.
Claim 10
Dependent Claim
84 words
A projection exposure method, comprising the steps of: determining the shape of an illumination source for illuminating an original having an exposure pattern, in accordance with the exposure pattern; exposing the surface to be exposed with an image of the exposure pattern illuminated by the illumination source, through a projection optical system; and calculating an optical property of the projection optical system, other than the focal point and the projection magnification, by using a parameter corresponding to the determined shape of the illumination source.
Claim 11
Independent Claim
135 words
A device manufacturing system, comprising: inspection means for inspecting an original having a device pattern; a projection exposure device for transferring the circuit pattern of the original having been inspected by said inspecting means, onto a wafer, said projection exposure device including an illumination optical system for forming an illumination source for illuminating the original, said illumination optical system including a changing mechanism for changing the shape of the illumination source, said projection exposure device further including a projection optical system for transferring an image of the device pattern of the original onto the wafer and processing means for calculating an optical property of said projection optical system, other than the focal point and the projection magnification thereof, by using a parameter changed in accordance with the change of the shape of the illumination source.
Claim 12
Independent Claim
135 words
A device manufacturing system, comprising: inspection means for inspecting an original having a device pattern; a projection exposure device for transferring the circuit pattern of the original having been inspected by said inspecting means, onto a wafer, said projection exposure device including an illumination optical system for forming an illumination source for illuminating the original, said illumination optical system including a changing mechanism for changing the shape of the illumination source, said projection exposure device further including a projection optical system for transferring an image of the device pattern of the original onto the wafer and processing means for calculating an optical property of said projection optical system, other than the focal point and the projection magnification thereof, by using a parameter changed in accordance with the change of the shape of the illumination source.
Claim 13
Independent Claim
81 words
A device manufacturing method, comprising the steps of: preparing a wafer and a device pattern; selecting the shape of an illumination source for illuminating the original in accordance with the nature of the pattern; calculating an optical property of a projection optical system, other than the focal point and the projection magnification thereof, by using a parameter in accordance with the selected shape; and transferring the device pattern illuminated by the illumination source, onto the wafer through the projection optical system.
Claim 14
Independent Claim
81 words
A device manufacturing method, comprising the steps of: preparing a wafer and a device pattern; selecting the shape of an illumination source for illuminating the original in accordance with the nature of the pattern; calculating an optical property of a projection optical system, other than the focal point and the projection magnification thereof, by using a parameter in accordance with the selected shape; and transferring the device pattern illuminated by the illumination source, onto the wafer through the projection optical system.
Claim 15
Dependent Claim
14 words
A method according to claim 7, further comprising the step of inspecting the original.
Claim 16
Independent Claim
84 words
A device manufactured by: preparing a wafer and an original having a device pattern; selecting the shape of an illumination source for illuminating the original in accordance with the nature of the device pattern; calculating an optical property of a projection optical system, other than the focal point and the projection magnification thereof, by using a parameter in accordance with the selected shape; and transferring the device pattern of the original illuminated by the illumination source, onto the wafer through the projection optical system.
Claim 17
Independent Claim
84 words
A device manufactured by: preparing a wafer and an original having a device pattern; selecting the shape of an illumination source for illuminating the original in accordance with the nature of the device pattern; calculating an optical property of a projection optical system, other than the focal point and the projection magnification thereof, by using a parameter in accordance with the selected shape; and transferring the device pattern of the original illuminated by the illumination source, onto the wafer through the projection optical system.
Claim 18
Independent Claim
98 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of the illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for adjusting said projection optical system in accordance with the shape of the illumination source.
Claim 19
Independent Claim
98 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of the illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for adjusting said projection optical system in accordance with the shape of the illumination source.
Claim 20
Independent Claim
124 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern thereon; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of the illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for calculating a change in an optical property of said projection optical system, using a parameter corresponding to the shape of the illumination source and for adjusting said projection optical system to compensate for the change of the optical property.
Claim 21
Independent Claim
124 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern thereon; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of the illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for calculating a change in an optical property of said projection optical system, using a parameter corresponding to the shape of the illumination source and for adjusting said projection optical system to compensate for the change of the optical property.
Claim 22
Dependent Claim
22 words
A system according to claim 11, wherein said calculating means calculates a change in the projection magnification of said projection optical system.
Claim 23
Dependent Claim
20 words
A system according to claim 11, wherein said calculating means calculates a change in the imaging position of the image.
Claim 24
Dependent Claim
23 words
A system according to claim 13, wherein said calculating means also calculates a change in the projection magnification of said projection optical system.
Claim 25
Independent Claim
85 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting a projection optical system in accordance with the changed illumination source; illuminating the device pattern with the changed illumination source so as to transfer the illuminated device pattern onto the workpiece through the adjusted projection optical system; and inspecting a surface condition of the device pattern prior to the transfer of the device pattern to the workpiece.
Claim 26
Independent Claim
85 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting a projection optical system in accordance with the changed illumination source; illuminating the device pattern with the changed illumination source so as to transfer the illuminated device pattern onto the workpiece through the adjusted projection optical system; and inspecting a surface condition of the device pattern prior to the transfer of the device pattern to the workpiece.
Claim 27
Independent Claim
108 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; calculating a change in an optical property of a projection optical system, using a parameter corresponding to the changed illumination source; adjusting the projection optical system to compensate for the change in the optical property; illuminating the device pattern with the changed illumination source so as to transfer the illuminated device pattern onto the workpiece through the adjusted projection optical system; and inspecting a surface condition of the device pattern prior to the transfer of the device pattern to the workpiece.
Claim 28
Independent Claim
108 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; calculating a change in an optical property of a projection optical system, using a parameter corresponding to the changed illumination source; adjusting the projection optical system to compensate for the change in the optical property; illuminating the device pattern with the changed illumination source so as to transfer the illuminated device pattern onto the workpiece through the adjusted projection optical system; and inspecting a surface condition of the device pattern prior to the transfer of the device pattern to the workpiece.
Claim 29
Dependent Claim
89 words
A projection exposure method, comprising the steps of: changing a shape of an illumination source for illuminating an original; calculating a change in an optical property of a projection optical system other than an imaging position and a projection magnification, while using a parameter corresponding to the changed illumination source; adjusting the projection optical system to compensate for the change in the optical property; and exposing a surface to be exposed, with an image of the original illuminated by the changed illumination source, through the adjusted projection optical system.
Claim 30
Dependent Claim
89 words
A projection exposure method, comprising the steps of: changing a shape of an illumination source for illuminating an original; calculating a change in an optical property of a projection optical system other than an imaging position and a projection magnification, while using a parameter corresponding to the changed illumination source; adjusting the projection optical system to compensate for the change in the optical property; and exposing a surface to be exposed, with an image of the original illuminated by the changed illumination source, through the adjusted projection optical system.
Claim 31
Independent Claim
138 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of said illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for calculating a change in an optical property of said projection optical system other than an imaging position and a projection magnification, which using a parameter corresponding to the shape of said illumination source, said calculating means further being operable to adjust said projection optical system to compensate for the change in the optical property.
Claim 32
Independent Claim
138 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of said illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for calculating a change in an optical property of said projection optical system other than an imaging position and a projection magnification, which using a parameter corresponding to the shape of said illumination source, said calculating means further being operable to adjust said projection optical system to compensate for the change in the optical property.
Claim 33
Independent Claim
98 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; calculating a change in an optical property of a projection optical system other than an imaging position and a projection magnification, while using a parameter corresponding to the changed illumination source; adjusting the projection optical system to compensate for the change in the optical property; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 34
Independent Claim
98 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; calculating a change in an optical property of a projection optical system other than an imaging position and a projection magnification, while using a parameter corresponding to the changed illumination source; adjusting the projection optical system to compensate for the change in the optical property; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 35
Dependent Claim
30 words
A method according to claim 19, further comprising the step of inspecting a surface condition of the device pattern prior to the transfer of the device pattern to the workpiece.
Claim 36
Independent Claim
103 words
A device manufactured in accordance with a method which includes the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; calculating a change in an optical property of a projection optical system other than an imaging position and a projection magnification while using a parameter corresponding to the changed illumination source; adjusting the projection optical system to compensate for the change in the optical property; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 37
Independent Claim
103 words
A device manufactured in accordance with a method which includes the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; calculating a change in an optical property of a projection optical system other than an imaging position and a projection magnification while using a parameter corresponding to the changed illumination source; adjusting the projection optical system to compensate for the change in the optical property; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 38
Dependent Claim
59 words
A projection exposure method, comprising the steps of: changing a shape of an illumination source for illuminating an original; adjusting an aberration of a projection optical system in accordance with the changed illumination source; and exposing a surface to be exposed, with an image of the original illuminated by the changed illumination source, through the adjusted projection optical system.
Claim 39
Dependent Claim
59 words
A projection exposure method, comprising the steps of: changing a shape of an illumination source for illuminating an original; adjusting an aberration of a projection optical system in accordance with the changed illumination source; and exposing a surface to be exposed, with an image of the original illuminated by the changed illumination source, through the adjusted projection optical system.
Claim 40
Dependent Claim
24 words
A method according to claim 22 wherein said adjusting step includes the step of adjusting the field of curvature of the projection optical system.
Claim 41
Independent Claim
25 words
A method according to claims 22 or 23, wherein said adjusting step includes the step of adjusting the distortion of the image of the original.
Claim 42
Dependent Claim
61 words
A projection exposure method, comprising the steps of: changing a shape of an illumination source for illuminating an original; adjusting the one side blurness of a projection optical system in accordance with the changed illumination source; and exposing a surface to be exposed, with an image of the original illuminated by the changed illumination source, through the adjusted projection optical system.
Claim 43
Dependent Claim
61 words
A projection exposure method, comprising the steps of: changing a shape of an illumination source for illuminating an original; adjusting the one side blurness of a projection optical system in accordance with the changed illumination source; and exposing a surface to be exposed, with an image of the original illuminated by the changed illumination source, through the adjusted projection optical system.
Claim 44
Dependent Claim
60 words
A projection exposure method, comprising the steps of: changing a shape of an illumination source for illuminating an original; adjusting the pivotal inclination of a projection optical system in accordance with the changed illumination source; and exposing a surface to be exposed, with an image of the original illuminated by the changed illumination source, through the adjusted projection optical system.
Claim 45
Dependent Claim
60 words
A projection exposure method, comprising the steps of: changing a shape of an illumination source for illuminating an original; adjusting the pivotal inclination of a projection optical system in accordance with the changed illumination source; and exposing a surface to be exposed, with an image of the original illuminated by the changed illumination source, through the adjusted projection optical system.
Claim 46
Independent Claim
101 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of said illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for adjusting an aberration of the projection optical system in accordance with the shape of said illumination source.
Claim 47
Independent Claim
101 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of said illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for adjusting an aberration of the projection optical system in accordance with the shape of said illumination source.
Claim 48
Dependent Claim
19 words
A system according to claim 27 wherein the aberration includes the field of curvature of the projection optical system.
Claim 49
Independent Claim
19 words
A system according to claims 27 or 28, wherein the aberration includes distortion of the image of the original.
Claim 50
Independent Claim
103 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of said illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for adjusting the one side blurness of said projection optical system in accordance with the shape of said illumination source.
Claim 51
Independent Claim
103 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of said illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for adjusting the one side blurness of said projection optical system in accordance with the shape of said illumination source.
Claim 52
Independent Claim
102 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of said illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for adjusting the pivotal inclination of said projection optical system in accordance with the shape of said illumination source.
Claim 53
Independent Claim
102 words
A device manufacturing system, comprising: inspecting means for inspecting a surface condition of an original having a device pattern; and projection exposure means for transferring the device pattern of the inspected original onto a substrate, wherein said projection exposure means includes (i) means for providing an illumination source for illuminating the original and for changing a shape of said illumination source, (ii) a projection optical system for projecting an image of the device pattern of the original onto the substrate, and (iii) means for adjusting the pivotal inclination of said projection optical system in accordance with the shape of said illumination source.
Claim 54
Independent Claim
68 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting an aberration of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 55
Independent Claim
68 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting an aberration of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 56
Dependent Claim
19 words
A method according to claim 32, wherein the aberration includes the field of curvature of the projection optical system.
Claim 57
Dependent Claim
25 words
A method according to claim 32 or 33 wherein said adjusting step includes the step of adjusting the distortion of the image of the original.
Claim 58
Independent Claim
70 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting the one side blurness of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 59
Independent Claim
70 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting the one side blurness of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 60
Independent Claim
69 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting the pivotal inclination of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 61
Independent Claim
69 words
A device manufacturing method, comprising the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting the pivotal inclination of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 62
Independent Claim
73 words
A device manufactured in accordance with a method which includes the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting an aberration of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 63
Independent Claim
73 words
A device manufactured in accordance with a method which includes the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting an aberration of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 64
Dependent Claim
19 words
A device according to claim 37, wherein the aberration includes the field of curvature of the projection optical system.
Claim 65
Dependent Claim
19 words
A device according to claim 36 or 37, wherein the aberration includes distortion of the image of the original.
Claim 66
Independent Claim
75 words
A device manufactured in accordance with a method which includes the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting the one side blurness of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 67
Independent Claim
75 words
A device manufactured in accordance with a method which includes the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting the one side blurness of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 68
Independent Claim
74 words
A device manufactured in accordance with a method which includes the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting the pivotal inclination of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
Claim 69
Independent Claim
74 words
A device manufactured in accordance with a method which includes the steps of: providing a workpiece and a device pattern; changing a shape of an illumination source for illuminating the device pattern; adjusting the pivotal inclination of a projection optical system in accordance with the changed illumination source; and illuminating the device pattern with the changed illumination source so as to transfer the device pattern onto the workpiece through the adjusted projection optical system.
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