US5413673A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma processing apparatus
Assignee: Tokyo Electron Ltd
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Filing: 1991-11-04
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Granted: 1995-05-09
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Expires: 2011-11-04
Abstract
Abstract In a plasma etching apparatus, a workpiece is mounted on a lower electrode positioned opposite to an upper electrode , a ring-shaped spacer made of a dielectric material is provided on the outer peripheral portion of the lower electrode. When the RF power is supplied between the upper and lower electrodes, the plasma is generated only in a region defined by the upper and lower electrodes surrounded by the dielectric spacer.
Inventors
- 👤 Hideki Fujimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 10:37
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/32431; H01J37/32623; H01J37/32642
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
329 words
A plasma processing apparatus, comprising: a chamber; a pair of opposed electrodes each isolated from internal surfaces of said chamber being spaced in parallel from each other along respective horizontal planes, opposed surfaces of said electrodes being separated by a distance transverse to said horizontal planes of said electrodes, a first discharge impedance being effected between the opposed surfaces of said electrodes; means for introducing a reactive gas between said electrodes; means for applying energy across said electrodes to generate plasma from said gas to etch at least one to be processed substrate arranged on the opposed surface of one of said electrodes; a dielectric spacer member contiguously provided at the outer peripheral portion of one of said electrodes to effect, with said one of said electrodes, a combined opposed surface area having the same size as the area of the opposed surface of the other of said pair of electrodes, said dielectric spacer having an opposed surface extending from the plane of the opposed surface of said one of said electrodes toward the opposed surface of said other of said electrodes to effectively form a first zone defined by the space transversely between the opposed surfaces of said one and other electrodes and a second zone defined by the space transversely between the opposed surface of said other electrode and the opposed surface of said spacer member, another transverse distance separating the opposed surfaces of said other electrode and said spacer member being less than said transverse distance between the opposed surfaces of said one and other electrodes so as to surround said at least one to be processed substrate by said spacer member, said another transverse distance being less than or equal to approximately 2.5 mm, a second discharge impedance being effected between said other electrode and said spacer member in said second zone, the difference between said first and second discharge impedances effectively and substantially confining said plasma in said first zone to etch said substrate.
Claim 2
Dependent Claim
329 words
A plasma processing apparatus, comprising: a chamber; a pair of opposed electrodes each isolated from internal surfaces of said chamber being spaced in parallel from each other along respective horizontal planes, opposed surfaces of said electrodes being separated by a distance transverse to said horizontal planes of said electrodes, a first discharge impedance being effected between the opposed surfaces of said electrodes; means for introducing a reactive gas between said electrodes; means for applying energy across said electrodes to generate plasma from said gas to etch at least one to be processed substrate arranged on the opposed surface of one of said electrodes; a dielectric spacer member contiguously provided at the outer peripheral portion of one of said electrodes to effect, with said one of said electrodes, a combined opposed surface area having the same size as the area of the opposed surface of the other of said pair of electrodes, said dielectric spacer having an opposed surface extending from the plane of the opposed surface of said one of said electrodes toward the opposed surface of said other of said electrodes to effectively form a first zone defined by the space transversely between the opposed surfaces of said one and other electrodes and a second zone defined by the space transversely between the opposed surface of said other electrode and the opposed surface of said spacer member, another transverse distance separating the opposed surfaces of said other electrode and said spacer member being less than said transverse distance between the opposed surfaces of said one and other electrodes so as to surround said at least one to be processed substrate by said spacer member, said another transverse distance being less than or equal to approximately 2.5 mm, a second discharge impedance being effected between said other electrode and said spacer member in said second zone, the difference between said first and second discharge impedances effectively and substantially confining said plasma in said first zone to etch said substrate.
Claim 3
Dependent Claim
29 words
The apparatus of claim 1, wherein said another transverse distance is at least 70% less than said transverse distance between the opposed surfaces of said one and other electrodes.
Claim 4
Dependent Claim
41 words
The apparatus of claim 1, wherein the combined opposed surface area of said dielectric member and said one of said pair of electrodes is aligned transversely with the area of the opposed surface of said other of said pair of electrodes.
Claim 5
Dependent Claim
260 words
A plasma processing apparatus, comprising: a chamber; a pair of opposed electrodes each isolated from internal surfaces of said chamber being spaced in parallel from each other along respective horizontal planes, opposed surfaces of said electrodes being separated by a distance transverse to said horizontal planes of said electrodes, a first discharge impedance being effected between the opposed surfaces of said electrodes; means for introducing a reactive gas between said electrodes; means for applying energy across said electrodes to generate plasma from said gas to etch at least one to be processed substrate arranged on the opposed surface of one of said electrodes; a pair of opposed dielectric spacer members each contiguously provided at the outer peripheral portion of a corresponding one of said electrodes, said dielectric spacer members extending toward each other and separated from respective opposed surfaces thereof by another distance transverse to said horizontal planes of said electrodes, said another transverse distance being less than said transverse distance separating said electrodes, said another transverse distance being less than or equal to approximately 2.5 mm, said pair of dielectric spacer members effectively forming a first zone defined by the space transversely between the opposed surfaces of said pair of opposed electrodes and a second zone defined by the space transversely between the opposed surfaces of said dielectric spacer members, a second discharge impedance being effected between said pair of spacer members in said second zone, the difference between said first and second discharge impedances effectively and substantially confining said plasma in said first zone to etch said substrate.
Claim 6
Dependent Claim
260 words
A plasma processing apparatus, comprising: a chamber; a pair of opposed electrodes each isolated from internal surfaces of said chamber being spaced in parallel from each other along respective horizontal planes, opposed surfaces of said electrodes being separated by a distance transverse to said horizontal planes of said electrodes, a first discharge impedance being effected between the opposed surfaces of said electrodes; means for introducing a reactive gas between said electrodes; means for applying energy across said electrodes to generate plasma from said gas to etch at least one to be processed substrate arranged on the opposed surface of one of said electrodes; a pair of opposed dielectric spacer members each contiguously provided at the outer peripheral portion of a corresponding one of said electrodes, said dielectric spacer members extending toward each other and separated from respective opposed surfaces thereof by another distance transverse to said horizontal planes of said electrodes, said another transverse distance being less than said transverse distance separating said electrodes, said another transverse distance being less than or equal to approximately 2.5 mm, said pair of dielectric spacer members effectively forming a first zone defined by the space transversely between the opposed surfaces of said pair of opposed electrodes and a second zone defined by the space transversely between the opposed surfaces of said dielectric spacer members, a second discharge impedance being effected between said pair of spacer members in said second zone, the difference between said first and second discharge impedances effectively and substantially confining said plasma in said first zone to etch said substrate.
Claim 7
Dependent Claim
49 words
The apparatus of claim 4, wherein the opposed surfaces of said pair of electrodes each has substantially the same surface area as the other opposed surface; and wherein the opposed surfaces of said opposed dielectric spacer members each has substantially the same surface area as the other opposed surface.
Claim 8
Dependent Claim
50 words
The apparatus of claim 4, wherein each corresponding one of said electrodes and its contiguous spacer member have the same combined opposed surface area as the other corresponding one of said electrodes and its contiguous spacer member, said respective combined opposed surface areas being aligned transversely to said horizontal planes.
Claim 9
Dependent Claim
29 words
The apparatus of claim 4, wherein said another transverse distance is at least 70% less than said transverse distance between the opposed surfaces of said pair of opposed electrodes.
Claim 10
Dependent Claim
288 words
A plasma processing apparatus, comprising: a chamber; a pair of opposed electrodes each isolated from internal surfaces of said chamber being spaced in parallel from each other along respective horizontal planes, opposed surfaces of said electrodes being separated by a distance transverse to said horizontal planes of said electrodes, a first discharge impedance being effected between the opposed surfaces of said electrodes; means for introducing a reactive gas between said electrodes; means for applying energy across said electrodes to generate plasma from said gas to etch at least one to be processed substrate arranged on the opposed surface of one of said electrodes; a pair of opposed dielectric spacer members each contiguously provided at the outer peripheral portion of a corresponding one of said electrodes, one of said spacer members extending from the plane of the opposed surface of its corresponding one of said electrodes toward the other spacer member to effect, via respective opposed surfaces of said pair of spacer members, another distance transverse to said horizontal planes of said electrodes and to effectively form a first zone defined by the space transversely between the opposed surfaces of said pair of electrodes and a second zone defined by the space transversely between the opposed surfaces of said spacer members, said another transverse distance separating the opposed surfaces of said opposed spacer members being less than said transverse distance between the opposed surfaces of said pair of electrodes, said another transverse distance being less than or equal to approximately 2.5 mm, a second discharge impedance being effected between said spacer members in said second zone, the difference between said first and second discharge impedances effectively and substantially confining said plasma in said first zone to etch said substrate.
Claim 11
Dependent Claim
288 words
A plasma processing apparatus, comprising: a chamber; a pair of opposed electrodes each isolated from internal surfaces of said chamber being spaced in parallel from each other along respective horizontal planes, opposed surfaces of said electrodes being separated by a distance transverse to said horizontal planes of said electrodes, a first discharge impedance being effected between the opposed surfaces of said electrodes; means for introducing a reactive gas between said electrodes; means for applying energy across said electrodes to generate plasma from said gas to etch at least one to be processed substrate arranged on the opposed surface of one of said electrodes; a pair of opposed dielectric spacer members each contiguously provided at the outer peripheral portion of a corresponding one of said electrodes, one of said spacer members extending from the plane of the opposed surface of its corresponding one of said electrodes toward the other spacer member to effect, via respective opposed surfaces of said pair of spacer members, another distance transverse to said horizontal planes of said electrodes and to effectively form a first zone defined by the space transversely between the opposed surfaces of said pair of electrodes and a second zone defined by the space transversely between the opposed surfaces of said spacer members, said another transverse distance separating the opposed surfaces of said opposed spacer members being less than said transverse distance between the opposed surfaces of said pair of electrodes, said another transverse distance being less than or equal to approximately 2.5 mm, a second discharge impedance being effected between said spacer members in said second zone, the difference between said first and second discharge impedances effectively and substantially confining said plasma in said first zone to etch said substrate.
Claim 12
Dependent Claim
49 words
The apparatus of claim 8, wherein the opposed surfaces of said pair of electrodes each has substantially the same surface area as the other opposed surface; and wherein the opposed surfaces of said opposed dielectric spacer members each has substantially the same surface area as the other opposed surface.
Claim 13
Dependent Claim
38 words
The apparatus of claim 8, wherein the respective opposed surfaces of said electrodes are aligned transversely to said horizontal planes; and wherein the respective opposed surfaces of said spacer members are likewise aligned transversely to said horizontal planes.
Claim 14
Dependent Claim
29 words
The apparatus of claim 8, wherein said another transverse distance is at least 70% less than said transverse distance between the opposed surfaces of said pair of opposed electrodes.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-05-08 | 1998-11-07 | 1999-05-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-05-08 | 2002-11-07 | 2003-05-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-05-08 | 2006-11-07 | 2007-05-09 | $7700.00 | Window Closed / Lapsed |