Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
104 words
A dry etching apparatus comprising first and second etching chamber groups, each of which comprises an etching chamber comprising a first and a second electrode member having a first and a second principal surface, respectively, said first and said second principal surfaces opposing each other, said first and said second etching chamber groups being for successively etching an object placed on a predetermined one of the first and the second principal surfaces in each etching chamber with different distributions of etching rate on the predetermined ones of the first and the second principal surfaces in the etching chambers of the respective etching chamber groups.
Claim 2
Dependent Claim
104 words
A dry etching apparatus comprising first and second etching chamber groups, each of which comprises an etching chamber comprising a first and a second electrode member having a first and a second principal surface, respectively, said first and said second principal surfaces opposing each other, said first and said second etching chamber groups being for successively etching an object placed on a predetermined one of the first and the second principal surfaces in each etching chamber with different distributions of etching rate on the predetermined ones of the first and the second principal surfaces in the etching chambers of the respective etching chamber groups.
Claim 3
Dependent Claim
136 words
A dry etching apparatus as claimed in claim 1, the predetermined ones of the first and the second principal surfaces being of the first electrode members, wherein: the second electrode member of each etching chamber of said first etching chamber group comprises first gas emitting means for emitting a gas from a predetermined portion of the second principal surface thereof towards the opposing first principal surface; the second electrode member of each etching chamber of said second etching chamber group comprising second gas emitting means for emitting said gas from a preselected portion of the second principal surface thereof towards the opposing first principal surface, said preselected portion being situated on the second principal surface at a position offset as compared with a position at which said predetermined portion is situated on the second principal surface.
Claim 4
Dependent Claim
37 words
A dry etching apparatus as claimed in claim 2, wherein each second electrode member of the etching chamber of each etching chamber group comprises a side wall extending from a periphery of the second principal surface thereof.
Claim 5
Dependent Claim
39 words
A dry etching apparatus as claimed in claim 3, wherein said side wall in the etching chamber of said first etching chamber group is different in length from that in the etching chamber of said second etching chamber group.
Claim 6
Dependent Claim
40 words
A dry etching apparatus as claimed in claim 4, wherein the second principal surface of the etching chamber of said first etching chamber group is different in area from that of the etching chamber of said second etching chamber group.
Claim 7
Dependent Claim
57 words
A dry etching apparatus as claimed in claim 2, comprising a ring member arranged in a space between the first and the second principal surfaces of the etching chamber of each etching chamber group with said ring member electrically insulated from the first and the second electrode members of the etching chamber of each etching chamber group.
Claim 8
Dependent Claim
59 words
A dry etching apparatus as claimed in claim 6, the first and the second electrode members of the etching chamber of each etching chamber group being laid with a distance left therebetween, wherein the distance of the etching chamber of said first etching chamber group being narrower than that of the etching chamber of said second etching chamber group.
Claim 9
Dependent Claim
93 words
A dry etching apparatus as claimed in claim 1, wherein: the etching chamber of said first etching chamber group comprises first power supply means for supplying first electric power between the first and the second principal surfaces of the first and the second electrode members thereof; the etching chamber of said second etching chamber group comprising second power supply means for supplying second electric power between the first and the second principal surfaces of the first and the second electrode members thereof, said second electric power being different from said first electric power.