US5403228A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Techniques for assembling polishing pads for silicon wafer polishing
Assignee: LSI Corp
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Filing: 1993-07-08
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Granted: 1995-04-04
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Expires: 2013-07-08
Abstract
Abstract A technique for mounting polishing pads to a platen in chemi-mechanical polishing apparatus is disclosed. With two polishing pads, prior to assembly, a seal of material impervious to the chemical action of a polishing slurry is disposed about the perimeter of the interface between the pads. Preferably, the seal is a bead of silicon-based "gasket" material, such as General Electric silicon caulk (RTV) or Dow Corning silicon adhesive, and is disposed in a ring at a radius r' about one inch inward from the perimeter (circumference) of the pads. When the pads are assembled together, the bead squashes and (1) forms a seal, and (2) causes the periphery of the upper pad to curve upward--thereby creating a bowl-like reservoir for increasing the residence time of slurry on the face of the pad prior to overflowing the pad.
Inventors
- 👤 Nicholas F. Pasch
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 05:58
CPC Classifications
B; B24; B24B; B24B37/00; B24B37/11; B24B37/20; B24B37/22; Y; Y10; Y10S; Y10S451/00; Y10S451/921
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
209 words
Apparatus for planarizing by chemi-mechanical polishing a generally flat surface of a semiconductor wafer, comprising: a rotating platen having a front face; at least one polishing pad, the at least one pad having a center, having a front face, having a central area of the front face which is entirely flat for planarizing a generally flat surface of a semiconductor wafer, and having a back face adhering to the front face of the platen; and a bead of material extending around a peripheral region of the back face of the at least one polishing pad and urging the front face of the at least one polishing pad away from the front face of the platen and causing an annular lip to be formed around a peripheral region of the front face of the at least one polishing pad, the peripheral region of the front face of the at least one polishing pad being non-flat and disposed entirely outside of the central area of the front face of the at least one polishing pad; the central area of the front face of the at least one polishing pad being entirely within an area defined by the annular lip and being substantially planar for planarizing the surface of a semiconductor wafer.
Claim 2
Dependent Claim
209 words
Apparatus for planarizing by chemi-mechanical polishing a generally flat surface of a semiconductor wafer, comprising: a rotating platen having a front face; at least one polishing pad, the at least one pad having a center, having a front face, having a central area of the front face which is entirely flat for planarizing a generally flat surface of a semiconductor wafer, and having a back face adhering to the front face of the platen; and a bead of material extending around a peripheral region of the back face of the at least one polishing pad and urging the front face of the at least one polishing pad away from the front face of the platen and causing an annular lip to be formed around a peripheral region of the front face of the at least one polishing pad, the peripheral region of the front face of the at least one polishing pad being non-flat and disposed entirely outside of the central area of the front face of the at least one polishing pad; the central area of the front face of the at least one polishing pad being entirely within an area defined by the annular lip and being substantially planar for planarizing the surface of a semiconductor wafer.
Claim 3
Dependent Claim
151 words
Apparatus according to claim 1, wherein: the at least one polishing pad includes two polishing pads, a first planar polishing pad adhered to the platen and a second polishing pad adhered by a back face to the first polishing pad, the second polishing pad having a front face for planarizing the surface of the wafer; and the bead extends around a peripheral region of an interface between the two polishing pads and forms a seal around the peripheral region making the interface between the two pads impervious to chemical action from polishing slurry; the bead urges the front face of the second polishing pad upward and forms the annular lip around a peripheral region of the front face of the second polishing pad; and a central area of the front face of the second polishing pad, entirely within the peripheral region, remains planar for planarizing the surface of the semiconductor wafer.
Claim 4
Dependent Claim
17 words
Apparatus according to claim 2, wherein: the second polishing pad is stiffer than the first polishing pad.
Claim 5
Dependent Claim
13 words
Apparatus according to claim 2, wherein: the bead is a silicon-based gasket material.
Claim 6
Dependent Claim
13 words
Apparatus according to claim 4, wherein: the gasket material is a silicon caulk.
Claim 7
Dependent Claim
13 words
Apparatus according to claim 4, wherein: the gasket material is a silicon adhesive.
Claim 8
Dependent Claim
51 words
Apparatus according to claim 1, wherein: the annular lip around the peripheral region of the front face of the at least one polishing pad allows chemical-mechanical polishing slurry to accumulate in the central area of the front face of the at least one polishing pad during chemical-mechanical polishing of the wafer.
Claim 9
Dependent Claim
106 words
Apparatus according to claim 7, wherein: the at least one polishing pad has a diameter of about 20-30 inches; the bead has a radial width of one half to one inch and a thickness of about two to three thousandths of an inch; the annular lip extends higher from the platen than the central area of the front face of the at least one polishing pad; and the peripheral region of the front face of the at least one polishing pad extends from a peripheral edge of the at least one polishing pad, inward one inch towards the center of the at least one polishing pad.
Claim 10
Dependent Claim
48 words
Apparatus for chemi-mechanical polishing of semiconductor wafers, according to claim 1, wherein: the flat central area of the front face of the at least one polishing pad comprises at least two thirds of a total surface area of the front face of the at least one polishing pad.
Claim 11
Dependent Claim
62 words
Apparatus for chemi-mechanical polishing of semiconductor wafers, according to claim 1, wherein: the bead causes the peripheral region of the at least one polishing pad to push up and form the annular lip about the peripheral region of the at least one polishing pad while allowing an inner approximately two thirds area of the at least one polishing pad to remain planar.
Claim 12
Dependent Claim
112 words
Chemical-mechanical polishing apparatus, comprising: a polishing pad disposed on a rotating platen, a relatively substantial central area of the polishing pad being planar for planarizing a surface of a semiconductor wafer, a relatively insubstantial peripheral area outside of the central area including an annular lip extending above a plane of the central area for retaining chemical-mechanical polishing slurry on the central area; an additional pad which is flat over its entire area disposed between the polishing pad and the platen; and a bead of gasket material disposed around a peripheral interface of the polishing pad and the additional pad, causing the annular lip to extend above the plane of the central area.
Claim 13
Dependent Claim
112 words
Chemical-mechanical polishing apparatus, comprising: a polishing pad disposed on a rotating platen, a relatively substantial central area of the polishing pad being planar for planarizing a surface of a semiconductor wafer, a relatively insubstantial peripheral area outside of the central area including an annular lip extending above a plane of the central area for retaining chemical-mechanical polishing slurry on the central area; an additional pad which is flat over its entire area disposed between the polishing pad and the platen; and a bead of gasket material disposed around a peripheral interface of the polishing pad and the additional pad, causing the annular lip to extend above the plane of the central area.
Claim 14
Dependent Claim
90 words
Apparatus for chemical-mechanically polishing a semiconductor wafer, comprising: a round, rotating platen; a first, planar polishing pad adhered to the platen; a second polishing pad adhered to the first polishing pad; a lip formed in a peripheral region of the second polishing pad for retaining polishing slurry on the second polishing pad; a central region of the second polishing pad being perfectly flat for chemical-mechanically polishing a semiconductor wafer wherein the lip is formed by a bead of material disposed between the first polishing pad and the second polishing pad.
Claim 15
Dependent Claim
90 words
Apparatus for chemical-mechanically polishing a semiconductor wafer, comprising: a round, rotating platen; a first, planar polishing pad adhered to the platen; a second polishing pad adhered to the first polishing pad; a lip formed in a peripheral region of the second polishing pad for retaining polishing slurry on the second polishing pad; a central region of the second polishing pad being perfectly flat for chemical-mechanically polishing a semiconductor wafer wherein the lip is formed by a bead of material disposed between the first polishing pad and the second polishing pad.
Claim 16
Dependent Claim
112 words
Chemical-mechanical polishing apparatus, comprising: a polishing pad disposed on a rotating platen, a relatively substantial central area of the polishing pad being planar for planarizing a surface of a semiconductor wafer, a relatively insubstantial peripheral area outside of the central area including an annular lip extending above a plane of the central area for retaining chemical-mechanical polishing slurry on the central area; an additional pad which is flat over its entire area disposed between the polishing pad and the platen; and a bead of gasket material disposed around a peripheral interface of the polishing pad and the additional pad, causing the annular lip to extend above the plane of the central area.
Claim 17
Dependent Claim
112 words
Chemical-mechanical polishing apparatus, comprising: a polishing pad disposed on a rotating platen, a relatively substantial central area of the polishing pad being planar for planarizing a surface of a semiconductor wafer, a relatively insubstantial peripheral area outside of the central area including an annular lip extending above a plane of the central area for retaining chemical-mechanical polishing slurry on the central area; an additional pad which is flat over its entire area disposed between the polishing pad and the platen; and a bead of gasket material disposed around a peripheral interface of the polishing pad and the additional pad, causing the annular lip to extend above the plane of the central area.
Claim 18
Dependent Claim
31 words
Chemical-mechanical polishing apparatus, according to claim 13, wherein: the central area extends from a center of the pad to two-thirds of a radial distance to a peripheral edge of the pad.
Claim 19
Dependent Claim
25 words
Chemical-mechanical polishing apparatus, according to claim 13, wherein: the annular lip extends a few thousandths of an inch above the plane of the central area.
Claim 20
Dependent Claim
96 words
Apparatus for chemical-mechanically polishing a semiconductor wafer, comprising: a round, rotating platen; a first, planar polishing pad adhered to the platen; a second polishing pad adhered to the first polishing pad; an annular non-planar structure formed in a peripheral region of the second polishing pad for retaining polishing slurry on the second polishing pad; a central region of the second polishing pad being perfectly flat for chemical-mechanically polishing a semiconductor wafer; wherein the annular, non-planar structure is a lip formed by a bead of material disposed between the first polishing pad and the second polishing pad.
Claim 21
Dependent Claim
96 words
Apparatus for chemical-mechanically polishing a semiconductor wafer, comprising: a round, rotating platen; a first, planar polishing pad adhered to the platen; a second polishing pad adhered to the first polishing pad; an annular non-planar structure formed in a peripheral region of the second polishing pad for retaining polishing slurry on the second polishing pad; a central region of the second polishing pad being perfectly flat for chemical-mechanically polishing a semiconductor wafer; wherein the annular, non-planar structure is a lip formed by a bead of material disposed between the first polishing pad and the second polishing pad.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-04-03 | 1998-10-03 | 1999-04-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-04-03 | 2002-10-03 | 2003-04-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-04-03 | 2006-10-03 | 2007-04-04 | $7700.00 | Window Closed / Lapsed |