Process for forming a static-random-access memory cell

Claim 2

A process for forming a static-random-access memory cell comprising the steps of: providing a semiconductor substrate having: a first conductivity type; a primary surface; and first, second, third, and fourth regions adjacent to the primary surface, wherein the first and third regions lie adjacent to each other and the second and fourth regions lie adjacent to each other; doping the first region with a first dopant to a first dose, wherein the first dopant has the first conductivity type; doping the second region with a second dopant to a second dose, wherein: the second dopant has the first conductivity type; and the first dose is heavier than the second dose; forming a field isolation region over the first and second regions and adjacent but not over the third and fourth regions; forming a gate dielectric layer over the third and fourth regions; forming first and second conductive members over the gate dielectric layer, wherein: the first conductive member overlies the third region and acts as a gate electrode for a pass transistor; and the second conductive member overlies the fourth region and acts as a gate electrode for a latch transistor; and forming fifth regions to form the pass and latch transistors, wherein: the fifth regions lie adjacent to the primary surface and sides of the first and second conductive members; the fifth regions have a second conductivity type that is opposite the first conductivity type.

Claim 3

The process of claim 1, further comprising a step of annealing the semiconductor substrate to drive the first dopant within the first region prior to the step of forming the field isolation region.

Claim 4

The process of claim 1 wherein the steps of doping the first and second regions are performed such that the first dose is in a range of 1.5-30 times higher than the second dose.

Claim 5

The process of claim 1, wherein the substrate, the first dopant, and the second dopant include boron.

Claim 6

The process of claim 1, wherein the steps of forming the first and second regions is performed by implanting ions into the substrate, wherein the ions are selected from a group consisting of boron ions and boron difluoride ions.

Claim 7

A process for forming a memory array including a plurality of static-random-access memory cells comprising the step of: providing a semiconductor substrate having: a first conductivity type; a primary surface; and first, second, third, and fourth regions adjacent to the primary surface, wherein the first and third regions are adjacent to one another and the second and fourth regions are adjacent to one another; doping the first regions with a first dopant to a first dose, wherein the first dopant has the first conductivity type; doping the second regions with a second dopant to a second dose, wherein: the second dopant has the first conductivity type; and the first dose is heavier than the second dose; forming at least one field isolation region, wherein the at least one field isolation overlies the first and second regions and adjacent but not over the third and fourth regions; forming a gate dielectric layer over the third and fourth regions; forming first and second conductive members over the gate dielectric layer, wherein: the first conductive member acts as gate electrodes for pass transistors and as a word line for the memory array; and each of the second conductive members act as a gate electrode for a latch transistor; forming fifth regions to form pass and latch transistors, wherein: the fifth regions lie adjacent to the primary surface and sides of the first and second conductive members; and the fifth regions have a second conductivity type that is opposite the first conductivity type; forming an insulating layer over the pass and latch transistors; and forming load components over the insulating layer, wherein the load components are selected from a group consisting of resistors, transistors, and diodes.

Claim 8

A process for forming a memory array including a plurality of static-random-access memory cells comprising the step of: providing a semiconductor substrate having: a first conductivity type; a primary surface; and first, second, third, and fourth regions adjacent to the primary surface, wherein the first and third regions are adjacent to one another and the second and fourth regions are adjacent to one another; doping the first regions with a first dopant to a first dose, wherein the first dopant has the first conductivity type; doping the second regions with a second dopant to a second dose, wherein: the second dopant has the first conductivity type; and the first dose is heavier than the second dose; forming at least one field isolation region, wherein the at least one field isolation overlies the first and second regions and adjacent but not over the third and fourth regions; forming a gate dielectric layer over the third and fourth regions; forming first and second conductive members over the gate dielectric layer, wherein: the first conductive member acts as gate electrodes for pass transistors and as a word line for the memory array; and each of the second conductive members act as a gate electrode for a latch transistor; forming fifth regions to form pass and latch transistors, wherein: the fifth regions lie adjacent to the primary surface and sides of the first and second conductive members; and the fifth regions have a second conductivity type that is opposite the first conductivity type; forming an insulating layer over the pass and latch transistors; and forming load components over the insulating layer, wherein the load components are selected from a group consisting of resistors, transistors, and diodes.

Claim 9

The process of claim 6, further comprising a step of annealing the substrate to drive the first dopant within the first regions prior to the step of forming the at least one field isolation region.

Claim 10

The process of claim 6, wherein the steps of doping the first and second doped regions are performed such that the first dose is in a range of 1.5-30 times higher than the second dose.

Claim 11

The process of claim 6, wherein the steps of forming the first and second doped regions is performed by implanting ions into the substrate, wherein the ions are selected from a group consisting of boron ions and boron difluoride ions.

Claim 12

The process of claim 6, wherein the substrate, first dopant, and the second dopant include boron.