Patent US5369054A successfully refreshed from Google Patents.
← Back to Patent Explorer
US5369054A Expired / Lapsed US ⏱️ 0.0 years remaining

Circuits for ESD protection of metal-to-metal antifuses during processing

Assignee: Microsemi SoC Corp
•
Filing: 1993-07-07
•
Granted: 1994-11-29
•
Expires: 2013-07-07
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A static-charge protection device for an antifuse includes an additional second-sized aperture smaller in area than the antifuse apertures disposed in the same inter-electrode dielectric layer. Antifuse material is disposed in the second-sized aperture, and the upper electrode extends over the second aperture as well as the first aperture. A preferred process for fabricating the protection device utilizes the step of forming the smaller apertures and forming their antifuse material layers simultaneously with forming the antifuse apertures. A static-charge protection device for an antifuse device includes an additional second-sized aperture larger in area than the first-sized antifuse apertures. Metal plug material is deposited and etched back. A layer of amorphous silicon antifuse material is formed and defined over the first and second sized apertures, the portion formed over the larger partially filled antifuse protection device cell being thinner.

Inventors

  • 👤 Yeouchung Yen
  • 👤 Wenn-Jei Chen
  • 👤 Steve S. Chiang
  • 👤 Abdul R. Forouhi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 18:27
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/49; H10W20/491; H10W42/00; H10W42/60

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 134 words
A process for forming a protection device for at least one antifuse disposed between a lower conductor comprising a lower antifuse electrode and an upper conductor comprising an upper antifuse electrode, said upper electrode separated from said lower electrode by an insulating layer having a first aperture of a first size formed therethrough, said antifuse characterized by a layer of antifuse material formed over said lower conductor in said first aperture, comprising the steps of: forming a second aperture through said insulating layer to expose said lower conductor, said second aperture having a second size smaller than said first size; forming a layer of said antifuse material in said first and second apertures over said lower conductor; and forming said upper conductor over said layer of antifuse material in said first and second apertures.
Claim 2
Dependent Claim 134 words
A process for forming a protection device for at least one antifuse disposed between a lower conductor comprising a lower antifuse electrode and an upper conductor comprising an upper antifuse electrode, said upper electrode separated from said lower electrode by an insulating layer having a first aperture of a first size formed therethrough, said antifuse characterized by a layer of antifuse material formed over said lower conductor in said first aperture, comprising the steps of: forming a second aperture through said insulating layer to expose said lower conductor, said second aperture having a second size smaller than said first size; forming a layer of said antifuse material in said first and second apertures over said lower conductor; and forming said upper conductor over said layer of antifuse material in said first and second apertures.
Claim 3
Dependent Claim 16 words
The process of claim 1 wherein said second aperture is formed simultaneously with said first aperture.
Claim 4
Dependent Claim 31 words
The process of claim 1 wherein said layer of antifuse material is formed in said second aperture simultaneously with the formation of said layer of antifuse material in said first aperture.
Claim 5
Dependent Claim 45 words
The process of claim 1 wherein said second aperture is formed simultaneously with the formation of said first aperture and said layer of antifuse material in said second aperture is formed simultaneously with the formation of said layer of antifuse material in said first aperture.

References Cited (Backward Citations)

EP0416903A2 Cited
US5070384A Cited
US5166556A Cited
US5233217A Cited
US5290734A Cited
US5171715A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-11-28 1998-05-30 1998-11-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-11-28 2002-05-30 2002-11-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-11-28 2006-05-30 2006-11-29 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag