Patent US2076693A successfully refreshed from Google Patents.
Patent US5362598A successfully refreshed from Google Patents.
US5362598A
Expired / Lapsed
US
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Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye
Assignee: Sumitomo Chemical Co Ltd
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Filing: 1993-10-06
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Granted: 1994-11-08
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Expires: 2013-10-06
Abstract
Abstract A photoresist composition which comprises a compound of the general formula: <IMAGE> (I) wherein R1, R2 and R3 are the same or different and represent a hydrogen atom, a hydroxyl group, -OCOR4, -O-R5, -OSi(R6)3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted phenyl group or an optionally substituted aralkyl group; R4, R5 and R6 represent an optionally substituted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent -CN, -COOR7, -CONR8R9, <IMAGE> R7 represents an alkyl group; R8 and R9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R10 represents a hydrogen atom, an optionally substituted alkyl group or a hydroxyl group; and a is a number of 1 to 2, which is suitable for forming fine patterns having high resolution on a substrate having high reflectance.
Inventors
- 👤 Naoki Takeyama
- 👤 Yasunori Uetani
- 👤 Hirotoshi Nakanishi
- 👤 Ryotaro Hanawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 15:51
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/091
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
180 words
A photoresist composition, which comprises an admixture of an alkali-soluble resin, a quinone diazide compound, and a compound of the general formula: ##STR11## wherein R 1 , R 2 , and R 3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR 4 , --O--R 5 , --OSi(R 6 ) 3 , an optionally substituted alkyl group or an optionally substituted alkenyl group; R 4 , R 5 and R 6 represent an optionally substituted lower alkyl group; X and Y are the same or different and represent --CN, --COOR 7 , ##STR12## R 7 represents an alkyl group; R 8 and R 9 are the same or different and represent a hydrogen atom, or an optionally substituted alkyl or phenyl group; R 10 represents a hydrogen atom, an optionally substituted alkyl group, or a hydroxyl group; and is a number from 1 to 2, wherein the amount of said compound of the general formula (I) is from 0.2 to 20% by weight based on the total weight of solid components in said photoresist composition.
Claim 2
Dependent Claim
180 words
A photoresist composition, which comprises an admixture of an alkali-soluble resin, a quinone diazide compound, and a compound of the general formula: ##STR11## wherein R 1 , R 2 , and R 3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR 4 , --O--R 5 , --OSi(R 6 ) 3 , an optionally substituted alkyl group or an optionally substituted alkenyl group; R 4 , R 5 and R 6 represent an optionally substituted lower alkyl group; X and Y are the same or different and represent --CN, --COOR 7 , ##STR12## R 7 represents an alkyl group; R 8 and R 9 are the same or different and represent a hydrogen atom, or an optionally substituted alkyl or phenyl group; R 10 represents a hydrogen atom, an optionally substituted alkyl group, or a hydroxyl group; and is a number from 1 to 2, wherein the amount of said compound of the general formula (I) is from 0.2 to 20% by weight based on the total weight of solid components in said photoresist composition.
Claim 3
Dependent Claim
17 words
The photoresist composition according to claim 1, which comprises a novolak resin and a naphthoquinone diazide compound.
Claim 4
Dependent Claim
38 words
The photoresist composition according to claim 1, wherein said alkyl group R 1 , R 2 , R 3 , R 7 , R 8 , R 9 , or R 10 has up to four carbon atoms.
Claim 5
Dependent Claim
27 words
The photoresist composition according to claim 1, wherein said lower alkyl group R 4 , R 5 , or R 6 has up to six carbon atoms.
Claim 6
Dependent Claim
18 words
The photoresist composition according to claim 4, wherein said lower alkyl group has up to four carbon atoms.
Claim 7
Dependent Claim
27 words
The photoresist composition according to claim 5, wherein said optionally substituted lower alkyl group R 4 , R 5 , and R 6 includes a hydroxyl group.
Claim 8
Dependent Claim
22 words
The photoresist composition according to claim 1, which comprises a cresol novolak resin and an ester of polyhydroxybenzophenone with napthoquinone-1,2-diazide sulfonic acid.
Claim 9
Dependent Claim
27 words
The photoresist composition according to claim 7, wherein said polyhydroxybenzophenone is selected from the group consisting of 2,3,4-trihydroxybenzophenone, 2,3,4,4'-tetrahydroxybenzophenone, 2,2',4,4'-tetrahydrozybenzophenone, 2,3,3',4-tetrahydroxybenzophenone, 2,2',3,4,5-pentahydroxybenzophenone, 2,3,3',4,5-pentahydroxybenzophenone, 2,3,3',4,4'-pentahydroxybenzophenone, 2,2',3,4,4'-pentahydroxybenzophenone, and 2,2',3,3'4-pentahydroxybenzophenone.
Claim 10
Dependent Claim
23 words
The photoresist composition according to claim 1, wherein said compound of the general formula (I) is selected from the group consisting of: ##STR13##
Claim 11
Dependent Claim
23 words
The photoresist composition of claim 1, wherein said compound of formula (I) has absorption in the wavelength range not longer than 550 nm.
Claim 12
Dependent Claim
24 words
The photoresist composition according to claim 10, wherein said compound of formula (I) has absorption in the wavelength range between 300 and 450 nm.
Claim 13
Dependent Claim
39 words
The photoresist composition according to claim 1, wherein said compound of formula (I) is present in the photoresist composition in an amount from 0.2 to 10% by weight, based on the weight of the solid component in the photoresist.
Claim 14
Dependent Claim
15 words
The photoresist composition according to claim 1, further comprising at least one other light absorber.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1997-11-07 | 1998-05-09 | 1998-11-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-11-07 | 2002-05-09 | 2002-11-08 | $3760.00 | Window Closed / Lapsed |
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