EP0323631A2
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EP
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Styryl compounds, process for preparing the same and photoresist compositions comprising the same
Assignee: Sumitomo Chemical Co Ltd
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Filing: 1988-12-28
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Granted: —
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Expires: 2008-12-28
Abstract
Abstract A styryl compound of the formula: <CHEM> wherein R1, R2 and R11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R1 and R2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R10 is an optionally substituted alkylene group; R3 is -OH, -OCOR5 or -OSi(R5)3 in which R<5> is an alkyl group; R12 and R13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15, which is suitable as a light absorber in a photoresist composition.
Inventors
- 👤 Takanori Yamamoto
- 👤 Akihiro Furuta
- 👤 Shinji Konishi
- 👤 Takeshi Hioki
- 👤 Ryotaro Hanawa
- 👤 Jun Tomioka
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 15:53
CPC Classifications
C; C07; C07C; C07C229/00; C07C229/40; C07C229/44; C07C255/00; C07C255/01; C07C255/32; C07C255/34; C07C255/42; C07C309/00; C07C309/01; C07C309/02; C07C309/03; C07C309/13; C07C309/14; C07C311/00; C07C311/01; C07C311/02; C07C311/03; C07C311/05; C07C317/00; C07C317/44; C07C317/48; C07F; C07F7/00; C07F7/02; C07F7/08; C07F7/18; C07F7/1804; G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226; G03F7/09; G03F7/091; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/127
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
144 words
A styryl compound of the general formula: or wherein R₁ and R₂ are the same or different and a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group or an optionally substituted aralkyl group or R₁ and R₂ may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R₃ is -OH, -OCOR₅ or -OSi(R₅)₃; X and Y are the same or different and are -CN, -COOR₄, -CONR₆R₇, or R₄ and R₅ are each an alkyl group; R₆, R₇, R₈ and R₉ are the same or different and a hydrogen atom, an optionally substituted lower alkyl or phenyl group; n is a number of 2 to 15; and a and b are the same or different and a number of 1 to 2.
Claim 2
Dependent Claim
144 words
A styryl compound of the general formula: or wherein R₁ and R₂ are the same or different and a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group or an optionally substituted aralkyl group or R₁ and R₂ may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R₃ is -OH, -OCOR₅ or -OSi(R₅)₃; X and Y are the same or different and are -CN, -COOR₄, -CONR₆R₇, or R₄ and R₅ are each an alkyl group; R₆, R₇, R₈ and R₉ are the same or different and a hydrogen atom, an optionally substituted lower alkyl or phenyl group; n is a number of 2 to 15; and a and b are the same or different and a number of 1 to 2.
Claim 3
Dependent Claim
65 words
A process for preparing a styryl compound of the general formula (I) or (II) as claimed in claim 1, which comprises reacting a compound of the general formula: or wherein R₁, R₂ and n are same as defined in claim 1 and R is -OCOR₅ or -OSi(R₅)₃ with a compound of the general formula: wherein X and Y are same as defined in claim 1.
Claim 4
Dependent Claim
19 words
A photoresist composition which comprises the compound of the general formula (I) or (II) as claimed in claim 1.
Claim 5
Dependent Claim
77 words
A photoresist composition which comprises a compound of the general formula: wherein W and Z are the same or different and an electron attractive group; R₁₀ is an optionally substituted C₁-C₁₀ alkylene group, R₁₁ is a hydrogen atom, an optionally substituted C₁-C₁₀ alkyl, alkenyl or aralkyl group; and each of R₁₂ and R₁₃ is independently a hydrogen atom, an optionally substituted lower alkyl group, an optionally substituted lower alkoxy group, an amide group or a halogen atom.
Claim 6
Dependent Claim
77 words
A photoresist composition which comprises a compound of the general formula: wherein W and Z are the same or different and an electron attractive group; R₁₀ is an optionally substituted C₁-C₁₀ alkylene group, R₁₁ is a hydrogen atom, an optionally substituted C₁-C₁₀ alkyl, alkenyl or aralkyl group; and each of R₁₂ and R₁₃ is independently a hydrogen atom, an optionally substituted lower alkyl group, an optionally substituted lower alkoxy group, an amide group or a halogen atom.
References Cited (Backward Citations)
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