Patent US5347561A successfully refreshed from Google Patents.
US5347561A
Expired / Lapsed
US
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X-ray exposure apparatus and semiconductor-device manufacturing method
Assignee: Canon Inc
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Filing: 1993-12-17
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Granted: 1994-09-13
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Expires: 2013-12-17
Abstract
Abstract X-rays enter an airtight chamber through a beam duct, pass through a transmission window, and expose a wafer and mask disposed outside the airtight chamber. The wafer and mask are held by a wafer chuck and a mask holder, respectively. The mask holder includes a pressure sensor, which detects variations in the atmospheric pressure. An output from the pressure sensor is converted into a change in the intensity of the x-rays by an arithmetic unit, and is transmitted to a control unit, which controls a driving unit of a shutter. By thus controlling the moving speed of the shutter in accordance with variations in the atmospheric pressure, it is possible to prevent variations in the amount of x-ray exposure of the wafer.
Inventors
- 👤 Ryuichi Ebinuma
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 14:12
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70558; G03F7/708; G03F7/70808; G03F7/70858; G03F7/70866
Claims Analysis
Total Claims: 25
Claim 1
Independent Claim
93 words
An x-ray exposure apparatus, comprising: substrate holding means for holding a substrate in atmosphere; original holding means for holding an original having a pattern; adjustment means for adjusting an amount of x-ray exposure to the original and the substrate; pressure detection means for detecting atmospheric pressure information in the vicinity of the substrate; calculation means for calculating intensity information of the x-rays irradiating the substrate, based on a detection output from said pressure detection means; and control means for controlling said adjustment means in accordance with a result calculated by said calculation means.
Claim 2
Dependent Claim
93 words
An x-ray exposure apparatus, comprising: substrate holding means for holding a substrate in atmosphere; original holding means for holding an original having a pattern; adjustment means for adjusting an amount of x-ray exposure to the original and the substrate; pressure detection means for detecting atmospheric pressure information in the vicinity of the substrate; calculation means for calculating intensity information of the x-rays irradiating the substrate, based on a detection output from said pressure detection means; and control means for controlling said adjustment means in accordance with a result calculated by said calculation means.
Claim 3
Dependent Claim
31 words
An apparatus according to claim 1, wherein the substrate held by said substrate holding means is situated outside an airtight chamber surrounding a portion of an optical path of the x-rays.
Claim 4
Dependent Claim
19 words
An apparatus according to claim 1, wherein said calculation means calculates transmittance of each wavelength included in the x-rays.
Claim 5
Dependent Claim
15 words
An apparatus according to claim 1, further comprising a radiation source for emitting the x-rays.
Claim 6
Dependent Claim
16 words
An apparatus according to claim 4, wherein said radiation source comprises a synchrotron radiation (SOR) device.
Claim 7
Dependent Claim
23 words
An apparatus according to claim 1, further comprising alignment detection means for detecting the relative positional relationship between the original and the substrate.
Claim 8
Dependent Claim
13 words
An apparatus according to claim 1, wherein said adjustment means comprises a shutter.
Claim 9
Dependent Claim
18 words
An apparatus according to claim 7, wherein said control means controls a driving profile for driving said shutter.
Claim 10
Dependent Claim
80 words
A semiconductor device manufactured by a method comprising the steps of: preparing a mask having a circuit pattern, and a wafer; setting the mask and the wafer at predetermined positions, wherein at least the wafer is in atmosphere; detecting atmospheric pressure information in the vicinity of the wafer; calculating intensity information of x-rays irradiating the wafer, based on a result of said detecting step; and controlling an amount of x-ray exposure in accordance with a result of said calculating step.
Claim 11
Dependent Claim
80 words
A semiconductor device manufactured by a method comprising the steps of: preparing a mask having a circuit pattern, and a wafer; setting the mask and the wafer at predetermined positions, wherein at least the wafer is in atmosphere; detecting atmospheric pressure information in the vicinity of the wafer; calculating intensity information of x-rays irradiating the wafer, based on a result of said detecting step; and controlling an amount of x-ray exposure in accordance with a result of said calculating step.
Claim 12
Dependent Claim
62 words
An x-ray exposure method, comprising the steps of: setting a substrate at a predetermined position in atmosphere; detecting atmospheric pressure information in the vicinity of the substrate; calculating intensity information of x-rays irradiating the substrate, based on a result of said detecting step; and controlling an amount of x-ray exposure to the substrate in accordance with a result of said calculating step.
Claim 13
Dependent Claim
62 words
An x-ray exposure method, comprising the steps of: setting a substrate at a predetermined position in atmosphere; detecting atmospheric pressure information in the vicinity of the substrate; calculating intensity information of x-rays irradiating the substrate, based on a result of said detecting step; and controlling an amount of x-ray exposure to the substrate in accordance with a result of said calculating step.
Claim 14
Dependent Claim
77 words
A semiconductor-device manufacturing method, comprising the steps of: preparing a mask having a circuit pattern, and a wafer; setting the mask and the wafer at predetermined positions, wherein at least the wafer is in atmosphere; detecting atmospheric pressure information in the vicinity of the wafer; calculating intensity information of x-rays irradiating the wafer, based on a result of said detecting step; and controlling an amount of x-ray exposure in accordance with a result of said calculating step.
Claim 15
Dependent Claim
77 words
A semiconductor-device manufacturing method, comprising the steps of: preparing a mask having a circuit pattern, and a wafer; setting the mask and the wafer at predetermined positions, wherein at least the wafer is in atmosphere; detecting atmospheric pressure information in the vicinity of the wafer; calculating intensity information of x-rays irradiating the wafer, based on a result of said detecting step; and controlling an amount of x-ray exposure in accordance with a result of said calculating step.
Claim 16
Dependent Claim
54 words
An X-ray exposure apparatus comprising: a chuck for holding a substrate in atmosphere; adjustment means for adjusting an amount of X-ray exposure to the substrate; a detector for detecting information corresponding to atmospheric pressure of the atmosphere; and a controller for controlling said adjustment means in accordance with a detection output of said detector.
Claim 17
Dependent Claim
54 words
An X-ray exposure apparatus comprising: a chuck for holding a substrate in atmosphere; adjustment means for adjusting an amount of X-ray exposure to the substrate; a detector for detecting information corresponding to atmospheric pressure of the atmosphere; and a controller for controlling said adjustment means in accordance with a detection output of said detector.
Claim 18
Dependent Claim
14 words
An apparatus according to claim 12, wherein said adjustment means comprises a shutter mechanism.
Claim 19
Dependent Claim
18 words
An apparatus according to claim 13, wherein said controller controls a driving profile for moving said shutter mechanism.
Claim 20
Dependent Claim
18 words
An apparatus according to claim 12, further comprising a mask chuck for holding a mask having a pattern.
Claim 21
Dependent Claim
23 words
An apparatus according to claim 15, wherein said mask chuck holds the mask in the atmosphere at a position proximate to the substrate.
Claim 22
Dependent Claim
17 words
An apparatus according to claim 12, further comprising a radiation source for emitting the X-rays for exposure.
Claim 23
Dependent Claim
16 words
An apparatus according to claim 17, wherein said radiation source comprises a synchrotron radiation (SOR) device.
Claim 24
Dependent Claim
41 words
An X-ray exposure method comprising: holding a substrate in atmosphere; detecting information corresponding to atmospheric pressure of the atmosphere; and controlling an amount of X-ray exposure to the substrate in accordance with the atmospheric pressure information detected in said detecting step.
Claim 25
Dependent Claim
41 words
An X-ray exposure method comprising: holding a substrate in atmosphere; detecting information corresponding to atmospheric pressure of the atmosphere; and controlling an amount of X-ray exposure to the substrate in accordance with the atmospheric pressure information detected in said detecting step.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-09-12 | 1998-03-14 | 1998-09-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-09-12 | 2002-03-14 | 2002-09-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-09-12 | 2006-03-14 | 2006-09-13 | $7700.00 | Window Closed / Lapsed |