EP0178660A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
X-ray exposure apparatus
Assignee: Hitachi Ltd
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Filing: 1985-10-17
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Granted: —
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Expires: 2005-10-17
Abstract
Abstract Disclosed is an X-ray exposure apparatus having a low attenuation chamber (5) supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source (1) and a mask (9) so that X-rays (2) transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer (11), the apparatus comprising detecting means (13) for detecting the gas or components mixed in the gas in the low attenuation chamber, control means (14, 15, 16) for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means (21, 3) for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
Inventors
- 👤 Yukio Kembo
- 👤 Yoshihiro Komeyama
- 👤 Minoru Ikeda
- 👤 Akira Inagaki
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 14:08
CPC Classifications
B; B82; B82Y; B82Y10/00; G; G03; G03F; G03F7/00; G03F7/20; G03F7/2037; G03F7/2039; G03F7/70; G03F7/70008; G03F7/70033; G03F7/708; G03F7/70808; G03F7/70841; G03F7/70858; G03F7/70866
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
110 words
An X-ray exposure apparatus having a less-attenuation chamber (5) supplied with a low X-ray absorbing gas, said less-attenuation chamber being interposed between an X-ray source (1) and a mask (9) so that X-rays (2) transmitted through said less-attenuation chamber are irradiated on said mask so as to transfer a pattern of the mask onto a resist on a wafer (11), said apparatus comprising detecting means (13) for detecting said gas or a component mixed in said gas in said less-attenuation chamber, and control means (14, 15, 16) for controlling a quantity of supply of said gas into said less-attenuation chamber in accordance with an output signal of said detecting means.
Claim 2
Dependent Claim
110 words
An X-ray exposure apparatus having a less-attenuation chamber (5) supplied with a low X-ray absorbing gas, said less-attenuation chamber being interposed between an X-ray source (1) and a mask (9) so that X-rays (2) transmitted through said less-attenuation chamber are irradiated on said mask so as to transfer a pattern of the mask onto a resist on a wafer (11), said apparatus comprising detecting means (13) for detecting said gas or a component mixed in said gas in said less-attenuation chamber, and control means (14, 15, 16) for controlling a quantity of supply of said gas into said less-attenuation chamber in accordance with an output signal of said detecting means.
Claim 3
Dependent Claim
31 words
An X-ray exposure apparatus according to Claim 1, in which said detecting means including at least one sensor (13) for detecting a quantity of a selected one of oxygen and nitrogen.
Claim 4
Dependent Claim
21 words
An X-ray exposure apparatus according to Claim 1, in which said detecting means including means for analyzing mass of said gas.
Claim 5
Dependent Claim
36 words
An X-ray exposure apparatus according to Claim 1, further comprising adjusting means (21, 3) for adjusting a quantity of said X-rays effectively irradiated on said mask in accordance with an output signal of said detecting means.
Claim 6
Dependent Claim
21 words
An X-ray exposure apparatus according to Claim 4, in which said adjusting means is arranged to control a shutter opening/closing timing.
Claim 7
Dependent Claim
34 words
An X-ray exposure apparatus according to Claim 1, further comprising means (22) disposed in said low attenuation chamber for equalizing distribution of said gas by causing flow of said gas in said attenuation chamber.
Claim 8
Dependent Claim
108 words
An X-ray exposure apparatus having a less-attenuation chamber (5) supplied with a low X-ray absorbing gas, said less-attenuation chamber being interposed between an X-ray source (1) and a mask (9) so that X-rays (2) transmitted through said less-attenuation chamber are irradiated on said mask so as to transfer a pattern of the mask onto a resist on a wafer (11), said apparatus comprising detecting means (13) for detecting said gas or a component mixed in said gas in said less-attenuation chamber, and adjusting means (21, 3) for adjusting a quantity of said X-rays effectively irradiated onto said mask in accordance with an output signal of said detecting means.
Claim 9
Dependent Claim
108 words
An X-ray exposure apparatus having a less-attenuation chamber (5) supplied with a low X-ray absorbing gas, said less-attenuation chamber being interposed between an X-ray source (1) and a mask (9) so that X-rays (2) transmitted through said less-attenuation chamber are irradiated on said mask so as to transfer a pattern of the mask onto a resist on a wafer (11), said apparatus comprising detecting means (13) for detecting said gas or a component mixed in said gas in said less-attenuation chamber, and adjusting means (21, 3) for adjusting a quantity of said X-rays effectively irradiated onto said mask in accordance with an output signal of said detecting means.
Claim 10
Dependent Claim
21 words
An X-ray exposure apparatus according to Claim 7, in which said adjusting means is arranged to ontrol a shutter opening/closing timing.
Claim 11
Dependent Claim
35 words
An X-ray exposure apparatus accordi g to Claim 7, further comprising means (22) disposed in said low attenuation chamber for equalizing distribution of said gas by causing flow of said gas in said attenuation chamber.
References Cited (Backward Citations)
No citation records indexed.
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