Method of manufacture of semiconductor devices

Claim 3

A method according to claim 1, further comprising the steps of focusing the second beam on a sensor such that the sensor produces a signal corresponding to the position of incidence of the second beam upon the sensor; and detecting the deviation of the first beam with respect to the wafer on the basis of the signal.

Claim 4

A method according to claim 2, wherein the second beam contains visible light and the opening is defined by a glass material effective to absorb X-rays but to transmit visible light, wherein said method further comprises the step of transmitting visible light of the second beam through the glass material of the opening.

Claim 7

A method according to claim 4, further comprising the steps of: directing the second beam to a sensor such that the sensor produces a signal corresponding to the intensity of the second beam; and detecting the intensity of the first beam on the basis of the signal.

Claim 8

A method according to claim 5, wherein the second beam contains visible light and the opening is defined by a glass material effective to absorb X-rays but to transmit visible light, wherein said method further comprises the step of transmitting visible light of the second beam through the glass material of the opening.

Claim 9

An exposure apparatus for manufacture of semiconductor devices, comprising: a synchrotron orbit radiation source generating a radiation beam comprising first and second beams; a beam line having a window supported by a support with an opening formed at least in a portion thereof, an inside of said beam line being maintained substantially in a vacuum through which a radiation beam from said synchrotron orbit radiation source can be propagated so that the first beam can be projected from said window; and an exposure system for receiving the first beam from said window and for projecting the first beam to a pattern, whereby an X-ray sensitive layer of a wafer can be exposed to the pattern, said exposure system being effective to detect the second beam through the opening of said support.

Claim 10

An exposure apparatus for manufacture of semiconductor devices, comprising: a synchrotron orbit radiation source generating a radiation beam comprising first and second beams; a beam line having a window supported by a support with an opening formed at least in a portion thereof, an inside of said beam line being maintained substantially in a vacuum through which a radiation beam from said synchrotron orbit radiation source can be propagated so that the first beam can be projected from said window; and an exposure system for receiving the first beam from said window and for projecting the first beam to a pattern, whereby an X-ray sensitive layer of a wafer can be exposed to the pattern, said exposure system being effective to detect the second beam through the opening of said support.

Claim 11

An apparatus according to claim 7, wherein the opening is defined by a glass material effective to absorb X-rays but to transmit visible light.

Claim 12

An apparatus according to claim 8, wherein the glass material is SiO 2 .

Claim 13

An apparatus according to claim 7, wherein said exposure system includes a sensor for receiving the second beam and for producing a signal corresponding to the position of incidence of the second beam thereupon, and means for detecting the deviation of the first beam with respect to said exposure system on the basis of the signal from said sensor.

Claim 14

An apparatus according to claim 10, further comprising means for adjusting the attitude of said exposure system so as to correct the deviation.

Claim 15

An apparatus according to claim 10, further comprising means for adjusting the path of the radiation beam so as to correct the deviation.

Claim 16

An apparatus according to claim 7, wherein said exposure system includes a sensor for receiving the second beam and for producing a signal corresponding to the intensity of the second beam, and means for detecting the intensity of the first beam on the basis of the signal from said sensor.

Claim 17

An apparatus according to claim 7, wherein said beam line includes a convex mirror effective to reflect and expand the radiation beam from said synchrotron orbit radiation source and to direct the radiation beam to said window.

Claim 18

An apparatus according to claim 7, wherein said supporting member is formed with first and second openings each binge defined by a glass material effective to absorb X-rays but to transmit visible light, the radiation beam further comprises a third beam which is detected through said first opening, wherein said radiation beam further comprises a fourth beam which is detected through said second opening, and wherein said exposure system includes a first sensor for receiving the third beam and for producing a signal corresponding to the position of incidence of the fourth beam thereupon with respect to a first direction, a second sensor for receiving the fourth beam and for producing a signal corresponding to the position of incidence of the fourth beam thereupon with respect to a second direction perpendicular to said first direction, and means for detecting deviation of the first beam with respect to said exposure system in said first and second directions, on the basis of the signals from said first and second sensors.

Claim 19

An apparatus according to claim 7, wherein said opening of said supporting member is defined by a membrane and wherein said exposure system is arranged to detect the second beam through a glass member effective to absorb X-rays but to transmit visible light.

Claim 20

An exposure apparatus for the manufacture of semiconductor devices, and for exposing an X-ray sensitive layer on a wafer to a pattern of a mask, said apparatus comprising: a synchrotron orbit radiation source for generating a radiation beam comprising first and second beams; a beam line having a beryllium window supported by a support, said support having an opening formed at least in a portion thereof and effective to absorb X-rays but to transmit visible light, an inside of said beam line being maintained substantially in a vacuum through which a radiation beam from said synchrotron radiation source can be propagated so that the first beam can be projected from said window; and an exposure system for receiving the first beam from said window and for receiving a second beam from said opening of said support, said exposure system directing the first beam to the pattern of the mask; wherein said exposure system includes a first stage for supporting the mask, a second stage for supporting the wafer, means for collecting the second beam, a sensor for receiving the second beam from said collecting means and for producing a signal corresponding to the position of incidence of the second beam, means for adjusting the attitude of said exposure system, and control means for detecting the deviation of said exposure system with respect to the first beam on the basis of the signal from said sensor and for controlling said adjusting means to substantially correct the deviation.

Claim 21

An exposure apparatus for the manufacture of semiconductor devices, and for exposing an X-ray sensitive layer on a wafer to a pattern of a mask, said apparatus comprising: a synchrotron orbit radiation source for generating a radiation beam comprising first and second beams; a beam line having a beryllium window supported by a support, said support having an opening formed at least in a portion thereof and effective to absorb X-rays but to transmit visible light, an inside of said beam line being maintained substantially in a vacuum through which a radiation beam from said synchrotron radiation source can be propagated so that the first beam can be projected from said window; and an exposure system for receiving the first beam from said window and for receiving a second beam from said opening of said support, said exposure system directing the first beam to the pattern of the mask; wherein said exposure system includes a first stage for supporting the mask, a second stage for supporting the wafer, means for collecting the second beam, a sensor for receiving the second beam from said collecting means and for producing a signal corresponding to the position of incidence of the second beam, means for adjusting the attitude of said exposure system, and control means for detecting the deviation of said exposure system with respect to the first beam on the basis of the signal from said sensor and for controlling said adjusting means to substantially correct the deviation.

Claim 22

An apparatus according to claim 17, wherein said opening of said supporting member is defined by a SiO 2 glass.

Claim 23

An apparatus according to claim 17, wherein said beam line includes a convex mirror effective to reflect and expand the radiation beam from said synchrotron orbit radiation source and to direct the radiation beam to said window.

Claim 24

A method according to claim 1, wherein said projecting step comprises the step of projecting a radiation beam comprising the first beam comprising a beam in an X-ray region and the second beam comprising a beam in a non-X-ray region.

Claim 25

A method according to claim 4, wherein said projecting step comprises the step of projecting a radiation beam comprising the first beam comprising a beam in an X-ray region and the second beam comprising a beam in a non-X-ray region.

Claim 26

An apparatus according to claim 7, wherein the first beam comprises a beam in an X-ray region and the second beam comprises a beam in a non-X-ray region.

Claim 27

An apparatus according to claim 17, wherein the first beam comprises a beam in an X-ray region and the second beam comprises a beam in a non-X-ray region.

Claim 28

A semiconductor device manufacturing method comprising the steps of: introducing a radiation beam from a synchrotron radiation source into a substantially vacuum ambience, wherein the radiation beam includes a first beam in an X-ray region effective to sensitize an X-ray sensitive layer on a wafer, and a second beam in a non-X-ray region, passing the first beam through a window and out of the ambience, and passing the second beam through an opening formed in a portion of a member which supports the window; detecting the second beam passing through the opening; adjusting the relative position of the wafer and the first beam on the basis of the detection in said detecting step; and exposing the X-ray sensitive layer of the wafer with the first beam passing through the window.

Claim 29

A semiconductor device manufacturing method comprising the steps of: introducing a radiation beam from a synchrotron radiation source into a substantially vacuum ambience, wherein the radiation beam includes a first beam in an X-ray region effective to sensitize an X-ray sensitive layer on a wafer, and a second beam in a non-X-ray region, passing the first beam through a window and out of the ambience, and passing the second beam through an opening formed in a portion of a member which supports the window; detecting the second beam passing through the opening; adjusting the relative position of the wafer and the first beam on the basis of the detection in said detecting step; and exposing the X-ray sensitive layer of the wafer with the first beam passing through the window.

Claim 30

A semiconductor device manufacturing method comprising the steps of: introducing a radiation beam from a synchrotron radiation source into a substantially vacuum ambience, wherein the radiation beam includes a first beam in an X-ray region, effective to sensitize an X-ray sensitive layer on a wafer, and a second beam in a non-X-ray region, passing the first beam through a window and out of the ambience, passing the second beam through an opening formed in a portion of a member which supports the window; detecting the second beam passing through the opening; detecting the intensity of the first beam on the basis of the detection in said detecting step; and exposing the X-ray sensitive layer of the wafer with the first beam passing through the window.

Claim 31

A semiconductor device manufacturing method comprising the steps of: introducing a radiation beam from a synchrotron radiation source into a substantially vacuum ambience, wherein the radiation beam includes a first beam in an X-ray region, effective to sensitize an X-ray sensitive layer on a wafer, and a second beam in a non-X-ray region, passing the first beam through a window and out of the ambience, passing the second beam through an opening formed in a portion of a member which supports the window; detecting the second beam passing through the opening; detecting the intensity of the first beam on the basis of the detection in said detecting step; and exposing the X-ray sensitive layer of the wafer with the first beam passing through the window.