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US5346803A
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Photoresist composition comprising a copolymer having a di-t-butyl fumarate
Assignee: Shin-Etsu Chemical Co Ltd
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Filing: 1993-09-15
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Granted: 1994-09-13
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Expires: 2013-09-15
Abstract
Abstract A photoresist composition comprises a polymer of the following formula (1): <IMAGE> (1) wherein R1 is a substituted or unsubstituted aromatic group or -(CH2)p-SiR3 wherein R3 is a methyl or ethyl group and p is equal to 0 or 1, R2 is a hydrogen atom or methyl group, t-Bu is a tertiary-butyl group, and n/(m+n) is in the range of from 0.1 to 0.9. The polymer of formula (1) can form a positive working two-component photoresist composition with a photoacid generator. The polymer of formula (1) can also be used as an alkali soluble resin and in this regard, form a positive working three-component photoresist composition with a photoacid generator and a dissolution inhibitor having at least one group which is unstable to acid. Alternatively, the polymer of formula (1) can be used as a dissolution inhibitor and in this regard, form a positive working three-component photoresist composition with another alkali soluble resin and a photoacid generator.
Inventors
- 👤 James V. Crivello
- 👤 Sang-Yeon Shim
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 23:52
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758; G03F7/0045; G03F7/039; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/111; Y10S430/114; Y10S430/122; Y10S430/126; Y10S430/146
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
73 words
A photoresist composition comprising a polymer of the following formula (1): ##STR20## wherein R 1 is a substituted or unsubstituted aromatic group or --(CH 2 ) p --SiR 3 wherein R 3 is a methyl or ethyl group and p is equal to 0 or 1, R 2 is a hydrogen atom or methyl group, t-Bu is a tertiary-butyl group, and n/(m+n) is from 0.1 to 0.9, in admixture with a photoacid generator.
Claim 2
Dependent Claim
73 words
A photoresist composition comprising a polymer of the following formula (1): ##STR20## wherein R 1 is a substituted or unsubstituted aromatic group or --(CH 2 ) p --SiR 3 wherein R 3 is a methyl or ethyl group and p is equal to 0 or 1, R 2 is a hydrogen atom or methyl group, t-Bu is a tertiary-butyl group, and n/(m+n) is from 0.1 to 0.9, in admixture with a photoacid generator.
Claim 3
Dependent Claim
38 words
The photoresist composition of claim 1 wherein the polymer of formula (1) has a molecular weight of 500 to 100,000 and the following formula: ##STR21## wherein R 2 , t-Bu and n/(m+n) are as defined in formula (1).
Claim 4
Dependent Claim
38 words
The photoresist composition of claim 1 wherein the polymer of formula (1) has a molecular weight of 500 to 100,000 and the following formula: ##STR22## wherein R 2 , t-Bu and n/(m+n) are as defined in formula (1).
Claim 5
Dependent Claim
38 words
The photoresist composition of claim 1 wherein the polymer of formula (1) has a molecular weight of 500 to 100,000 and the following formula: ##STR23## wherein R 2 , t-Bu and n/(m+n) are as defined in formula (1).
Claim 6
Dependent Claim
21 words
The photoresist composition of claim 1 which further comprises a dissolution inhibitor having a group which is unstable to an acid.
Claim 7
Dependent Claim
22 words
A photoresist composition of claim 1, further comprising (A) an alkali-soluble polymer, wherein the polymer of formula (1) is a dissolution inhibitor.
Claim 8
Dependent Claim
39 words
The photoresist composition of claim 6 wherein the alkali-soluble polymer is a polyhydroxystyrene having a molecular weight of 5,000 to 100,000 in which the hydroxyl groups thereof are partially substituted with a group which is unstable to an acid.
Claim 9
Dependent Claim
90 words
The photoresist composition of claim 1 wherein, in the polymer of formula (1), R 1 is a group --(CH 2 ) p --SiR 3 wherein p is equal to 0 or 1, or is a phenyl, naphthyl or carbazole aromatic group in which some or all of the hydrogen atoms of the aromatic ring are optionally substituted by halogen atoms, alkyl groups of 1 to 10 carbon atoms, alkoxy groups of 1 to 10 carbon atoms or trialkylsilyl groups wherein the alkyl groups are of 1 to 6 carbon atoms.
Claim 10
Dependent Claim
19 words
The photoresist composition of claim 1 wherein, in the polymer of formula (1), n/(m+n) is from 0.3 to 0.7.
Claim 11
Dependent Claim
20 words
The photoresist composition of claim 1, wherein the polymer of formula (1) has a molecular weight of 5,000 to 10,000.
Claim 12
Dependent Claim
51 words
The photoresist composition of claim 1, wherein the photoacid generator is of the formula (2): (R.sup.4).sub.q MX (2) wherein each R 4 is independently a substituted or unsubstituted aromatic group, M is a positively charged sulfur or iodine atom, X is an anion and q is a number 2 or 3.
Claim 13
Dependent Claim
52 words
The photoresist composition of claim 11, wherein in the photoacid generator of the formula (2) R 4 is a phenyl group optionally substituted with an alkyl, alkoxy, cycloalkyl or haloalkyl group of 1 to 10 carbon atoms or a halogen atom and X is a p-toluenesulfonate, hexafluoroantimonate, hexafluorophosphate or trifluoromethane sulfonate anion.
Claim 14
Dependent Claim
31 words
The photoresist composition of claim 1, wherein the photoacid generator is present in an amount of 0.5 to 20% by weight based on the weight of the polymer of formula (1).
Claim 15
Dependent Claim
18 words
The photoresist composition of claim 5, wherein the dissolution inhibitor is a compound of the following formula: ##STR24##
Claim 16
Dependent Claim
25 words
The photoresist composition of claim 14, wherein the dissolution inhibitor is present in an amount of 7 to 40% by weight of the entire composition.
Claim 17
Dependent Claim
39 words
The photoresist composition of claim 6, which comprises at least about 55% by weight of the alkali-soluble polymer, 0.5 to 15% by weight of the photoacid generator and 7 to 40% by weight of the polymer of formula (1).
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1997-09-12 | 1998-03-14 | 1998-09-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-09-12 | 2002-03-14 | 2002-09-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-09-12 | 2006-03-14 | 2006-09-13 | $7700.00 | Window Closed / Lapsed |