← Back to Patent Explorer
US5312780A Expired / Lapsed US ⏱️ 0.0 years remaining

Integrated circuit fabrication method

Assignee: Nokia Bell Labs
•
Filing: 1992-12-16
•
Granted: 1994-05-17
•
Expires: 2012-12-16
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A method for forming an anti-reflective coating useful in the fabrication of integrated circuits is discussed. Applicants have found that preheating semiconductor wafers prior to the application of amorphous silicon anti-reflective coatings tends to reduce undesirable particulates which may attach to the wafer. The process is illustratively performed in a Varian 3180 machine having four stations. Illustratively, the wafer may be preheated between 70° C. and 175° C. prior to and during the sputter deposition of an amorphous silicon anti-reflective coating.

Inventors

  • 👤 Arun K. Nanda
  • 👤 Mark J. Sundahl
  • 👤 Edward J. Vajda

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 23:30
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/2043; Y; Y10; Y10S; Y10S148/00; Y10S148/017; Y10S148/158; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/952

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 54 words
A method of semiconductor integrated circuit fabrication comprising: sputtering an amorphous silicon anti-reflective coating upon a substrate chosen from the group consisting of aluminum, spin-on glass and silicon dioxide, by preheating said substrate to a temperature between 70° C. and 175° C. prior to said sputtering step and maintaining said temperature during said sputtering.
Claim 2
Independent Claim 54 words
A method of semiconductor integrated circuit fabrication comprising: sputtering an amorphous silicon anti-reflective coating upon a substrate chosen from the group consisting of aluminum, spin-on glass and silicon dioxide, by preheating said substrate to a temperature between 70° C. and 175° C. prior to said sputtering step and maintaining said temperature during said sputtering.

References Cited (Backward Citations)

US4617192A Cited
US4641420A Cited
US4634474A Cited
US4652467A Cited
US4933304A Cited
US5066615A Cited
US5106786A Cited
US5019234A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-05-16 1997-11-15 1998-05-17 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-05-16 2001-11-15 2002-05-17 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-05-16 2005-11-15 2006-05-17 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag