US5106786A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Thin coatings for use in semiconductor integrated circuits and processes as antireflection coatings consisting of tungsten silicide
Assignee: Nokia Bell Labs
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Filing: 1989-10-23
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Granted: 1992-04-21
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Expires: 2009-10-23
Abstract
Abstract An antireflection coating (21) for use in integrated circuit processing consists of a film of tungsten silicide (WSi0.45) or tungsten silicon nitride (WSiN). These coatings are preferably made by sputtering, with the tungsten silicon nitride coating being made by sputtering in a nitrogen-containing atmosphere.
Inventors
- 👤 Michael F. Brady
- 👤 Aubrey L. Helms, Jr.
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 01:47
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/2043; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/091; Y; Y10; Y10S; Y10S148/00; Y10S148/137; Y10S148/147; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/952
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
89 words
A method for making an integrated circuit comprising the steps of: covering a reflective surface of a substrate with an antireflection coating; covering the antireflection coating with a radiation-sensitive material; selectively exposing the radiation-sensitive material to electromagnetic radiation by directing electromagnetic radiation through a patterned mask onto selected regions of the radiation-sensitive material to form a pattern; selectively removing the radiation-sensitive material in accordance with said pattern, thereby to form a patterned mask, characterized in that: the antireflection coating consists of tungsten silicide having the formula WSi 0 .45.
Claim 2
Independent Claim
89 words
A method for making an integrated circuit comprising the steps of: covering a reflective surface of a substrate with an antireflection coating; covering the antireflection coating with a radiation-sensitive material; selectively exposing the radiation-sensitive material to electromagnetic radiation by directing electromagnetic radiation through a patterned mask onto selected regions of the radiation-sensitive material to form a pattern; selectively removing the radiation-sensitive material in accordance with said pattern, thereby to form a patterned mask, characterized in that: the antireflection coating consists of tungsten silicide having the formula WSi 0 .45.
Claim 3
Independent Claim
107 words
A method for making an integrated circuit comprising the steps of: covering a reflective surface of a substrate with an antireflection coating; covering the antireflection coating with a radiation-sensitive material; selectively exposing the radiation-sensitive material to electromagnetic radiation by directing electromagnetic radiation through a patterned mask onto selected regions of the radiation-sensitive material to form a pattern; selectively removing the radiation-sensitive material in accordance with said pattern, thereby to form a patterned mask, characterized in that: the antireflection coating is a composition containing tungsten and silicon; the sputtering step uses a single target comprising tungsten and silicon; the antireflection coating has a thickness of 125-750 angstrom units.
Claim 4
Independent Claim
107 words
A method for making an integrated circuit comprising the steps of: covering a reflective surface of a substrate with an antireflection coating; covering the antireflection coating with a radiation-sensitive material; selectively exposing the radiation-sensitive material to electromagnetic radiation by directing electromagnetic radiation through a patterned mask onto selected regions of the radiation-sensitive material to form a pattern; selectively removing the radiation-sensitive material in accordance with said pattern, thereby to form a patterned mask, characterized in that: the antireflection coating is a composition containing tungsten and silicon; the sputtering step uses a single target comprising tungsten and silicon; the antireflection coating has a thickness of 125-750 angstrom units.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-04-21 | 1995-10-21 | 1996-04-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-04-21 | 1999-10-21 | 2000-04-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-04-21 | 2003-10-21 | 2004-04-21 | $7700.00 | Window Closed / Lapsed |