US5310623A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for fabricating microlenses
Assignee: Lockheed Martin Corp
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Filing: 1992-11-27
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Granted: 1994-05-10
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Expires: 2012-11-27
Abstract
Abstract A microlens of any designed configuration is formed as a replica in a photoresist material, and the photoresist material replica is used to reproduce the replica directly in a substrate material.
Inventors
- 👤 George Gal
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 05:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0005; G02; G02B; G02B3/00; G02B3/0006; G02B3/0012; G02B3/0031; G02B3/0037; G02B3/0056; G02B6/00; G02B6/10; G02B6/12; G02B6/12002; G02B6/122; G02B6/124; G02B6/1245; G02B6/13; G02B6/136; C; C10; C10M; C10M2201/00; C10M2201/06; C10M2201/065; C10M2201/066; C10M2207/00; C10M2207/10; C10M2207/12; C10M2207/125; C10M2207/129; C10M2211/00; C10M2211/06; C10M2213/00; C10M2213/02; C10M2213/04; C10M2213/06; C10M2213/062; C10N; C10N2040/00; C10N2040/02; G02B2006/12083; G02B2006/12102; G02B2006/12104; G02B2006/12133; G02B2006/12147; G02B2006/12154; G02B2006/12166; G02B2006/12173; G02B2006/12176; G02B2006/12195
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
179 words
A method of fabricating in a photoresist material a replica of a designed microlens of any designed configuration, using a single exposure mask, and reproducing the replica directly in a substrate material, said method comprising, constructing a single exposure mask with a plurality of precisely located and sized light transmitting openings formed with sufficiently small specific opening sizes and located at a sufficiently large number of specific locations, correlated to related locations on the configuration of the designed microlens, to enable a replica image of the designed microlens to be produced in a photoresist material. exposing a related photoresist material to light of a selected wavelength and transmitted through said openings in said single mask for a selected duration of time, processing the exposed photoresist material to produce a replica in the photoresist material of the designed microlens, which replica can be used subsequently for producing the designed microlens in a substrate material, placing the photoresist material replica on a substrate material, and processing the replica and the substrate material to reproduce the replica directly in the substrate material.
Claim 2
Independent Claim
179 words
A method of fabricating in a photoresist material a replica of a designed microlens of any designed configuration, using a single exposure mask, and reproducing the replica directly in a substrate material, said method comprising, constructing a single exposure mask with a plurality of precisely located and sized light transmitting openings formed with sufficiently small specific opening sizes and located at a sufficiently large number of specific locations, correlated to related locations on the configuration of the designed microlens, to enable a replica image of the designed microlens to be produced in a photoresist material. exposing a related photoresist material to light of a selected wavelength and transmitted through said openings in said single mask for a selected duration of time, processing the exposed photoresist material to produce a replica in the photoresist material of the designed microlens, which replica can be used subsequently for producing the designed microlens in a substrate material, placing the photoresist material replica on a substrate material, and processing the replica and the substrate material to reproduce the replica directly in the substrate material.
Claim 3
Dependent Claim
17 words
The invention defined in claim 1 wherein the processing operation is a differential ion milling processing operation.
Claim 4
Dependent Claim
135 words
The invention defined in claim 1 including, designing a desired microlens configuration on a three dimensional plot, applying a fine two dimensional length and width grid to the three dimensional plot of the designed lens to provide a fine resolution of the curvature of the designed lens surfaces by determining of the height of the lens surface at each grid line intersection, constructing a table listing the heights of the lens surfaces at each of the grid line intersections, and constructing the exposure mask based on the table with each of the openings having a specific size and a specific location effective to pass the light intensity required to produce the thickness of cured photoresist material needed to replicate the designed microlens at the location of each opening corresponding to a particular grid line intersection.
Claim 5
Dependent Claim
47 words
The invention defined in claim 3 wherein each opening is a multiple of a minimum, resolution element size opening and wherein the size of the minimum, resolution element opening may be less than the wavelength of the light used to expose the photoresist material through the mask.
Claim 6
Dependent Claim
29 words
The invention defined in claim 4 including calibrating the listings in the table for certain processing parameters involved, including the exposing light and the characteristics of the photoresist material.
Claim 7
Dependent Claim
34 words
The invention defined in claim 1 including duplicating the exposure mask optically to make an array of exposure masks which can be used to make a corresponding array of microlens in the substrate material.
Claim 8
Dependent Claim
19 words
The invention defined in claim 1 wherein the exposure mask is produced by photoreduction of a larger scale mask.
Claim 9
Dependent Claim
36 words
The invention defined in claim 2 wherein both the designed microlens and the microlens reproduced in the substrate material have substantially smooth surface contours rather than step surface contours as produced by binary microlens production techniques.
References Cited (Backward Citations)
US3932184A
Cited
US4279690A
Cited
US4427265A
Cited
US4877717A
Cited
US4986633A
Cited
US4861140A
Cited
US5213916A
Cited
US5139609A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-05-09 | 1997-11-08 | 1998-05-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-05-09 | 2001-11-08 | 2002-05-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-05-09 | 2005-11-08 | 2006-05-10 | $7700.00 | Window Closed / Lapsed |