US4279690A
Expired / Lapsed
US
⏱️ 0.0 years remaining
High-radiance emitters with integral microlens
Assignee: Texas Instruments Inc
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Filing: 1977-09-19
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Granted: 1981-07-21
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Expires: 1997-09-19
Abstract
Abstract This invention deals with the fabrication of radiation emitting diodes having a small diameter shaped integral microlens formed by etching. Initially an oxide layer is deposited on the backside of the processed slice; then a ring pattern is opened in the oxide. An etch is used to form a ring groove with a mesa in the center. The center oxide dot over the mesa is removed and the etching continued to round off the edges of the mesa and to form a smooth shaped structure. Various shapes and diameters may be achieved with different ring dimensions and with different etch times.
Inventors
- 👤 Eugene G. Dierschke
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 06:29
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/80; H10H20/81; H10H20/819; H10H20/01; H10H20/011; H10H20/018; H10H20/84; H10H20/841
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
73 words
A process for making a radiation emitting semiconductor device comprising the steps of depositing an oxide on one side of an emitting device structure having an emitting junction, selectively removing an annular region of the oxide, selectively etching the exposed annular portion of the device structure to form a mesa type structure, selectively removing the oxide over the mesa structure and then selectively etching further to round the top of the mesa structure.
Claim 2
Dependent Claim
73 words
A process for making a radiation emitting semiconductor device comprising the steps of depositing an oxide on one side of an emitting device structure having an emitting junction, selectively removing an annular region of the oxide, selectively etching the exposed annular portion of the device structure to form a mesa type structure, selectively removing the oxide over the mesa structure and then selectively etching further to round the top of the mesa structure.
Claim 3
Dependent Claim
16 words
The process according to claim 1 wherein the mesa structure is formed over the emitting junction.
Claim 4
Dependent Claim
14 words
The process according to claim 1 wherein the rounded mesa structure forms a lens.
Claim 5
Dependent Claim
17 words
The process according to claim 1 wherein a reflective material is deposited around the rounded mesa structure.
References Cited (Backward Citations)
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Cited
US3512027A
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US3703670A
Cited
US3767493A
Cited
US3877052A
Cited
US3954534A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-07-20 | 1985-01-19 | 1985-07-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-07-20 | 1989-01-19 | 1989-07-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-07-20 | 1993-01-19 | 1993-07-21 | $7700.00 | Window Closed / Lapsed |