US4861140A
Expired / Lapsed
US
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Method of making a thin lens
Assignee: Eastman Kodak Co
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Filing: 1988-01-13
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Granted: 1989-08-29
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Expires: 2008-01-13
Abstract
Abstract A method of making a thin lens having a desired high order curvature includes the steps of providing a layer of transparent photoresist; generating a continuous tone exposure pattern for exposing the photoresist such that when exposed and developed the layer of photoresist will possess the desired high order curvature; exposing the layer of photoresist; and developing the layer to produce the thin lens.
Inventors
- 👤 Richard D. Lucitte
- 👤 Paul W. Melnychuck
- 👤 Joseph J. Murray
- 👤 Lawrence A. Ray
- 👤 James R. Sullivan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 11:01
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0005; B; B29; B29D; B29D11/00; Y; Y10; Y10S; Y10S359/00; Y10S359/90
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
73 words
A method of making a thin lens having a desired high order curvature, comprising the steps of: a. providing a layer of transparent photoresist; b. generating a continuous tone exposure pattern for exposing the photoresist such that, when exposed and developed, the layer of photoresist will possess the high order curvature; c. exposing said layer of photoresist with said exposure pattern; and d. developing said layer of photoresist to produce said thin lens.
Claim 2
Independent Claim
73 words
A method of making a thin lens having a desired high order curvature, comprising the steps of: a. providing a layer of transparent photoresist; b. generating a continuous tone exposure pattern for exposing the photoresist such that, when exposed and developed, the layer of photoresist will possess the high order curvature; c. exposing said layer of photoresist with said exposure pattern; and d. developing said layer of photoresist to produce said thin lens.
Claim 3
Independent Claim
86 words
A method of making a continuous phase mask having a desired phase profile, for shaping the spot from a laser beam, comprising the steps of: a. providing a layer of photoresist transparent to the laser light; b. generating a continuous tone exposure pattern for exposing the photoresist such that, when exposed and developed, the layer of photoresist will possess the desired phase profile; c. exposing said layer of photoresist with said exposure pattern; and d. developing said layer of photoresist to produce said continuous phase mask.
Claim 4
Independent Claim
86 words
A method of making a continuous phase mask having a desired phase profile, for shaping the spot from a laser beam, comprising the steps of: a. providing a layer of photoresist transparent to the laser light; b. generating a continuous tone exposure pattern for exposing the photoresist such that, when exposed and developed, the layer of photoresist will possess the desired phase profile; c. exposing said layer of photoresist with said exposure pattern; and d. developing said layer of photoresist to produce said continuous phase mask.
Claim 5
Dependent Claim
13 words
The method claimed in claim 2, wherein that photoresist is positive working photoresist.
Claim 6
Dependent Claim
97 words
The method claimed in claim 3, wherein said step of generating a continuous tone exposure pattern comprises the steps of: a. computing a required thickness profile for the phase mask as follows: t(x,y)=φ(x,y)(λ/n-1); where t(x,y) is the required thickness profile, φ(x,y) is the desired phase profile, λ is the wavelength of the laser light, and n is the refractive index of the photoresist at wavelength λ; b. measuring the thickness versus exposure response of the photoresist; and c. computing the continuous exposure pattern from the required thickness profile, and the thickness versus exposure response of the photoresist.
Claim 7
Dependent Claim
54 words
The method claimed in claim 4, wherein said step of exposing said layer of photoresist with said exposure pattern comprises the steps of: a. generating an intermediate master for producing said exposure pattern by scan exposing a high resolution photographic film; and b. exposing said layer of photoresist by contact printing through said master.
Claim 8
Dependent Claim
62 words
The method claimed in claim 5, wherein said step of generating an intermediate master comprises the steps of: a. producing a look-up table relating exposure of the high resolution photographic film to phase delay response of the developed photoresist; and b. exposing the high resolution photographic film in a film scanner and employing the look-up table to relate desired phase to exposure.
Claim 9
Independent Claim
183 words
A method of making a continuous phase mask having a desired two-dimensional continuous phase profile, for shaping the spot from a laser beam having a wavelength λ, comprising the steps of: a. providing a layer of UV sensitive photoresist transparent to laser light of wavelength λ, said photoresist having a known index of refraction and thickness versus UV exposure response; b. providing a high resolution photographic film, said film having a known exposure versus UV density response; c. cascading the known index of refraction, thickness versus UV exposure response, and exposure versus density response to produce a computer look-up table of integer code values necessary to effect the desired phase response in the final step of fabrication; d. exposiing said high resolution film in a film scanner with said two-dimensional phase profile employing said look-up table to determine exposure values from desired phase values; e. developing the exposed photographic film to produce an intermediate mask; f. contact printing said intermediate mask onto said layer of photoresist with UV exposure; and g. developing the exposed layer of photoresist to produce said continuous phase mask.
Claim 10
Independent Claim
183 words
A method of making a continuous phase mask having a desired two-dimensional continuous phase profile, for shaping the spot from a laser beam having a wavelength λ, comprising the steps of: a. providing a layer of UV sensitive photoresist transparent to laser light of wavelength λ, said photoresist having a known index of refraction and thickness versus UV exposure response; b. providing a high resolution photographic film, said film having a known exposure versus UV density response; c. cascading the known index of refraction, thickness versus UV exposure response, and exposure versus density response to produce a computer look-up table of integer code values necessary to effect the desired phase response in the final step of fabrication; d. exposiing said high resolution film in a film scanner with said two-dimensional phase profile employing said look-up table to determine exposure values from desired phase values; e. developing the exposed photographic film to produce an intermediate mask; f. contact printing said intermediate mask onto said layer of photoresist with UV exposure; and g. developing the exposed layer of photoresist to produce said continuous phase mask.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-08-28 | 1993-02-27 | 1993-08-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-08-28 | 1997-02-27 | 1997-08-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-08-28 | 2001-02-27 | 2001-08-29 | $7700.00 | Window Closed / Lapsed |