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US5308794A Expired / Lapsed US ⏱️ 0.0 years remaining

Aluminum-germanium alloys for VLSI metallization

Assignee: International Business Machines Corp
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Filing: 1993-08-18
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Granted: 1994-05-03
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Expires: 2013-08-18
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Abstract

Abstract An apparatus and method for forming an interconnect through an opening or on an insulation layer with the coefficient of thermal expansion of the interconnect adjusted to reduce the thermal stress between the interconnect and the insulation layer is described incorporating the steps of forming a solid solution of a binary alloy including germanium and aluminum or a ternary alloy including aluminum, germanium and a third element, for example silicon, and forming a precipitate from the solid solution at a reduced temperature with respect to the temperature of forming the solid solution whereby the volume of the precipitate including germanium and the remaining solid solution is larger than the volume of the original solid solution.

Inventors

  • 👤 King-Ning Tu

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 18:35
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/056; H10W20/40; H10W20/41; H10W20/44; H10W20/4403; H10W20/4405; H10W20/4407

Claims Analysis

Total Claims: 28
Claim 1
Independent Claim 146 words
A method for forming an interconnect through an opening in an insulation layer comprising the steps of: depositing aluminum in said opening, depositing germanium in said opening with said aluminum, raising the temperature of said aluminum and said germanium to a first temperature which is below the melting point of aluminum for a first period of time to allow said germanium to diffuse through said aluminum to provide a volume of a first solid solution of germanium in said aluminum of greater than a first atomic percent number, and lowering the temperature of said aluminum and said germanium to a second temperature for a second period of time to allow a portion of said germanium to precipitate out of said first solid solution whereby the total volume of said precipitated germanium and the remaining solid solution is larger than said volume of said first solid solution.
Claim 2
Independent Claim 146 words
A method for forming an interconnect through an opening in an insulation layer comprising the steps of: depositing aluminum in said opening, depositing germanium in said opening with said aluminum, raising the temperature of said aluminum and said germanium to a first temperature which is below the melting point of aluminum for a first period of time to allow said germanium to diffuse through said aluminum to provide a volume of a first solid solution of germanium in said aluminum of greater than a first atomic percent number, and lowering the temperature of said aluminum and said germanium to a second temperature for a second period of time to allow a portion of said germanium to precipitate out of said first solid solution whereby the total volume of said precipitated germanium and the remaining solid solution is larger than said volume of said first solid solution.
Claim 3
Dependent Claim 30 words
The method of claim 1 further including the step of depositing a third element in said opening with said aluminum and germanium prior to said step of raising the temperature.
Claim 4
Dependent Claim 32 words
The method of claim 2 wherein said step of depositing a third element includes the step of selecting an element for depositing from the group consisting of copper, lithium, silicon and zinc.
Claim 5
Dependent Claim 31 words
The method of claim 1 wherein said step of raising the temperature includes the step of raising the temperature to a temperature in the range from 360° C. to 440° C.
Claim 6
Dependent Claim 37 words
The method of claim 1 wherein said step of lowering the temperature includes the step of lowering the temperature to said second temperature wherein said second temperature is in the range from 270° C., to 330° C.
Claim 7
Dependent Claim 18 words
The method of claim 1 wherein said steps of depositing aluminum and depositing germanium are carried out concurrently.
Claim 8
Dependent Claim 22 words
The method of claim 2 wherein said steps of depositing aluminum, depositing germanium and depositing a third element are carried out concurrently.
Claim 9
Dependent Claim 26 words
The method of claim 1 wherein said steps of depositing aluminum and depositing germanium are selected from the group consisting of direct electron-beam deposition and sputtering.
Claim 10
Dependent Claim 60 words
The method of claim 1 wherein said step of raising the temperature includes the step of selecting a first atomic percent number and dissolving said germanium to said selected first atomic percent number whereby the coefficient of thermal expansion of said interconnect is adjusted by said precipitated germanium to reduce the thermal stress between said interconnect and said insulation layer.
Claim 11
Dependent Claim 20 words
The method of claim 1 wherein said step of depositing aluminum includes the step of forming a layer of aluminum.
Claim 12
Dependent Claim 20 words
The method of claim 1 wherein said step of depositing germanium includes the step of forming a layer of germanium.
Claim 13
Dependent Claim 24 words
The method of claim 2 wherein said step of depositing a third element includes the step of forming a layer of said third element.
Claim 14
Dependent Claim 19 words
The method of claim 1 wherein said step of depositing germanium includes the step of depositing germanium and silicon.
Claim 15
Independent Claim 135 words
A method for forming an interconnect in contact with an insulation layer comprising the steps of: depositing aluminum over said insulation, depositing germanium adjacent said aluminum, raising the temperature of said aluminum and germanium to a first temperature which is below the melting point of aluminum for a first period of time to allow said germanium to diffuse through said aluminum to provide a first solid solution of germanium in said aluminum of greater than a first atomic percent number, and lowering the temperature of said aluminum and germanium to a second temperature for a second period of time to allow a portion of said germanium to precipitate out of said solid solution whereby the volume of the precipitated germanium and the remaining solid solution is larger than the volume of said first solid solution.
Claim 16
Independent Claim 135 words
A method for forming an interconnect in contact with an insulation layer comprising the steps of: depositing aluminum over said insulation, depositing germanium adjacent said aluminum, raising the temperature of said aluminum and germanium to a first temperature which is below the melting point of aluminum for a first period of time to allow said germanium to diffuse through said aluminum to provide a first solid solution of germanium in said aluminum of greater than a first atomic percent number, and lowering the temperature of said aluminum and germanium to a second temperature for a second period of time to allow a portion of said germanium to precipitate out of said solid solution whereby the volume of the precipitated germanium and the remaining solid solution is larger than the volume of said first solid solution.
Claim 17
Dependent Claim 27 words
The method of claim 14 further including the step of depositing a third element adjacent said aluminum and germanium prior to the step of raising the temperature.
Claim 18
Dependent Claim 32 words
The method of claim 15 wherein said step of depositing a third element includes the step of selecting an element for depositing from the group consisting of copper, lithium, silicon and zinc.
Claim 19
Dependent Claim 37 words
The method of claim 14 wherein said step of raising the temperature includes the step of raising the temperature to said first temperature wherein said first temperature is in the range from 360° C. to 440° C.
Claim 20
Dependent Claim 37 words
The method of claim 14 wherein said step of lowering the temperature includes the step of lowering the temperature to said second temperature wherein said second temperature is in the range from 270° C. to 330° C.
Claim 21
Dependent Claim 18 words
The method of claim 14 wherein said steps of depositing aluminum and depositing germanium are carried out concurrently.
Claim 22
Dependent Claim 22 words
The method of claim 15 wherein said steps of depositing aluminum, depositing germanium and depositing a third element are carried out concurrently.
Claim 23
Dependent Claim 26 words
The method of claim 14 wherein said steps of depositing aluminum and depositing germanium are selected from the group consisting of direct electron-beam deposition and sputtering.
Claim 24
Dependent Claim 60 words
The method of claim 14 wherein said step of raising the temperature includes the step of selecting a first atomic percent number and dissolving said germanium to said selected first atomic percent number whereby the coefficient of thermal expansion of said interconnect is adjusted by said precipitated germanium to reduce the thermal stress between said interconnect and said insulation layer.
Claim 25
Dependent Claim 20 words
The method of claim 14 wherein said step of depositing aluminum includes the step of forming a layer of aluminum.
Claim 26
Dependent Claim 20 words
The method of claim 14 wherein said step of depositing germanium includes the step of forming a layer of germanium.
Claim 27
Dependent Claim 24 words
The method of claim 15 wherein said step of depositing a third element includes the step of forming a layer of said third element.
Claim 28
Dependent Claim 19 words
The method of claim 14 wherein said step of depositing germanium includes the step of depositing germanium and silicon.

References Cited (Backward Citations)

US4001049A Cited
US4507157A Cited
US4728626A Cited
JPS62293716A Cited
US4994892A Cited
US4989064A Cited
US5001108A Cited
JPH0284729A Cited
US5169803A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-05-02 1997-11-01 1998-05-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-05-02 2001-11-01 2002-05-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-05-02 2005-11-01 2006-05-03 $7700.00 Window Closed / Lapsed

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