US5304456A — Negative photoresist composition

Claim 1

Independent Claim 104 words

A negative photoresist composition comprising an alkali-soluble resin obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR19## wherein R 1 to R 9 are independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator.

Claim 2

Dependent Claim 104 words

A negative photoresist composition comprising an alkali-soluble resin obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR19## wherein R 1 to R 9 are independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator.

Claim 3

Dependent Claim 64 words

The negative photoresist composition according to claim 1, wherein said cross linking agent is a compound of the formula: ##STR20## wherein Z is --NRR' or a substituted or unsubstituted aryl group, R, R' and X 1 to X 4 are independently a hydrogen atom or a group of the formula: --CH 2 OH or --CH 2 OR" in which R" is an alkyl group.

Claim 4

Dependent Claim 40 words

The negative photoresist composition according to claim 1, wherein said photo-acid generator is a compound of the formula: ##STR21## wherein Y 1 and Y 2 are independently a hydrogen atom, an alkyl group, an alkenyl group or an alkoxyl group.

Claim 5

Dependent Claim 119 words

The negative photoresist composition according to claim 1, wherein said photo-acid generator is a compound of the formula: ##STR22## wherein Y 3 , Y 4 and Y 5 are independently a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted piperidino group, or a group of the formula: ##STR23## --OY 8 or --SY 9 in which Y 6 to Y 9 are independently a hydrogen atom, a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group, provided that at least one of Y 3 , Y 4 and Y 5 is a mono-, di- or tri-halogenated methyl group.

Claim 6

Dependent Claim 21 words

The negative photoresist composition according to claim 1, wherein said photo-acid generator is a compound having a trifluoromethanesulfonic acid ester group.

Claim 7

Dependent Claim 40 words

The negative photoresist composition according to claim 5, wherein said photo-acid generator is a compound of the formula: CF.sub.3 SO.sub.2 O--(CH.sub.2).sub.n --Y.sub.10 ( 5) wherein Y 10 is a substituted or unsubstituted aryl group and n is 0 or 1.

Claim 8

Dependent Claim 64 words

The negative photoresist composition according to claim 5, wherein said photo-acid generator is a compound of the formula: ##STR24## wherein Y 11 and Y 12 are independently a hydrogen atom, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkyl group or a substituted or unsubstituted alkoxyl group, Y 13 is a substituted or unsubstituted aryl group, and n' is 1 or 2.

Claim 9

Dependent Claim 39 words

The negative photoresist composition according to claim 5, wherein said photo-acid generator is a compound of the formula: ##STR25## wherein Y 14 is a substituted or unsubstituted alkyl group and Y 15 is a substituted or unsubstituted aryl group.

Claim 10

Dependent Claim 49 words

The negative photoresist composition according to claim 5, wherein said photo-acid generator is a compound of the formula: ##STR26## wherein Y 16 is a hydrogen atom, a substituted or unsubstituted aryl group or a substituted or unsubstituted alkyl group and Y 17 is a substituted or unsubstituted aryl group.

Claim 11

Dependent Claim 13 words

The negative photoresist composition of claim 1, wherein said phenol compound is ##STR27##

Claim 12

Dependent Claim 25 words

The negative photoresist composition of claim 1, wherein said phenol compound is a compound obtained by cyclizing m-isopropenylphenol in the presence of an acid catalyst.

Claim 13

Dependent Claim 107 words

A negative photoresist composition comprising an alkali-soluble resin obtained by condensation of an aldehyde with a phenol compound containing a compound of formula (1) ##STR28## wherein R 1 to R 9 are independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator having a trifluoromethanesulfonic acid ester group.

Claim 14

Dependent Claim 107 words

A negative photoresist composition comprising an alkali-soluble resin obtained by condensation of an aldehyde with a phenol compound containing a compound of formula (1) ##STR28## wherein R 1 to R 9 are independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator having a trifluoromethanesulfonic acid ester group.

Claim 15

Dependent Claim 38 words

The negative photoresist composition of claim 12, which comprises 20 to 90% by weight of said alkali-soluble resin, 5 to 50% by weight of said cross linking agent and 0.1 to 20% by weight of said photo-acid generator.

Claim 16

Dependent Claim 36 words

The negative photoresist composition of claim 13 which comprises 40 to 70% by weight of said alkali-soluble resin, 10 to 30% by weight of said cross linking agent and 1-10% by weight of said photo-acid generator.

Claim 17

Dependent Claim 151 words

A negative photoresist composition comprising an alkali-soluble resin obtained by condensation of an aldehyde with a phenol compound containing a compound of formula (1) ##STR29## wherein R 1 to R 9 are independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator having a trifluoromethanesulfonic acid ester group, further comprising at least one additional alkali-soluble resin selected from the group consisting of phenol-novolac resin; vinylphenol resin; isopropenylphenol resin; copolymers of vinylphenol with styrene, acrylonitrile, methyl methacrylate or acrylate; and these resins or copolymers to which an alkyl group containing silicon is introduced.

Claim 18

Dependent Claim 151 words

A negative photoresist composition comprising an alkali-soluble resin obtained by condensation of an aldehyde with a phenol compound containing a compound of formula (1) ##STR29## wherein R 1 to R 9 are independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator having a trifluoromethanesulfonic acid ester group, further comprising at least one additional alkali-soluble resin selected from the group consisting of phenol-novolac resin; vinylphenol resin; isopropenylphenol resin; copolymers of vinylphenol with styrene, acrylonitrile, methyl methacrylate or acrylate; and these resins or copolymers to which an alkyl group containing silicon is introduced.

Claim 19

Dependent Claim 33 words

The negative photoresist composition of claim 15, wherein said additional alkali-soluble resin has a polystyrene-converted weight average molecular weight, M w , of between 1000 and 50,000 as measured by gel permeation chromatography.

Claim 20

Dependent Claim 21 words

The negative photoresist composition of claim 16 wherein the M w of said additional alkali-soluble resin is between 1500 and 30,000.

Claim 21

Dependent Claim 178 words

A negative photoresist composition comprising an alkali-soluble resin obtained by condensation of an aldehyde with a phenol compound containing a compound of formula (1) ##STR30## wherein R 1 to R 9 are independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator selected from the group consisting of: CF.sub.3 SO.sub.2 O--(CH.sub.2).sub.n --Y.sup.10 ( 5) ##STR31## wherein Y.sup.11 and Y.sup.12 are independently a hydrogen atom, an aryl group, an alkyl group or an alkoxyl group, Y.sup.13 is an aryl group, and n' is 1 or 2, ##STR32## wherein Y.sup.14 is an alkyl group and Y.sup.15 is an aryl group, and ##STR33## wherein Y.sup.16 is a hydrogen atom, and aryl group or an alkyl group and Y.sup.17 is an aryl group.

Claim 22

Dependent Claim 178 words

A negative photoresist composition comprising an alkali-soluble resin obtained by condensation of an aldehyde with a phenol compound containing a compound of formula (1) ##STR30## wherein R 1 to R 9 are independently a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator selected from the group consisting of: CF.sub.3 SO.sub.2 O--(CH.sub.2).sub.n --Y.sup.10 ( 5) ##STR31## wherein Y.sup.11 and Y.sup.12 are independently a hydrogen atom, an aryl group, an alkyl group or an alkoxyl group, Y.sup.13 is an aryl group, and n' is 1 or 2, ##STR32## wherein Y.sup.14 is an alkyl group and Y.sup.15 is an aryl group, and ##STR33## wherein Y.sup.16 is a hydrogen atom, and aryl group or an alkyl group and Y.sup.17 is an aryl group.

Claim 23

Dependent Claim 132 words

A negative photoresist composition comprising an alkali-soluble resin obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR34## wherein R 1 to R 9 are independently a hydrogen atom, an alkyl group which may be substituted by a halogen atom or a lower alkylcarbonyl group, an alkenyl group which may be substituted by a halogen atom or an aryl group, an alkylcarbonyl group which may be substituted by a halogen atom or an aryl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator.

Claim 24

Dependent Claim 132 words

A negative photoresist composition comprising an alkali-soluble resin obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR34## wherein R 1 to R 9 are independently a hydrogen atom, an alkyl group which may be substituted by a halogen atom or a lower alkylcarbonyl group, an alkenyl group which may be substituted by a halogen atom or an aryl group, an alkylcarbonyl group which may be substituted by a halogen atom or an aryl group, a halogen atom or a hydroxyl group, provided that at least one of R 1 to R 9 is a hydroxyl group and, at the ortho- or para-position to said hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator.

Claim 25

Dependent Claim 79 words

The negative photoresist composition according to claim 19, wherein said cross linking agent is a compound of the formula: ##STR35## wherein Z is --NRR' or an aryl group which may be substituted by an alkyl group, an alkoxy group, a nitro group or a halogen atom, R, R' and X 1 to X 4 are independently a hydrogen atom or a group of the formula: --CH 2 OH or --CH 2 OR" in which R" is an alkyl group.

Claim 26

Dependent Claim 179 words

The negative photoresist composition according to claim 19, wherein said photo-acid generator is a compound of the formula: ##STR36## wherein Y 3 , Y 4 and Y 5 are independently an alkyl group which may be substituted by a halogen atom, an aryl group which may be substituted by a C 1 -C 7 alkyl group, a C 1 -C 7 alkoxy group, a halogen atom, a cyano group or a C 1 -C 7 dialkylamino group, an alkenyl group which may be substituted by an aryl group or a heterocyclic group, wherein said aryl or heterocyclic groups may be further substituted by a halogen atom, a C 1 -C 7 alkoxy group, an acetyl group or a nitro group, an aralkyl group, a piperidino group, or a group of the formula: ##STR37## --OY 8 or --SY 9 in which Y 6 to Y 9 are independently a hydrogen atom, an alkyl group or an aryl group, provided that at least one of Y 3 , Y 4 and Y 5 is a mono-, di- or tri-halogenated methyl group.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1997-04-18	1997-10-18	1998-04-19	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2001-04-18	2001-10-18	2002-04-19	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2005-04-18	2005-10-18	2006-04-19	$7700.00	Window Closed / Lapsed

Negative photoresist composition

Abstract

Inventors

Bibliographic Details

Claims Analysis

References Cited (Backward Citations)

USPTO Annuity & Maintenance Windows

Assigned Categories & Tags

Assign Category Tag