Process for growing GaAs monocrystal film
Abstract
Abstract A GaAs monocrystal film was grown by use of a process which comprises introducing a gaseous compound containing a component element desired to be grown into a vacuum tank, and submitting the compound to reaction on a base to thereby grow a semiconductor crystal each one molecular layer. Triethylgallium (TEG) and arsine (AsH 3 ) are used as the gaseous compound. One gas is introduced into the vaccum tank and then discharged after the passage of a predetermined time, and the other gas is introduced thereinto and then discharged after the passage of a predetermined time whereby a crystal for one molecular layer grows. By use of TEG as a gallium source, reaction progresses even when a temperature of the base is below 300° C., and a GaAs monocrystal film which is extremely less in lattice failure and impurities was obtained.
Inventors
- 👤 Junichi Nishizawa
- 👤 Hitoshi Abe
Bibliographic Details
Claims Analysis
Total Claims: 6References Cited (Backward Citations)
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