Photoresist article having a portable, conformable, built-on mask

Claim 1

A method of producing a positive imaged photoresist article which comprises coating a substrate with a first light sensitive layer comprising a photosensitive o-quinone diazide in sufficient amount to render said layer light sensitive and to provide image differentiation upon imagewise exposure and development of the layer, and at least one water insoluble, aqueous alkaline soluble resin in admixture therewith in sufficient amount to bind said layer into a uniform film; and coating a second light sensitive layer on said first light sensitive layer, said second light sensitive layer comprising a water soluble, photobleachable diazonium salt and a coupled for said diazonium salt, said diazonium salt and coupler being present in sufficient amount to provide bleached image differentiation upon imagewise exposure to actinic radiation, and to form a u.v. absorbing azo dye in the imagewise nonexposed area upon contact with sufficient alkaline vapor; and a water soluble, film forming, sulfonic acid containing polymeric resin in admixture therewith, in sufficient amount to bind said second light sensitive layer into a uniform film; and imagewise exposing said article to sufficient actinic radiation to bleach portions of said second light sensitive layer at the exposed locations thereby rendering such bleached portions transmissive to said actinic radiation; and contacting said article with sufficient alkaline vapor to form a u.v. absorbing azo dye in the imagewise nonexposed portions; then overall exposing said first light sensitive layer through the thusly treated second light sensitive layer to sufficient actinic radiation in a wavelength range where the axo dye absorbs and blocks said radiation out to imagewise expose said first light sensitive layer to provide image and non-image areas; and thereafter removing said entire second light sensitive layer; and developing said first light sensitive layer with an aqueous alkaline solution to thereby remove the exposed non-image areas of the first light sensitive layer.

Claim 2

A method of producing a positive imaged photoresist article which comprises coating a substrate with a first light sensitive layer comprising a photosensitive o-quinone diazide in sufficient amount to render said layer light sensitive and to provide image differentiation upon imagewise exposure and development of the layer, and at least one water insoluble, aqueous alkaline soluble resin in admixture therewith in sufficient amount to bind said layer into a uniform film; and coating a second light sensitive layer on said first light sensitive layer, said second light sensitive layer comprising a water soluble, photobleachable diazonium salt and a coupled for said diazonium salt, said diazonium salt and coupler being present in sufficient amount to provide bleached image differentiation upon imagewise exposure to actinic radiation, and to form a u.v. absorbing azo dye in the imagewise nonexposed area upon contact with sufficient alkaline vapor; and a water soluble, film forming, sulfonic acid containing polymeric resin in admixture therewith, in sufficient amount to bind said second light sensitive layer into a uniform film; and imagewise exposing said article to sufficient actinic radiation to bleach portions of said second light sensitive layer at the exposed locations thereby rendering such bleached portions transmissive to said actinic radiation; and contacting said article with sufficient alkaline vapor to form a u.v. absorbing azo dye in the imagewise nonexposed portions; then overall exposing said first light sensitive layer through the thusly treated second light sensitive layer to sufficient actinic radiation in a wavelength range where the axo dye absorbs and blocks said radiation out to imagewise expose said first light sensitive layer to provide image and non-image areas; and thereafter removing said entire second light sensitive layer; and developing said first light sensitive layer with an aqueous alkaline solution to thereby remove the exposed non-image areas of the first light sensitive layer.