Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography

Claim 1

A composition for forming an anti-reflective layer for DUV microlithographic processes, comprising a polymer dissolved in a suitable solvent, said polymer being opaque at deep ultraviolet wavelengths and having a functional repeat unit selected from the group consisting of: ##STR17## and combinations thereof, wherein R a is selected from the group consisting of: ##STR18## wherein R 1 =R 4 ; R 2 =R 3 ; R 1 , R 2 , R 3 , R 4 , and R 5 are selected from the group consisting of hydrogen and methyl; and R 6 is selected from the group consisting of hydrogen, methyl and phenyl; ##STR19## wherein R 1 =R 2 =R 3 =R 4 and are selected from the group consisting of hydrogen and methyl; ##STR20## wherein R 1 =R 2 =R 3 =R 4 and are selected from the group consisting of hydrogen and methyl; ##STR21## wherein X is selected from the group consisting of: ##STR22## wherein R 1 =R 2 =R 3 =CH 3 and R 4 =H, or R 1 =R 2 =R 4 =CH 3 and R 3 =H; and (G) combinations thereof; wherein R b is selected from the group consisting of: ##STR23## wherein R 1 is selected from the group consisting of Cl, C.tbd.N, CH 3 , H, OCH 3 , and COOR 2 , wherein R 2 is --CH 3 or --CH 2 CH 3 ; ##STR24## wherein R 1 is selected from H and C.tbd.N; ##STR25## wherein R 1 =R 2 =R 3 =R 4 =H or CH 3 ; ##STR26## wherein R 1 =R 2 and are selected from consisting of H, CH 3 , OCH 3 , and R 3 =R 4 and are selected from consisting of H and CH 3 ; ##STR27## wherein R 1 =R 2 =R 3 =R 4 =H or CH 3 ; and (N) combinations thereof; wherein said suitable solvent is selected from the group consisting of cyclohexanone, cyclopentanone, 2-methoxyethyl ether, anisole, ethyl lactate, acetophenone, ethylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate (EGMEA), propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate (PGMEA), gamma butrylolactone, tetrahydrofurfuryl alcohol, N-methylpyrrolidone, N,N-dimethylacetamide, 1,1,3,3-tetramethylurea, 1,2-dimethyl-2-imidazolidinone, and mixtures thereof.