Patent US5225892A successfully refreshed from Google Patents.
US5225892A
Expired / Lapsed
US
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Positional deviation detecting method
Assignee: Canon Inc
•
Filing: 1992-09-04
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Granted: 1993-07-06
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Expires: 2012-09-04
Abstract
Abstract Disclosed is a method of detecting relative positional deviation of a first object with a first grating pattern having an optical power and a second object with a second grating mark having an optical power. Light diffracted by both the first and second grating marks forms a light pattern on a predetermined plane; wherein different diffraction beams of the light diffracted by both the first and second grating marks are displaceable along the predetermined plane in accordance with the relative positional deviation of the first and second objects, in the same direction and by substantially the same quantity; and the relative positional deviation of the first and second objects is detected on the basis of the position of the light pattern on the predetermined plane.
Inventors
- 👤 Masakazu Matsugu
- 👤 Kenji Saito
- 👤 Jun Hattori
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 06:59
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7073; G03F9/7076
Claims Analysis
Total Claims: 86
Claim 1
Independent Claim
165 words
A method of detecting relative positional deviation of first and second objects, wherein the first object is provided with a first grating mark having an optical power while the second object is provided with a second grating mark having an optical power, said method comprising the steps of: illuminating the first and second objects with light such that light diffracted by both the first and second grating marks forms a light pattern on a predetermined plane; superposing different diffraction beams of the light diffracted by both the first and second grating marks one upon another with their centers substantially coinciding with each other to form the light pattern; displacing the diffraction beams along the predetermined plane in accordance with the relative positional deviation of the first and second objects, in the same direction and by substantially the same quantity; and detecting the relative positional deviation of the first and second objects on the basis of the position of the light pattern on the predetermined plane.
Claim 2
Independent Claim
165 words
A method of detecting relative positional deviation of first and second objects, wherein the first object is provided with a first grating mark having an optical power while the second object is provided with a second grating mark having an optical power, said method comprising the steps of: illuminating the first and second objects with light such that light diffracted by both the first and second grating marks forms a light pattern on a predetermined plane; superposing different diffraction beams of the light diffracted by both the first and second grating marks one upon another with their centers substantially coinciding with each other to form the light pattern; displacing the diffraction beams along the predetermined plane in accordance with the relative positional deviation of the first and second objects, in the same direction and by substantially the same quantity; and detecting the relative positional deviation of the first and second objects on the basis of the position of the light pattern on the predetermined plane.
Claim 3
Dependent Claim
42 words
A method according to claim 1, further comprising disposing the first and second objects substantially overlapped and projecting a radiation beam to the first and second objects, from above the first object, and wherein the predetermined plane is above the first object.
Claim 4
Dependent Claim
74 words
A method according to claim 2, further comprising producing the different diffraction beams as negative first order diffraction light produced as a result of reflective diffraction by the second grating mark of positive first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction by the first grating mark of negative first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 5
Dependent Claim
74 words
A method according to claim 2, further comprising producing the different diffraction beams as positive first order diffraction light produced as a result of reflective diffraction by the second grating mark of negative first order diffraction light from the first grating mark, and negative first order diffraction light produced as a result of diffraction by the first grating mark of positive first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 6
Independent Claim
40 words
A method according to any one of claims 2-4, further comprising producing the different diffraction beams by diffracting a light beam only once by the first grating mark and diffracting a light beam only once by the second grating mark.
Claim 7
Dependent Claim
36 words
A method according to claim 2, further comprising producing the different diffraction beams by diffracting a light beam twice by the first grating mark and diffracting a light beam only once by the second grating mark.
Claim 8
Dependent Claim
35 words
A method according to claim 1, wherein the positional deviation detected in said detecting step is determined on the basis of the position of a gravity center of an intensity distribution of the light pattern.
Claim 9
Dependent Claim
229 words
An exposure apparatus usable with a mask provided with a circuit pattern and a first grating mark having an optical power and a wafer provided with a second grating mark having an optical power, for exposing the wafer to the pattern of the mask, said apparatus comprising: first holding means for holding the mask; second holding means for holding the wafer; driving means means for relatively moving said first and second holding means; an alignment system cooperable with the first and second grating marks of the mask and the wafer and including a light source and a detector, wherein light from said light source is diffracted by both the first and second grating marks and different diffraction beams of the light diffracted by both the first and second grating marks are superposed one upon another with their centers substantially coinciding with each other, to form a light pattern upon said detector, and wherein the diffraction beams are displaceable on said detector in accordance with a relative positional deviation of the mask and the wafer, in the same direction and by substantially the same quantity; control means for controlling said driving means on the basis of a position of the light pattern on said detector, to adjust the relative position of the mask and the wafer; and exposing means for exposing the wafer to the circuit patter of the mask.
Claim 10
Dependent Claim
229 words
An exposure apparatus usable with a mask provided with a circuit pattern and a first grating mark having an optical power and a wafer provided with a second grating mark having an optical power, for exposing the wafer to the pattern of the mask, said apparatus comprising: first holding means for holding the mask; second holding means for holding the wafer; driving means means for relatively moving said first and second holding means; an alignment system cooperable with the first and second grating marks of the mask and the wafer and including a light source and a detector, wherein light from said light source is diffracted by both the first and second grating marks and different diffraction beams of the light diffracted by both the first and second grating marks are superposed one upon another with their centers substantially coinciding with each other, to form a light pattern upon said detector, and wherein the diffraction beams are displaceable on said detector in accordance with a relative positional deviation of the mask and the wafer, in the same direction and by substantially the same quantity; control means for controlling said driving means on the basis of a position of the light pattern on said detector, to adjust the relative position of the mask and the wafer; and exposing means for exposing the wafer to the circuit patter of the mask.
Claim 11
Dependent Claim
67 words
An apparatus according to claim 8, wherein said alignment system comprises an optical system for transforming the light from said light source into a substantially parallel light beam and for directing the light beam to the mask and the wafer, and wherein, with cooperation of the first and second grating marks with the directed light beam, the different diffraction beams are produced and directed to said detector.
Claim 12
Dependent Claim
72 words
An apparatus according to claim 9 wherein the different diffraction beams comprise negative first order diffraction light produced as a result of reflective diffraction by the second grating mark of positive first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction by the first grating mark of negative first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 13
Dependent Claim
72 words
An apparatus according to claim 9, wherein the different diffraction beams comprise positive first order diffraction light produced as a result of reflective diffraction by the second grating mark of negative first order diffraction light from the first grating mark, and negative first order diffraction light produced as a result of diffraction by the first grating mark of positive first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 14
Independent Claim
47 words
An apparatus according to any one of claims 8-11, wherein said control means detects the position of a gravity center of the light pattern on the basis of a signal from said detector, and determines the positional deviation on the basis of the detected gravity center position.
Claim 15
Independent Claim
189 words
A method of manufacturing semiconductor devices by transferring a circuit pattern of a mask to a wafer and by processing the wafer, wherein the mask is provided with a first grating mark having an optical power while the wafer is provided with a second grating mark having an optical power, said method comprising the steps of: illuminating the mask and wafer with light such that light diffracted by both the first and second grating marks forms a light pattern on a predetermined plane; superposing different diffraction beams of the light diffracted by both the first and second grating marks one upon another with their centers substantially coinciding with each other to form the light pattern; displacing the diffraction beams along the predetermined plane in accordance with a relative positional deviation of the mask and the wafer, in the same direction and by substantially the same quantity; detecting the relative positional deviation of the mask and the wafer on the basis of the position of the light pattern on the predetermined plane; and exposing the wafer to the circuit pattern of the mask with the relative positional deviation being corrected.
Claim 16
Independent Claim
189 words
A method of manufacturing semiconductor devices by transferring a circuit pattern of a mask to a wafer and by processing the wafer, wherein the mask is provided with a first grating mark having an optical power while the wafer is provided with a second grating mark having an optical power, said method comprising the steps of: illuminating the mask and wafer with light such that light diffracted by both the first and second grating marks forms a light pattern on a predetermined plane; superposing different diffraction beams of the light diffracted by both the first and second grating marks one upon another with their centers substantially coinciding with each other to form the light pattern; displacing the diffraction beams along the predetermined plane in accordance with a relative positional deviation of the mask and the wafer, in the same direction and by substantially the same quantity; detecting the relative positional deviation of the mask and the wafer on the basis of the position of the light pattern on the predetermined plane; and exposing the wafer to the circuit pattern of the mask with the relative positional deviation being corrected.
Claim 17
Dependent Claim
74 words
A method according to claim 13, further comprising producing the different diffraction beams as negative first order diffraction light produced as a result of reflective diffraction by the second grating mark of positive first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction by the first grating mark of negative first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 18
Dependent Claim
74 words
A method according to claim 13, further comprising producing the different diffraction beams as positive first order diffraction light produced as a result of reflective diffraction by the second grating mark of negative first order diffraction light from the first grating mark, and negative first order diffraction light produced as a result of diffraction by the first grating mark of positive first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 19
Independent Claim
38 words
A method according to any one of claims 13-15, wherein the positional deviation detected in said detecting step is determined on the basis of the position of a gravity center of an intensity distribution of the light pattern.
Claim 20
Dependent Claim
16 words
A method according to claim 13, wherein said exposing step comprises exposing the wafer with X-rays.
Claim 21
Independent Claim
136 words
A method of detecting relative position deviation of a first object with a first grating pattern having an optical power and a second object with a second grating mark having an optical power, said method comprising the steps of: illuminating the first and second objects with light such that light diffracted by both the first and second grating marks forms a light pattern on a predetermined plane; displacing different diffraction beams of the light diffracted by both the first and second grating marks along the predetermined plane in accordance with the relative positional deviation of the first and second objects, in the same direction and by substantially the same quantity; and detecting the relative positional deviation of the first and second objects on the basis of the position of the light pattern on the predetermined plane.
Claim 22
Independent Claim
136 words
A method of detecting relative position deviation of a first object with a first grating pattern having an optical power and a second object with a second grating mark having an optical power, said method comprising the steps of: illuminating the first and second objects with light such that light diffracted by both the first and second grating marks forms a light pattern on a predetermined plane; displacing different diffraction beams of the light diffracted by both the first and second grating marks along the predetermined plane in accordance with the relative positional deviation of the first and second objects, in the same direction and by substantially the same quantity; and detecting the relative positional deviation of the first and second objects on the basis of the position of the light pattern on the predetermined plane.
Claim 23
Dependent Claim
45 words
A method according to claim 18, wherein the first and second objects are disposed to be substantially overlapped and the predetermined plane is above the first object, and further comprising projecting a radiation beam to the first and second objects from above the first object.
Claim 24
Dependent Claim
72 words
A method according to claim 19, wherein the different diffraction beams comprise negative first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of positive first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction, by the first grating mark, of negative first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 25
Dependent Claim
72 words
A method according to claim 19, wherein the different diffraction beams comprise positive first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of negative first order diffraction light from the first grating mark, and negative first order diffraction light produced as a result of diffraction, by the first grating mark, of positive first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 26
Independent Claim
40 words
An apparatus according to any one of claims 19 through 21, wherein the different diffraction beams comprise a light beam diffracted only once by the first grating mark and a light beam diffracted only once by the second grating mark.
Claim 27
Dependent Claim
30 words
A method according to claim 18, further comprising determining the positional deviation on the basis of the position of a gravity center of an intensity distribution of the light pattern.
Claim 28
Independent Claim
149 words
A method of detecting relative positional deviation of a first object with a first grating mark having an optical power and a second object with a second grating mark having an optical power, said method comprising the steps of: illuminating the first and second objects with light such that light diffracted by both the first and second grating marks forms a light pattern on a predetermined plane; superposing different diffraction beams of the light diffracted by both the first and second grating marks one upon another to form the light pattern which is displaceable along the predetermined plane in accordance with the relative positional deviation of the first and second objects while holding centers of the diffraction beams substantially coincident with each other; and detecting the relative positional deviation of the first and second objects on the basis of the position of the light pattern on the predetermined plane.
Claim 29
Independent Claim
149 words
A method of detecting relative positional deviation of a first object with a first grating mark having an optical power and a second object with a second grating mark having an optical power, said method comprising the steps of: illuminating the first and second objects with light such that light diffracted by both the first and second grating marks forms a light pattern on a predetermined plane; superposing different diffraction beams of the light diffracted by both the first and second grating marks one upon another to form the light pattern which is displaceable along the predetermined plane in accordance with the relative positional deviation of the first and second objects while holding centers of the diffraction beams substantially coincident with each other; and detecting the relative positional deviation of the first and second objects on the basis of the position of the light pattern on the predetermined plane.
Claim 30
Dependent Claim
34 words
A method according to claim 24, wherein the different diffraction beams comprise a light beam diffracted twice by the first grating mark and a light beam diffracted only once by the second grating mark.
Claim 31
Dependent Claim
45 words
A method according to claim 24, wherein the first and second objects are disposed to be substantially overlapped and the predetermined plane is above the first object, and further comprising projecting a radiation beam to the first and second objects from above the first object.
Claim 32
Dependent Claim
72 words
A method according to claim 26, wherein the different diffraction beams comprise negative first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of positive first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction, by the first grating mark, of negative first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 33
Dependent Claim
72 words
A method according to claim 26, wherein the different diffraction beams comprise positive first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of negative first order diffraction light from the first grating mark, and negative first order diffraction light produced as a result of diffraction, by the first grating mark, of positive first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 34
Dependent Claim
34 words
A method according to claim 26, wherein the different diffraction beams comprise a light beam diffracted twice by the first grating mark and a light beam diffracted only once by the second grating mark.
Claim 35
Dependent Claim
30 words
A method according to claim 24, further comprising determining the positional deviation on the basis of the position of a gravity center of an intensity distribution of the light pattern.
Claim 36
Dependent Claim
223 words
An exposure apparatus usable with a mask provided with a circuit pattern and a first grating mark having an optical power and a wafer provided with a second grating mark having an optical power, for exposing the wafer to the pattern of the mask, said apparatus comprising: first holding means for holding the mask; second holding means for relatively moving said first and second holding means; driving means for relatively moving said first and second holding means; an alignment system, cooperating with the first and second grating marks of the mask and the wafer, comprising a light source and a detector, wherein light from said light source is diffracted by both the first and second grating marks and different diffraction beams of the light diffracted by both the first and second grating marks are directed to said detector to form a light pattern upon said detector, and the diffraction beams are displaceable on said detector in accordance with a relative positional deviation of the mask and the wafer, in the same direction and by substantially the same quantity; control means for controlling said driving means on the basis of a position of the light pattern on said detector, to adjust the relative position of the mask and the wafer; and exposing means for exposing the wafer to the circuit pattern of the mask.
Claim 37
Dependent Claim
223 words
An exposure apparatus usable with a mask provided with a circuit pattern and a first grating mark having an optical power and a wafer provided with a second grating mark having an optical power, for exposing the wafer to the pattern of the mask, said apparatus comprising: first holding means for holding the mask; second holding means for relatively moving said first and second holding means; driving means for relatively moving said first and second holding means; an alignment system, cooperating with the first and second grating marks of the mask and the wafer, comprising a light source and a detector, wherein light from said light source is diffracted by both the first and second grating marks and different diffraction beams of the light diffracted by both the first and second grating marks are directed to said detector to form a light pattern upon said detector, and the diffraction beams are displaceable on said detector in accordance with a relative positional deviation of the mask and the wafer, in the same direction and by substantially the same quantity; control means for controlling said driving means on the basis of a position of the light pattern on said detector, to adjust the relative position of the mask and the wafer; and exposing means for exposing the wafer to the circuit pattern of the mask.
Claim 38
Dependent Claim
65 words
An apparatus according to claim 31, wherein said alignment system comprises an optical system for transforming the light from said light source into a substantially parallel light beam and for directing the light beam to the mask and the wafer, and wherein the different diffraction beams are produced and directed to said detector by the directed light beam illuminating the first and second grating marks.
Claim 39
Dependent Claim
72 words
An apparatus according to claim 32, wherein the different diffraction beams comprise negative first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of positive first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction, by the first grating mark, of negative first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 40
Dependent Claim
72 words
An apparatus according to claim 32, wherein the different diffraction beams comprise positive first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of negative first order diffraction light from the first grating mark, and negative first order diffraction light produced as a result of diffraction, by the first grating mark, of positive first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 41
Independent Claim
53 words
An apparatus according to any one of claims 31 through 34, wherein said control means comprises means for detecting the position of a gravity center of the light pattern on the basis of a signal from said detector, and for determining the positional deviation on the basis of the detected gravity center position.
Claim 42
Independent Claim
173 words
A method of manufacturing semiconductor devices by transferring a circuit pattern of a mask to a wafer and by processing the wafer, wherein (i) the mask is provided with a first grating mark having an optical power while the wafer is provided with a second grating mark having an optical power, (ii) light diffracted by both the first and second grating marks forms a light pattern on a plane when illuminating the first and second objects, (iii) different diffraction beams of the light diffracted by both the first and second grating marks are displaceable along the plane in accordance with a relative positional deviation of the mask and the wafer, in the same direction and by substantially the same quantity, said method comprising the steps of: generating the light pattern by the illumination; detecting the relative positional deviation of the mask and the wafer on the basis of the position of the light pattern on the plane; correcting the relative positional deviation; and exposing the wafer to the circuit pattern of the mask.
Claim 43
Independent Claim
173 words
A method of manufacturing semiconductor devices by transferring a circuit pattern of a mask to a wafer and by processing the wafer, wherein (i) the mask is provided with a first grating mark having an optical power while the wafer is provided with a second grating mark having an optical power, (ii) light diffracted by both the first and second grating marks forms a light pattern on a plane when illuminating the first and second objects, (iii) different diffraction beams of the light diffracted by both the first and second grating marks are displaceable along the plane in accordance with a relative positional deviation of the mask and the wafer, in the same direction and by substantially the same quantity, said method comprising the steps of: generating the light pattern by the illumination; detecting the relative positional deviation of the mask and the wafer on the basis of the position of the light pattern on the plane; correcting the relative positional deviation; and exposing the wafer to the circuit pattern of the mask.
Claim 44
Dependent Claim
72 words
A method according to claim 36, wherein the different diffraction beams comprise negative first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of positive first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction, by the first grating mark, of negative first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 45
Dependent Claim
72 words
A method according to claim 36, wherein the different diffraction beams comprise positive first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of negative first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction, by the first grating mark, of positive first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 46
Independent Claim
35 words
A method according to any one of claims 36 through 38, further comprises determining the positional deviation on the basis of the position of a gravity center of an intensity distribution of the light pattern.
Claim 47
Dependent Claim
17 words
A method according to claim 31, further comprising effecting the exposure of the wafer by using X-rays.
Claim 48
Independent Claim
43 words
A method according to any one of claims 36 through 38, 40 and 26, wherein the different diffraction beams comprise a light beam diffracted only once by the first grating mark and a light beam diffracted only once by the second grating mark.
Claim 49
Dependent Claim
35 words
A method according to claim 39, wherein the different diffraction beams comprise a light beam diffracted only once by the first grating mark and a light beam diffracted only once by the second grating mark.
Claim 50
Dependent Claim
221 words
An exposure apparatus usable with a mask provided with a circuit pattern and a first grating mark having an optical power and a wafer provided with a second grating mark having an optical power, for exposing the wafer to the pattern of the mask, said apparatus comprising: first holding means for holding the mask; second holding means for holding the wafer; driving means for relatively moving said first and second holding means; an alignment system, cooperating with the first and second grating marks of the mask and the wafer, comprising a light source and a detector, wherein light from said light source is diffracted by both the first and second grating marks and different diffraction beams of the light diffracted by both the first and second grating marks are superposed one upon another to form a light pattern upon said detector, and the diffraction beams are displaceable on said detector in accordance with a relative positional deviation of the mask and the wafer while centers of the diffraction beams are held substantially coincident with each other; control means for controlling said driving means on the basis of a position of the light pattern on said detector, to adjust the relative position of the mask and the wafer; and exposing mens for exposing the wafer to the circuit pattern of the mask.
Claim 51
Dependent Claim
221 words
An exposure apparatus usable with a mask provided with a circuit pattern and a first grating mark having an optical power and a wafer provided with a second grating mark having an optical power, for exposing the wafer to the pattern of the mask, said apparatus comprising: first holding means for holding the mask; second holding means for holding the wafer; driving means for relatively moving said first and second holding means; an alignment system, cooperating with the first and second grating marks of the mask and the wafer, comprising a light source and a detector, wherein light from said light source is diffracted by both the first and second grating marks and different diffraction beams of the light diffracted by both the first and second grating marks are superposed one upon another to form a light pattern upon said detector, and the diffraction beams are displaceable on said detector in accordance with a relative positional deviation of the mask and the wafer while centers of the diffraction beams are held substantially coincident with each other; control means for controlling said driving means on the basis of a position of the light pattern on said detector, to adjust the relative position of the mask and the wafer; and exposing mens for exposing the wafer to the circuit pattern of the mask.
Claim 52
Dependent Claim
79 words
An apparatus according to claim 43, wherein said alignment system comprises an optical system for transforming the light from said light source into a substantially parallel light beam and for directing the light beam to the mask and the wafer, and wherein with cooperation of the first and second grating marks with the directed light beam, the different diffraction beams are produced and directed to said detector by the directed light beam illuminating the first and second grating marks.
Claim 53
Dependent Claim
72 words
An apparatus according to claim 44, wherein the different diffraction beams comprise negative first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of positive first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction, by the first grating mark, of negative first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 54
Dependent Claim
61 words
An apparatus according to claim 45, wherein the different diffraction beams comprise positive first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of negative first order diffraction light produced as a result of diffraction, by the first grating mark, of positive first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 55
Independent Claim
53 words
An apparatus according to any one of claims 43 through 46, wherein said control means comprises means for detecting the position of a gravity center of the light pattern on the basis of a signal from said detector, and for determining the positional deviation on the basis of the detected gravity center position.
Claim 56
Independent Claim
187 words
A method of manufacturing semiconductor devices by transferring a circuit pattern of a mask to a wafer and by processing the wafer, wherein (i) the mask is provided with a first grating mark having an optical power while the wafer is provided with a second grating mark having an optical power, (ii) light diffracted by both the first and second grating marks forms a light pattern on a plane when illuminating the first and second objects, (iii) different diffraction beams of the light diffracted by both the first and second grating marks are superposed one upon another to form the light pattern which is displaceable along the plane in accordance with a relative positional deviation of the mask and the wafer, while centers of the diffraction beams are held substantially coincident with each other, said method comprising the steps of: generating the light pattern by the illumination; detecting the relative positional deviation of the mask and the wafer on the basis of the position of the light pattern on the plane; correcting the relative positional deviation; and exposing the wafer to the circuit pattern of the mask.
Claim 57
Independent Claim
187 words
A method of manufacturing semiconductor devices by transferring a circuit pattern of a mask to a wafer and by processing the wafer, wherein (i) the mask is provided with a first grating mark having an optical power while the wafer is provided with a second grating mark having an optical power, (ii) light diffracted by both the first and second grating marks forms a light pattern on a plane when illuminating the first and second objects, (iii) different diffraction beams of the light diffracted by both the first and second grating marks are superposed one upon another to form the light pattern which is displaceable along the plane in accordance with a relative positional deviation of the mask and the wafer, while centers of the diffraction beams are held substantially coincident with each other, said method comprising the steps of: generating the light pattern by the illumination; detecting the relative positional deviation of the mask and the wafer on the basis of the position of the light pattern on the plane; correcting the relative positional deviation; and exposing the wafer to the circuit pattern of the mask.
Claim 58
Dependent Claim
72 words
A method according to claim 46, wherein the different diffraction beams comprise negative first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of positive first order diffraction light from the first grating mark, and positive first order diffraction light produced as a result of diffraction, by the first grating mark, of negative first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 59
Dependent Claim
72 words
A method according to claim 48, wherein the different diffraction beams comprise positive first order diffraction light produced as a result of reflective diffraction, by the second grating mark, of negative first order diffraction light from the first grating mark, and negative first order diffraction light produced as a result of diffraction, by the first grating mark, of positive first order diffraction light resulting from reflective diffraction by the second grating mark.
Claim 60
Dependent Claim
35 words
A method according to any one of claim 48 through 50, further comprising determining the positional deviation on the basis of the position of a gravity center of an intensity distribution of the light pattern.
Claim 61
Dependent Claim
17 words
A method according to claim 50, further comprising effecting the exposure of the wafer by using X-rays.
Claim 62
Independent Claim
157 words
A method of detecting a positional deviation between first and second objects, said method comprising the steps of: providing the first object with a first grating mark and providing the second object with a second grating mark, wherein the first and second grating marks are so arranged that the positions, upon a predetermined plane, of first and second diffraction beams, of light diffracted by both the first and second grating marks in response to illumination of the first and second objects, are displaceable in the same direction on the plane and by substantially the same amount in accordance with the positional deviation of the first and second objects; illuminating the first and second objects to project the first and second diffraction beams on the plane to form a beam pattern on the plane; and determining the positional deviation of the first and second objects on the basis of the position of the beam pattern on the plane.
Claim 63
Independent Claim
157 words
A method of detecting a positional deviation between first and second objects, said method comprising the steps of: providing the first object with a first grating mark and providing the second object with a second grating mark, wherein the first and second grating marks are so arranged that the positions, upon a predetermined plane, of first and second diffraction beams, of light diffracted by both the first and second grating marks in response to illumination of the first and second objects, are displaceable in the same direction on the plane and by substantially the same amount in accordance with the positional deviation of the first and second objects; illuminating the first and second objects to project the first and second diffraction beams on the plane to form a beam pattern on the plane; and determining the positional deviation of the first and second objects on the basis of the position of the beam pattern on the plane.
Claim 64
Dependent Claim
33 words
A method according to claim 53, wherein the first and second grating marks are so arranged that the centers of the first and second beams on the plane substantially coincide with each other.
Claim 65
Dependent Claim
20 words
A method according to claim 53, wherein each of the first and second grating patterns comprises a zone plate pattern.
Claim 66
Dependent Claim
33 words
A method according to claim 53, wherein each of the first and second diffraction beams comprises a beam diffracted at a first diffraction order by both of the first and second grating marks.
Claim 67
Independent Claim
129 words
A device for detecting a positional deviation between a first object having a first grating mark and a second object having a second grating mark, said device comprising: means for illuminating the first and second objects, wherein a beam diffracted by both the first and second grating marks in response to the illumination produces a beam pattern on a predetermined plane, and the positions on the plane of first and second diffraction beams of the diffracted beam are displaceable in the same direction and by substantially the same amount in accordance with the positional deviation of the first and second objects; and detecting means, having a detection surface disposed substantially coincident with the plane, for producing a signal corresponding to the position of the beam pattern on said plane.
Claim 68
Independent Claim
129 words
A device for detecting a positional deviation between a first object having a first grating mark and a second object having a second grating mark, said device comprising: means for illuminating the first and second objects, wherein a beam diffracted by both the first and second grating marks in response to the illumination produces a beam pattern on a predetermined plane, and the positions on the plane of first and second diffraction beams of the diffracted beam are displaceable in the same direction and by substantially the same amount in accordance with the positional deviation of the first and second objects; and detecting means, having a detection surface disposed substantially coincident with the plane, for producing a signal corresponding to the position of the beam pattern on said plane.
Claim 69
Dependent Claim
33 words
A device according to claim 57, wherein the first and second grating marks are so arranged that the centers of the first and second beams on the plane substantially coincide with each other.
Claim 70
Dependent Claim
20 words
A device according to claim 57, wherein each of the first and second grating patterns comprises a zone plate pattern.
Claim 71
Dependent Claim
33 words
A device according to claim 57, wherein each of the first and second diffraction beams comprises a beam diffracted at a first diffraction order by both of the first and second grating marks.
Claim 72
Independent Claim
147 words
An apparatus for aligning a first object having a first grating mark and a second object having a second grating mark, said apparatus comprising: means for illuminating the first and second objects, wherein a beam diffracted by both the first and second grating marks in response to the illumination produces a beam pattern on a predetermined plane, and wherein the positions on the plane of first and second diffraction beams of the diffraction beam are displaceable in the same direction and by substantially the same amount in accordance with the positional deviation of the first and second objects; detecting means, having a detection surface disposed substantially coincident with the plane, for producing a signal corresponding to the position of the beam pattern on the plane; and means for adjusting the relative position of the first and second objects in response to the signal from said detecting means.
Claim 73
Independent Claim
147 words
An apparatus for aligning a first object having a first grating mark and a second object having a second grating mark, said apparatus comprising: means for illuminating the first and second objects, wherein a beam diffracted by both the first and second grating marks in response to the illumination produces a beam pattern on a predetermined plane, and wherein the positions on the plane of first and second diffraction beams of the diffraction beam are displaceable in the same direction and by substantially the same amount in accordance with the positional deviation of the first and second objects; detecting means, having a detection surface disposed substantially coincident with the plane, for producing a signal corresponding to the position of the beam pattern on the plane; and means for adjusting the relative position of the first and second objects in response to the signal from said detecting means.
Claim 74
Dependent Claim
33 words
An apparatus according to claim 61, wherein the first and second grating marks are so arranged that the centers of the first and second beams on the plane substantially coincide with each other.
Claim 75
Dependent Claim
20 words
An apparatus according to claim 61, wherein each of the first and second grating patterns comprises a zone plate pattern.
Claim 76
Dependent Claim
33 words
An apparatus according to claim 61, wherein each of the first and second diffraction beams comprises a beam diffracted at a first diffraction order by both of the first and second grating marks.
Claim 77
Independent Claim
155 words
An apparatus for aligning a mask having a first grating mark and a wafer having a second grating mark, and for exposing the wafer to a pattern of the mask, said apparatus comprising: means for illuminating the mask and the wafer, wherein a beam diffracted by both the first and second grating marks in response to the illumination produces a beam pattern on a predetermined plane, and the positions on the plane of first and second diffraction beams of the diffracted beam are displaceable in the same direction and by substantially the same amount in accordance with the positional deviation of the mask and the wafer; detecting means, having a detection surface disposed substantially coincident with the plane, for producing a signal corresponding to the position of the beam pattern on the plane; and means for adjusting the relative position of the mask and the wafer in response to the signal from said detecting means.
Claim 78
Independent Claim
155 words
An apparatus for aligning a mask having a first grating mark and a wafer having a second grating mark, and for exposing the wafer to a pattern of the mask, said apparatus comprising: means for illuminating the mask and the wafer, wherein a beam diffracted by both the first and second grating marks in response to the illumination produces a beam pattern on a predetermined plane, and the positions on the plane of first and second diffraction beams of the diffracted beam are displaceable in the same direction and by substantially the same amount in accordance with the positional deviation of the mask and the wafer; detecting means, having a detection surface disposed substantially coincident with the plane, for producing a signal corresponding to the position of the beam pattern on the plane; and means for adjusting the relative position of the mask and the wafer in response to the signal from said detecting means.
Claim 79
Dependent Claim
33 words
An apparatus according to claim 65, wherein the first and second grating marks are so arranged that the centers of the first and second beams of the plane substantially coincide with each other.
Claim 80
Dependent Claim
20 words
An apparatus according to claim 65, wherein each of the first and second grating patterns comprises a zone plate pattern.
Claim 81
Dependent Claim
33 words
An apparatus according to claim 65, wherein each of the first and second diffraction beams comprises a beam diffracted at a first diffraction order by both of the first and second grating marks.
Claim 82
Dependent Claim
141 words
A semiconductor device manufacturing method, wherein a mask having a first grating mark and a wafer having a second grating mark are aligned with each other and the wafer is exposed to a circuit pattern of the mask whereby the pattern is printed on the wafer, said method comprising the steps of: illuminating the mask and the wafer, such that a beam pattern is formed on a predetermined plane by a beam diffracted by both the first and second grating marks, wherein the positions on the plane of first and second diffraction beams of the diffracted beam are displaceable in the same direction and by substantially the same amount in accordance with the positional deviation of the mask and the wafer; and aligning the mask and the wafer on the basis of the position of the beam pattern on the plane.
Claim 83
Dependent Claim
141 words
A semiconductor device manufacturing method, wherein a mask having a first grating mark and a wafer having a second grating mark are aligned with each other and the wafer is exposed to a circuit pattern of the mask whereby the pattern is printed on the wafer, said method comprising the steps of: illuminating the mask and the wafer, such that a beam pattern is formed on a predetermined plane by a beam diffracted by both the first and second grating marks, wherein the positions on the plane of first and second diffraction beams of the diffracted beam are displaceable in the same direction and by substantially the same amount in accordance with the positional deviation of the mask and the wafer; and aligning the mask and the wafer on the basis of the position of the beam pattern on the plane.
Claim 84
Dependent Claim
33 words
A method according to claim 69, wherein the first and second grating marks are so arranged that the centers of the first and second beams on the plane substantially coincide with each other.
Claim 85
Dependent Claim
20 words
A method according to claim 69, wherein each of the first and second grating patterns comprises a zone plate pattern.
Claim 86
Dependent Claim
33 words
A method according to claim 69, wherein each of the first and second diffraction beams comprises a beam diffracted at a first diffraction order by both of the first and second grating marks.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-07-05 | 1997-01-04 | 1997-07-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-07-05 | 2001-01-04 | 2001-07-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-07-05 | 2005-01-04 | 2005-07-06 | $7700.00 | Window Closed / Lapsed |