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US5216264A
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Silicon carbide MOS type field-effect transistor with at least one of the source and drain regions is formed by the use of a schottky contact
Assignee: Sharp Corp
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Filing: 1991-09-16
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Granted: 1993-06-01
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Expires: 2011-09-16
Abstract
Abstract A silicon carbide field-effect transistor is disclosed which includes an MOS structure composed successively of a silicon carbide layer, a gate insulator film, and a gate electrode. The field-effect transistor has source and drain regions formed in the silicon carbide layer, between which the MOS structure is disposed, wherein at least one of the source and drain regions is formed by the use of a Schottky contact on the silicon carbide layer.
Inventors
- 👤 Yoshihisa Fujii
- 👤 Akira Suzuki
- 👤 Katsuki Furukawa
- 👤 Mitsuhiro Shigeta
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 17:38
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/027; H10D30/60; H10D62/00; H10D62/80; H10D62/83; H10D62/832; H10D62/8325; H10D64/00; H10D64/20; H10D64/23; H10D64/251; H10D64/256; H10D64/60; H10D64/64; H10D64/647
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
96 words
In a silicon carbide field-effect transistor with an MOS structure composed successively of a silicon carbide layer, a gate insulator film, and a gate electrode, said transistor comprising source and drain regions formed in said silicon carbide layer, and said MOS structure being disposed between the source and drain regions, wherein at least one of said source and drain regions is formed by the use of a Schottky contact on the silicon carbide layer, and said Schottky contact is made with a material selected from the group consisting of a metal and a metal compound thereof.
Claim 2
Dependent Claim
96 words
In a silicon carbide field-effect transistor with an MOS structure composed successively of a silicon carbide layer, a gate insulator film, and a gate electrode, said transistor comprising source and drain regions formed in said silicon carbide layer, and said MOS structure being disposed between the source and drain regions, wherein at least one of said source and drain regions is formed by the use of a Schottky contact on the silicon carbide layer, and said Schottky contact is made with a material selected from the group consisting of a metal and a metal compound thereof.
Claim 3
Dependent Claim
38 words
A silicon carbide field-effect transistor according to claim 1, wherein said Schottky contact is formed on the n-type silicon carbide with a metal which is selected from the group consisting of platinum (Pt), gold (Au), and titanium (Ti).
Claim 4
Dependent Claim
36 words
A silicon carbide field-effect transistor according to claim 1, wherein said Schottky contact is formed on the p-type silicon carbide with a metal which is selected from the group consisting of aluminum (Al) and silver (Ag).
Claim 5
Dependent Claim
19 words
A silicon carbide field-effect transistor according to claim 1, wherein said gate insulator film is formed from silicon oxide.
Claim 6
Dependent Claim
18 words
A silicon carbide field-effect transistor according to claim 1, wherein said gate electrode is formed from polycrystalline silicon.
Claim 7
Dependent Claim
17 words
A silicon carbide field-effect transistor according to claim 1, wherein said compound of the metal is silicide.
Claim 8
Dependent Claim
22 words
A silicon carbide field-effect transistor according to claim 6, wherein said silicide is formed by a reaction of platinum and silicon carbide.
Claim 9
Dependent Claim
89 words
In a silicon carbide field-effect transistor with an MOS structure composed successively of a silicon carbide layer, a gate insulator film, and a gate electrode, said transistor comprising source and drain regions formed in said silicon carbide layer, and said MOS structure being disposed between the source and drain regions, wherein each of the source and drain regions is formed by use of a Schottky contact made by providing a metal selected from the group consisting of platinum, gold, titanium and a silicide thereof on the silicon carbide layer.
Claim 10
Dependent Claim
89 words
In a silicon carbide field-effect transistor with an MOS structure composed successively of a silicon carbide layer, a gate insulator film, and a gate electrode, said transistor comprising source and drain regions formed in said silicon carbide layer, and said MOS structure being disposed between the source and drain regions, wherein each of the source and drain regions is formed by use of a Schottky contact made by providing a metal selected from the group consisting of platinum, gold, titanium and a silicide thereof on the silicon carbide layer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-05-31 | 1996-11-30 | 1997-06-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-05-31 | 2000-11-30 | 2001-06-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-05-31 | 2004-11-30 | 2005-06-01 | $7700.00 | Window Closed / Lapsed |