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US5175784A
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Second harmonic wave generating device
Assignee: Ibiden Co Ltd
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Filing: 1990-09-28
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Granted: 1992-12-29
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Expires: 2010-09-28
Abstract
Abstract A second harmonic wave generating device having a thin film waveguide layer formed on a substrate, wherein the thin film wave guide layer is formed by dry etching a thin film formed on the substrate to adjust the thickness of the thin film so as to satisfy the following Equation (A) or (B): ##EQU1## wherein, Tμm: a thickness of the thin film waveguide layer λμm: a fundamental laser wavelength n OS1 : an ordinary refractive index of the substrate at the fundamental wavelength (λμm) n OF1 : an ordinary refractive index of the thin film waveguide layer at the fundamental wavelength (λμm) n eS2 : an extraordinary refractive index of the substrate at a second harmonic wavelength (λμm/2) n eF2 : an extraordinary refractive index of the thin film waveguide layer at the second harmonic wavelength (λμm/2) N 1 in Equation (A) is ##EQU2## and N 2 in Equation (B) is ##EQU3##
Inventors
- 👤 Ryo Enomoto
- 👤 Masaya Yamada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 07:30
CPC Classifications
G; G02; G02F; G02F1/00; G02F1/35; G02F1/355; G02F1/3551; G02F1/37; G02F1/377
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
160 words
A second harmonic wave generating device comprising a thin film waveguide layer formed on a substrate, characterized in that said thin film wave guide layer is formed by dry etching a thin film formed on said substrate to adjust the thickness of said thin film so as to satisfy the following Equation (A) or (B), ##EQU26## wherein, T μm: a thickness of the thin film waveguide layer λ μm: a fundamental laser wavelength n OS1 : an ordinary refractive index of the substrate at the fundamental wavelength (λ μm) n OF1 : an ordinary refractive index of the thin film waveguide layer at the fundamental wavelength (λ μm) n eS2 : an extraordinary refractive index of the substrate at a second harmonic wavelength (λ μm/2) n eF2 : an extraordinary refractive index of the thin film waveguide layer at the second harmonic wavelength (λ μm/2) N 1 in Equation (A) is ##EQU27## and N 2 in Equation (B) is ##EQU28##
Claim 2
Dependent Claim
160 words
A second harmonic wave generating device comprising a thin film waveguide layer formed on a substrate, characterized in that said thin film wave guide layer is formed by dry etching a thin film formed on said substrate to adjust the thickness of said thin film so as to satisfy the following Equation (A) or (B), ##EQU26## wherein, T μm: a thickness of the thin film waveguide layer λ μm: a fundamental laser wavelength n OS1 : an ordinary refractive index of the substrate at the fundamental wavelength (λ μm) n OF1 : an ordinary refractive index of the thin film waveguide layer at the fundamental wavelength (λ μm) n eS2 : an extraordinary refractive index of the substrate at a second harmonic wavelength (λ μm/2) n eF2 : an extraordinary refractive index of the thin film waveguide layer at the second harmonic wavelength (λ μm/2) N 1 in Equation (A) is ##EQU27## and N 2 in Equation (B) is ##EQU28##
Claim 3
Dependent Claim
32 words
The second harmonic wave generating device of claim 1 wherein incident angle (θ) of the fundamental wave to the optical axis (Z-axis) of said thin film waveguide layer is 0°±15° or 90°±15°.
Claim 4
Dependent Claim
17 words
The second harmonic wave generating device of claim 1 wherein said dry etching is ion beam etching.
Claim 5
Dependent Claim
28 words
The second harmonic wave generating device of claim 1 wherein said dry etching is selected from the group consisting of plasma etching, reactive ion beam etching, and sputter-etching.
Claim 6
Dependent Claim
20 words
The second harmonic wave generating device of claim 1 wherein said thin film waveguide layer is a channel-type waveguide layer.
Claim 7
Dependent Claim
19 words
The second harmonic wave generating device of claim 5 wherein said channel-type waveguide layer is of a ridge type.
References Cited (Backward Citations)
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Cited
JPS58117510A
Cited
EP0364214B1
Cited
US4953943A
Cited
US4973118A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-12-29 | 1996-06-29 | 1996-12-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-12-29 | 2000-06-29 | 2000-12-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-12-29 | 2004-06-29 | 2004-12-29 | $7700.00 | Window Closed / Lapsed |