Patent US2258425A successfully refreshed from Google Patents.
Patent US5135838A successfully refreshed from Google Patents.
US5135838A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Resist materials
Assignee: Nokia Bell Labs
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Filing: 1990-08-09
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Granted: 1992-08-04
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Expires: 2010-08-09
Abstract
Abstract A class of resist compositions sensitive to deep ultraviolet radiation includes a resin sensitive to acid and a composition that generates acid upon exposure to such radiation. A group of nitrobenzyl materials is particularly suitable for use as the acid generator.
Inventors
- 👤 Francis M. Houlihan
- 👤 Thomas X. Neenan
- 👤 Elsa Reichmanis
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 14:18
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
168 words
A process for fabricating a device comprising the steps of forming a radiation sensitive region on a substrate exposing at least a portion of said region to radiation to produce a latent pattern, developing said pattern, and using said patterned region as a mask to further process said device characterized in that said radiation sensitive region comprises a material including 1) a polymeric material that undergoes a reaction in response to an acid moiety and 2) an acid generating material represented by the formula ##STR9## where R is not acidic and does not substantially absorb ultraviolet light, and R' provides suitable steric and electron withdrawing characteristics such that an acid generator with a given Y has enhanced thermal stability relative to said acid generator with the same Y when R' is NO 2 and R is hydrogen and wherein Y is chosen such that it requires a temperature of at least 75° C. to induce splitting of said Y moiety from the remainder of said acid generating material.
Claim 2
Dependent Claim
168 words
A process for fabricating a device comprising the steps of forming a radiation sensitive region on a substrate exposing at least a portion of said region to radiation to produce a latent pattern, developing said pattern, and using said patterned region as a mask to further process said device characterized in that said radiation sensitive region comprises a material including 1) a polymeric material that undergoes a reaction in response to an acid moiety and 2) an acid generating material represented by the formula ##STR9## where R is not acidic and does not substantially absorb ultraviolet light, and R' provides suitable steric and electron withdrawing characteristics such that an acid generator with a given Y has enhanced thermal stability relative to said acid generator with the same Y when R' is NO 2 and R is hydrogen and wherein Y is chosen such that it requires a temperature of at least 75° C. to induce splitting of said Y moiety from the remainder of said acid generating material.
Claim 3
Dependent Claim
22 words
The process of claim 1 wherein R' is chosen from the group consisting of perfluorinated alkyls, lower alkyls, alkoxides, cyano, or ##STR10##
Claim 4
Dependent Claim
16 words
The process of claim 2 where Y is an alkyl, substituted alkyl, aryl, or substituted aryl.
Claim 5
Dependent Claim
16 words
The process of claim 1 wherein Y is an alkyl, substituted alkyl, aryl, or substituted aryl.
Claim 6
Dependent Claim
11 words
The process of claim 1 wherein-said acid generator comprises bis(2-(trifluoromethyl)-6-nitrobenzyl)1,3-benzene disulfonate.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-08-04 | 1996-02-03 | 1996-08-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-08-04 | 2000-02-03 | 2000-08-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-08-04 | 2004-02-03 | 2004-08-04 | $7700.00 | Window Closed / Lapsed |