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US5128731A Expired / Lapsed US ⏱️ 0.0 years remaining

Static random access memory cell using a P/N-MOS transistors

Assignee: Renesas Electronics America Inc
•
Filing: 1990-06-13
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Granted: 1992-07-07
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Expires: 2010-06-13
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Abstract

Abstract A P/N-MOS transistor having source and drain of opposite semiconductor types is provided. One embodiment of the P/N-MOS transistor has turn-off characteristic similar to a PMOS transistor, and turn-on characteristic similar to a PMOS transistor connected in series with a p-n junction diode. An application of the P/N-MOS transistor is provided in a static random access memory (SRAM) cell. This SRAM cell has density advantage over SRAM cells using polysilicon PMOS transistors as active transistors.

Inventors

  • 👤 Chuen-Der Lien
  • 👤 Fu-Chieh Hsu
  • 👤 Jeong Y. Choi
  • 👤 Jeng-Jiun Yang

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 10:40
CPC Classifications
H; H10; H10B; H10B10/00; H10B10/12

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 120 words
A static random access memory cell comprising: first and second polysilicon P/N-MOS transistors, each having a gate, a source region, and a drain region being of a different conductivity as said source region; first and second NMOS transistors, each having a gate, a source region and a drain region, wherein said drain region of said first P/N-MOS transistor, said gate of said second NMOS transistor, and said gate of said second P/N-MOS transistor are connected to said drain region of said first NMOS transistor and wherein said drain region of said second P/N-MOS transistor, said gate of said first NMOS transistor, and said gate of said first P/N-MOS transistor are connected to said drain region of said second NMOS transistor.
Claim 2
Dependent Claim 120 words
A static random access memory cell comprising: first and second polysilicon P/N-MOS transistors, each having a gate, a source region, and a drain region being of a different conductivity as said source region; first and second NMOS transistors, each having a gate, a source region and a drain region, wherein said drain region of said first P/N-MOS transistor, said gate of said second NMOS transistor, and said gate of said second P/N-MOS transistor are connected to said drain region of said first NMOS transistor and wherein said drain region of said second P/N-MOS transistor, said gate of said first NMOS transistor, and said gate of said first P/N-MOS transistor are connected to said drain region of said second NMOS transistor.
Claim 3
Dependent Claim 76 words
A static random access memory cell as in claim 1, further comprising: first and second transfer gates each having input and output leads, said output lead of said first transfer gate connected to said drain of said first polysilicon P/N-MOS transistor and said drain of said first NMOS transistor, and said output lead of said second transfer gate connected to said drain of said second polysilicon P/N-MOS transistor and said drain of said second NMOS transistor.
Claim 4
Dependent Claim 129 words
A static random access memory cell as in claim 1 wherein said polysilicon P/N-MOS transistor comprises: a control region being said gate of said P/N-MOS transistor for application of a control voltage; a channel region separated from said control region by an insulating material, said channel region conducting a current when said control voltage is applied and not conducting a current when said control voltage is not applied; a first region being of a first conductivity type and adjacent said channel region, said first region having a lead for application of a first bias voltage; and a second region being of a second conductivity type and adjacent said channel region but separated from said first region, said second region having a lead for application of a second bias voltage.
Claim 5
Dependent Claim 32 words
A static random access memory cell as in claim 3, wherein said first conductivity type is that of a p-type semiconductor and said second conductivity type is that of a n-type semiconductor.
Claim 6
Dependent Claim 19 words
A static random access memory cell as in claim 3, wherein said channel region comprises lightly doped n-type semiconductor.
Claim 7
Dependent Claim 19 words
A static random access memory cell as in claim 3, wherein said channel region comprises lightly doped p-type semiconductor.
Claim 8
Dependent Claim 31 words
A static random access memory cell as in claim 1, wherein said gate of said first NMOS transistor and said gate of said first P/N-MOS transistor share a common gate structure.
Claim 9
Dependent Claim 31 words
A static random access memory cell as in claim 1, wherein said gate of said second NMOS transistor and said gate of said second P/N-MOS transistor share a common gate structure.

References Cited (Backward Citations)

JPS56158480A Cited
US4458261A Cited
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JPS60186051A Cited
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JPS63302551A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-07-07 1996-01-06 1996-07-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-07-07 2000-01-06 2000-07-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-07-07 2004-01-06 2004-07-07 $7700.00 Window Closed / Lapsed

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